Hanawa; Toshikazu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hanawa; Toshikazu.The latest application filed is for "method of manufacturing semiconductor device".

Company Profile

5.9.13

Hanawa; Toshikazu - Ibaraki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of manufacturing semiconductor device Grant 10,872,813 - Sukegawa , et al. December 22, 2	2020-12-22
Method Of Manufacturing Semiconductor Device App 20200126853 - SUKEGAWA; Mitsuhiro ; et al.	2020-04-23
Semiconductor Device And Method Of Manufacturing The Same App 20200066646 - HANAWA; Toshikazu ; et al.	2020-02-27
Manufacturing method of semiconductor device Grant 10,224,214 - Horikoshi , et al.	2019-03-05
Method Of Manufacturing Semiconductor Device App 20190043756 - SUKEGAWA; Mitsuhiro ; et al.	2019-02-07
Manufacturing method for semiconductor device Grant 10,043,884 - Hanawa August 7, 2	2018-08-07
Methods for manufacturing semiconductor device and for detecting end point of dry etching Grant 9,935,023 - Hanawa , et al. April 3, 2	2018-04-03
Semiconductor Device And Method Of Manufacturing The Same App 20180061769 - HANAWA; Toshikazu ; et al.	2018-03-01
Manufacturing Method of Semiconductor Device App 20180047579 - HORIKOSHI; Kotaro ; et al.	2018-02-15
Manufacturing Method For Semiconductor Device App 20170338324 - HANAWA; Toshikazu	2017-11-23
Manufacturing method of semiconductor device Grant 9,818,620 - Horikoshi , et al. November 14, 2	2017-11-14
Manufacturing Method Of Semiconductor Device And Maintenance Method Of Dry Etching Equipment App 20170287722 - HANAWA; Toshikazu	2017-10-05
Methods For Manufacturing Semiconductor Device And For Detecting End Point Of Dry Etching App 20170287794 - HANAWA; Toshikazu ; et al.	2017-10-05
Manufacturing method for semiconductor device Grant 9,761,685 - Hanawa September 12, 2	2017-09-12
Methods for manufacturing semiconductor device and for detecting end point of dry etching Grant 9,711,423 - Hanawa , et al. July 18, 2	2017-07-18
Manufacturing method of semiconductor device Grant 9,666,445 - Horikoshi , et al. May 30, 2	2017-05-30
Method of manufacturing semiconductor device that uses treatment to enhance hydrophilicity of spin coated insulating film Grant 9,595,468 - Hanawa , et al. March 14, 2	2017-03-14
Methods For Manufacturing Semiconductor Device And For Detecting End Point Of Dry Etching App 20170062288 - HANAWA; Toshikazu ; et al.	2017-03-02
Manufacturing Method For Semiconductor Device App 20170053995 - HANAWA; Toshikazu	2017-02-23
Manufacturing Method of Semiconductor Device App 20170004976 - HORIKOSHI; Kotaro ; et al.	2017-01-05
Manufacturing Method of Semiconductor Device App 20160276211 - HORIKOSHI; Kotaro ; et al.	2016-09-22
Method Of Manufacturing Semiconductor Device App 20160254143 - HANAWA; Toshikazu ; et al.	2016-09-01

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.