loadpatents
name:-0.015680074691772
name:-0.013314962387085
name:-0.0023159980773926
Harada; Akitoshi Patent Filings

Harada; Akitoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Harada; Akitoshi.The latest application filed is for "motor control system and power steering system".

Company Profile
2.11.15
  • Harada; Akitoshi - Kyoto JP
  • Harada; Akitoshi - Miyagi JP
  • Harada; Akitoshi - Kurokawa-gun JP
  • Harada; Akitoshi - Hillsboro OR
  • Harada; Akitoshi - Yamanashi JP
  • Harada; Akitoshi - Nirasaki JP
  • Harada, Akitoshi - Nirasaki-Shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Motor control system and power steering system
Grant 11,362,608 - Endo , et al. June 14, 2
2022-06-14
Motor Control System And Power Steering System
App 20200406958 - ENDO; Shuji ;   et al.
2020-12-31
Motor Control System And Power Steering System
App 20200395877 - ENDO; Shuji ;   et al.
2020-12-17
Method of controlling temperature and plasma processing apparatus
Grant 10,217,616 - Harada Feb
2019-02-26
Plasma processing method
Grant 10,192,719 - Takayama , et al. Ja
2019-01-29
Plasma processing apparatus and particle adhesion preventing method
Grant 10,043,637 - Suzuki , et al. August 7, 2
2018-08-07
Plasma processing method and plasma processing apparatus
Grant 9,953,862 - Harada , et al. April 24, 2
2018-04-24
Plasma Processing Apparatus And Particle Adhesion Preventing Method
App 20170347442 - SUZUKI; Yoshinori ;   et al.
2017-11-30
Plasma Processing Method And Plasma Processing Apparatus
App 20160315005 - Harada; Akitoshi ;   et al.
2016-10-27
Plasma processing method and plasma processing apparatus
Grant 9,460,896 - Harada October 4, 2
2016-10-04
Plasma Processing Method
App 20160196957 - TAKAYAMA; Takamitsu ;   et al.
2016-07-07
Plasma processing method and plasma processing apparatus
Grant 9,330,891 - Nonaka , et al. May 3, 2
2016-05-03
Plasma processing method and plasma processing apparatus
Grant 9,209,041 - Harada , et al. December 8, 2
2015-12-08
Cleaning Method For Plasma Processing Apparatus
App 20150243489 - Uda; Hiroshi ;   et al.
2015-08-27
Plasma Processing Method And Plasma Processing Apparatus
App 20150228458 - Harada; Akitoshi
2015-08-13
Plasma Processing Method And Plasma Processing Apparatus
App 20150221522 - Harada; Akitoshi ;   et al.
2015-08-06
Particle Backflow Preventing Part And Substrate Processing Apparatus
App 20150170891 - TAKAHASHI; Masanori ;   et al.
2015-06-18
Plasma Processing Method And Plasma Processing Apparatus
App 20150114930 - NONAKA; Ryo ;   et al.
2015-04-30
Method Of Controlling Temperature And Plasma Processing Apparatus
App 20150004794 - HARADA; Akitoshi
2015-01-01
Cleaning Method And Substrate Processing Apparatus
App 20140373867 - HARADA; Akitoshi
2014-12-25
Etching method and storage medium
Grant 7,608,544 - Harada October 27, 2
2009-10-27
Etching Method And Storage Medium
App 20070275564 - Harada; Akitoshi
2007-11-29
Etching method
Grant 7,125,806 - Harada , et al. October 24, 2
2006-10-24
Semiconductor device and manufacturing method thereof
Grant 7,119,011 - Harada , et al. October 10, 2
2006-10-10
Semiconductor device and manufacturing method thereof
App 20040256726 - Harada, Akitoshi ;   et al.
2004-12-23
Etching method
App 20040209469 - Harada, Akitoshi ;   et al.
2004-10-21

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