Hartjes; Joachim

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hartjes; Joachim.The latest application filed is for "projection exposure apparatus for semiconductor lithography".

Company Profile

6.31.35

Hartjes; Joachim - Aalen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Projection Exposure Apparatus For Semiconductor Lithography App 20220299733 - Hartjes; Joachim ; et al.	2022-09-22
Assembly In An Optical System, In Particular Of A Microlithographic Projection Exposure Apparatus App 20220214627 - Hartjes; Joachim ; et al.	2022-07-07
Method and device for determining the heating state of an optical element in an optical system for microlithography Grant 11,320,314 - Gruner , et al. May 3, 2	2022-05-03
Support of an optical unit Grant 11,307,503 - Vogt , et al. April 19, 2	2022-04-19
Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma Grant 11,137,687 - Liebaug , et al. October 5, 2	2021-10-05
Optical module with an anticollision device for module components Grant 11,054,755 - Hartjes , et al. July 6, 2	2021-07-06
Method And Device For Determining The Heating State Of An Optical Element In An Optical System For Microlithography App 20210148762 - Gruner; Toralf ; et al.	2021-05-20
Support Of An Optical Unit App 20210116823 - Vogt; Martin ; et al.	2021-04-22
Optical Arrangement And Method For Repairing The Optical Arrangement After A Shock Load App 20200209758 - Hartjes; Joachim	2020-07-02
Optical Arrangement For Euv Radiation With A Shield For Protection Against The Etching Effect Of A Plasma App 20200166847 - LIEBAUG; Bjoern ; et al.	2020-05-28
Optical system, lithography apparatus and method Grant 10,613,443 - Hartjes	2020-04-07
Optical System, Lithography Apparatus And Method App 20190196339 - Hartjes; Joachim	2019-06-27
Optical Module With An Anticollision Device For Module Components App 20190171118 - Hartjes; Joachim ; et al.	2019-06-06
Optical component for use in a radiation source module of a projection exposure system Grant 10,288,894 - Patra , et al.	2019-05-14
Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations Grant 10,162,267 - Gruner , et al. Dec	2018-12-25
Projection exposure apparatus comprising a measuring system for measuring an optical element Grant 10,162,270 - Bleidistel , et al. Dec	2018-12-25
Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus Grant 10,146,138 - Hild , et al. De	2018-12-04
Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator Grant 10,012,911 - Arnz , et al. July 3, 2	2018-07-03
Lithography apparatus with segmented mirror Grant 9,846,375 - Hartjes December 19, 2	2017-12-19
Projection Exposure Apparatus With Wavefront Measuring Device And Optical Wavefront Manipulator App 20170336714 - Arnz; Michael ; et al.	2017-11-23
Method For Producing An Optical Element For An Optical System, In Particular For A Microlithographic Projection Exposure Apparatus App 20170315452 - HILD; Kerstin ; et al.	2017-11-02
Optical Component App 20170293154 - Patra; Michael ; et al.	2017-10-12
Projection exposure apparatus for microlithography comprising an optical distance measurement system Grant 9,759,550 - Wolf , et al. September 12, 2	2017-09-12
Blocking element for protecting optical elements in projection exposure apparatuses Grant 9,684,243 - Hartjes , et al. June 20, 2	2017-06-20
Method and cooling system for cooling an optical element for EUV applications Grant 9,671,584 - Dengel , et al. June 6, 2	2017-06-06
Facet mirror device Grant 9,599,910 - Hartjes March 21, 2	2017-03-21
Arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus Grant 9,500,957 - Hartjes November 22, 2	2016-11-22
EUV microlithography illumination optical system and EUV attenuator for same Grant 9,482,959 - Schmidts , et al. November 1, 2	2016-11-01
Liquid cooled EUV reflector Grant 9,423,590 - Hartjes , et al. August 23, 2	2016-08-23
Optical Element Unit And Method Of Supporting An Optical Element App 20160109679 - Schaffer; Dirk ; et al.	2016-04-21
Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus Grant 9,207,541 - Hauf , et al. December 8, 2	2015-12-08
Projection Exposure Apparatus Including Mechanism To Reduce Influence Of Pressure Fluctuations App 20150316854 - Gruner; Toralf ; et al.	2015-11-05
Optical element unit and method of supporting an optical element Grant 9,134,501 - Schaffer , et al. September 15, 2	2015-09-15
Projection Exposure Apparatus For Microlithography Comprising An Optical Distance Measurement System App 20150198437 - Wolf; Alexander ; et al.	2015-07-16
Blocking Element For Protecting Optical Elements In Projection Exposure Apparatuses App 20150177626 - HARTJES; Joachim ; et al.	2015-06-25
Optical element having a plurality of reflective facet elements Grant 9,063,336 - Kirch , et al. June 23, 2	2015-06-23
Method And Cooling System For Cooling An Optical Element For Euv Applications App 20150103426 - Dengel; Guenther ; et al.	2015-04-16
Lithography Apparatus With Segmented Mirror App 20150103327 - Hartjes; Joachim	2015-04-16
Projection Exposure Apparatus Comprising a Measuring System for Measuring an Optical Element App 20140340664 - Bleidistel; Sascha ; et al.	2014-11-20
Mirror with a mirror carrier and projection exposure apparatus Grant 8,831,170 - Wevers , et al. September 9, 2	2014-09-09
Arrangement For Thermal Actuation Of A Mirror In A Microlithographic Projection Exposure Apparatus App 20140139816 - Hartjes; Joachim	2014-05-22
Facet Mirror Device App 20140104589 - Vogt; Martin ; et al.	2014-04-17
Optical Element App 20140071523 - Hartjes; Joachim ; et al.	2014-03-13
Illumination optics for EUV microlithography and related system and apparatus Grant 8,587,767 - Fiolka , et al. November 19, 2	2013-11-19
Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure App 20130182264 - Hetzler; Jochen ; et al.	2013-07-18
Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus App 20130176544 - Hauf; Markus ; et al.	2013-07-11
Facet Mirror Device App 20130120730 - Hartjes; Joachim	2013-05-16
Optical module with minimized overrun of the optical element Grant 8,441,747 - Heintel , et al. May 14, 2	2013-05-14
Method and apparatus for setting an illumination optical unit Grant 8,345,219 - Hartjes , et al. January 1, 2	2013-01-01
Method And Apparatus For Setting An Illumination Optical Unit App 20120300195 - Hartjes; Joachim ; et al.	2012-11-29
Optical Element Having A Plurality Of Reflective Facet Elements App 20120293785 - Kirch; Marc ; et al.	2012-11-22
Facet Mirror For Use In Microlithography App 20120287414 - Fiolka; Damian ; et al.	2012-11-15
Euv Microlithography Illumination Optical System And Euv Attenuator For Same App 20120069313 - Schmidts; Nicolas ; et al.	2012-03-22
Illumination Optics For Euv Microlithography And Related System And Apparatus App 20110063598 - Fiolka; Damian ; et al.	2011-03-17
Optical Unit Having Adjustable Force Action On An Optical Module App 20110019171 - Schubert; Erich ; et al.	2011-01-27
Optical element unit and method of supporting an optical element App 20090147229 - Schaffer; Dirk ; et al.	2009-06-11
Optical module with minimized overrun of the optical element App 20080204689 - Heintel; Willi ; et al.	2008-08-28
Mirror With A Mirror Carrier And Projection Exposure Apparatus App 20080144202 - Wevers; Rutger ; et al.	2008-06-19

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