Harnisch; Wolfgang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Harnisch; Wolfgang.The latest application filed is for "method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section".

Company Profile

0.12.11

Harnisch; Wolfgang - Lehesten N/A DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section Grant 8,731,273 - Arnz , et al. May 20, 2	2014-05-20
Method for mask inspection for mask design and mask production Grant 8,705,838 - Boehm , et al. April 22, 2	2014-04-22
Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection Grant RE44,216 - Totzeck , et al. May 14, 2	2013-05-14
Method And Device For Measuring The Relative Local Position Error Of One Of The Sections Of An Object That Is Exposed Section By Section App 20110229010 - Arnz; Michael ; et al.	2011-09-22
Method and arrangement for repairing photolithography masks Grant 7,916,930 - Zibold , et al. March 29, 2	2011-03-29
Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm Grant 7,623,620 - Mann , et al. November 24, 2	2009-11-24
Arrangement for inspecting objects, especially masks in microlithography Grant 7,525,115 - Dobschal , et al. April 28, 2	2009-04-28
Method for Mask Inspection for Mask Design and Mask Production App 20080247632 - Boehm; Klaus ; et al.	2008-10-09
Method and apparatus for the repair of photolithography masks App 20080069431 - Zibold; Axel ; et al.	2008-03-20
Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection Grant 7,286,284 - Totzeck , et al. October 23, 2	2007-10-23
Microscope, especially microscope used for inspection in semiconductor manufacture Grant 7,167,310 - Engel , et al. January 23, 2	2007-01-23
Arrangement of aperture diaphragms and/or filters, with changeable characteristics for optical devices App 20060291031 - Boehm; Klaus ; et al.	2006-12-28
Arrangement for inspecting objects, especially masks in microlithography App 20060262306 - Dobschal; Hans-Juergen ; et al.	2006-11-23
Arrangement for the production of photomasks App 20060154150 - Engel; Thomas ; et al.	2006-07-13
Polarizer device for generating a defined spatial distribution of polarization states App 20060028706 - Totzeck; Michael ; et al.	2006-02-09
Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection App 20060012873 - Totzeck; Michael ; et al.	2006-01-19
Reflective X-ray microscope and inspection system for examining objects with wavelengths < 100 nm App 20050201514 - Mann, Hans-Jurgen ; et al.	2005-09-15
Device for flat illumination of an object field Grant 6,925,225 - Engel , et al. August 2, 2	2005-08-02
Microscope, especially microscope used for inspection in semiconductor manufacture App 20040246574 - Engel, Thomas ; et al.	2004-12-09
Device for flat illumination of an object field App 20040135093 - Engel, Thomas ; et al.	2004-07-15

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