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Shadow frame with cross beam for semiconductor equipment
Grant 8,002,896 - Tanaka , et al. August 23, 2 | 2011-08-23 |
Low temperature process for TFT fabrication
Grant 7,915,114 - Hsiao , et al. March 29, 2 | 2011-03-29 |
Low Temperature Process for TFT Fabrication
App 20080087960 - Hsiao; Mark ; et al. | 2008-04-17 |
Low temperature process for TFT fabrication
Grant 7,300,829 - Hsiao , et al. November 27, 2 | 2007-11-27 |
Method For Dechucking A Substrate
App 20070062454 - SHANG; QUANYUAN ; et al. | 2007-03-22 |
Method for dechucking a substrate
Grant 7,160,392 - Shang , et al. January 9, 2 | 2007-01-09 |
Plasma display panel with a low K dielectric layer
Grant 7,122,962 - Law , et al. October 17, 2 | 2006-10-17 |
Low temperature process for passivation applications
Grant 7,086,918 - Hsiao , et al. August 8, 2 | 2006-08-08 |
Shadow frame with cross beam for semiconductor equipment
App 20060030088 - Tanaka; Sakae ; et al. | 2006-02-09 |
On-site cleaning gas generation for process chamber cleaning
Grant 6,981,508 - Shang , et al. January 3, 2 | 2006-01-03 |
Process for controlling thin film uniformity and products produced thereby
Grant 6,962,732 - Won , et al. November 8, 2 | 2005-11-08 |
Shadow frame with cross beam for semiconductor equipment
Grant 6,960,263 - Tanaka , et al. November 1, 2 | 2005-11-01 |
Process for controlling thin film uniformity and products produced thereby
App 20050233155 - Won, Tae Kyung ; et al. | 2005-10-20 |
Fluorine process for cleaning semiconductor process chamber
Grant 6,880,561 - Goto , et al. April 19, 2 | 2005-04-19 |
Method and apparatus for enhanced chamber cleaning
Grant 6,863,077 - Sun , et al. March 8, 2 | 2005-03-08 |
Application of carbon doped silicon oxide film to flat panel industry
Grant 6,858,548 - Won , et al. February 22, 2 | 2005-02-22 |
On-site cleaning gas generation for process chamber cleaning
Grant 6,843,258 - Shang , et al. January 18, 2 | 2005-01-18 |
Method of reducing an electrostatic charge on a substrate during a PECVD process
Grant 6,827,987 - Won , et al. December 7, 2 | 2004-12-07 |
Low temperature process for TFT fabrication
App 20040241920 - Hsiao, Mark ; et al. | 2004-12-02 |
Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow
Grant 6,825,134 - Law , et al. November 30, 2 | 2004-11-30 |
On-site cleaning gas generation for process chamber cleaning
App 20040216768 - Shang, Quanyuan ; et al. | 2004-11-04 |
Low temperature process for passivation applications
App 20040113542 - Hsiao, Mark ; et al. | 2004-06-17 |
Method for dechucking a substrate
App 20040089239 - Shang, Quanyuan ; et al. | 2004-05-13 |
Method and apparatus for dechucking a substrate
Grant 6,676,761 - Shang , et al. January 13, 2 | 2004-01-13 |
Plasma display panel with a low k dielectric layer
App 20030218424 - Law, Kam S. ; et al. | 2003-11-27 |
Shadow frame with cross beam for semiconductor equipment
App 20030200928 - Tanaka, Sakae ; et al. | 2003-10-30 |
System and method for metal induced crystallization of polycrystalline thin film transistors
App 20030203123 - Shang, Quanyaun ; et al. | 2003-10-30 |
Application of carbon doped silicon oxide film to flat panel industry
App 20030198817 - Won, Tae Kyung ; et al. | 2003-10-23 |
Fluorine process for cleaning semiconductor process chamber
App 20030192569 - Goto, Haruhiro Harry ; et al. | 2003-10-16 |
Deposition of film layers
App 20030186561 - Law, Kam S. ; et al. | 2003-10-02 |
Plasma display panel with a low k dielectric layer
Grant 6,610,354 - Law , et al. August 26, 2 | 2003-08-26 |
Selectively etching silicon using fluorine without plasma
App 20030109144 - Goto, Haruhiro Harry ; et al. | 2003-06-12 |
Method and apparatus for dechucking a substrate
App 20030079691 - Shang, Quanyuan ; et al. | 2003-05-01 |
Method and apparatus for enhanced chamber cleaning
App 20030066541 - Sun, Sheng ; et al. | 2003-04-10 |
Process for controlling thin film uniformity and products produced thereby
App 20030044621 - Won, Tae Kyung ; et al. | 2003-03-06 |
Reduction of electrostatic charge on a substrate during PECVD process
App 20030031792 - Won, Tae Kyung ; et al. | 2003-02-13 |
Fluorine Process For Cleaning Semiconductor Process Chamber
App 20030010354 - GOTO , HARUHIRO HARRY ; et al. | 2003-01-16 |
Selectively etching silicon using fluorine without plasma
Grant 6,500,356 - Goto , et al. December 31, 2 | 2002-12-31 |
Plasma display panel with a low k dielectric layer
App 20020190651 - Law, Kam S. ; et al. | 2002-12-19 |
Deposition of TEOS oxide using pulsed RF plasma
App 20020192475 - Goto, Haruhiro H. ; et al. | 2002-12-19 |
Method and apparatus for enhanced chamber cleaning
App 20020174885 - Sun, Sheng ; et al. | 2002-11-28 |
Selectively Etching Silicon Using Fluorine Without Plasma
App 20020134755 - GOTO , HARUHIRO HARRY ; et al. | 2002-09-26 |
Deposition of TEOS oxide using pulsed RF plasma
Grant 6,451,390 - Goto , et al. September 17, 2 | 2002-09-17 |
Method of depositing amorphous silicon based films having controlled conductivity
App 20020115269 - Harshbarger, William R. ; et al. | 2002-08-22 |
Method and apparatus for enhancing chamber cleaning
Grant 6,432,255 - Sun , et al. August 13, 2 | 2002-08-13 |
On-site cleaning gas generation for process chamber cleaning
App 20020074013 - Shang, Quanyuan ; et al. | 2002-06-20 |
Method And Apparatus For Enhanced Chamber Cleaning
App 20020033183 - SUN, SHENG ; et al. | 2002-03-21 |
Method of depositing amorphous silicon based films having controlled conductivity
Grant 6,352,910 - Harshbarger , et al. March 5, 2 | 2002-03-05 |
Device fabrication by plasma etching
Grant 4,208,241 - Harshbarger , et al. June 17, 1 | 1980-06-17 |
Fabrication of patterned silicon nitride insulating layers having gently sloping sidewalls
Grant 4,181,564 - Fogarty , et al. January 1, 1 | 1980-01-01 |
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