HAN; Seok

Patent Applications and Registrations

Patent applications and USPTO patent grants for HAN; Seok.The latest application filed is for "photo-imageable thin films with high dielectric constants".

Company Profile

0.4.8

HAN; Seok - Seoul KR
Han; Seok - Hwaseon-si KR
Han; Seok - Gyeonggi-do KR
Han; Seok - Hwaseong-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photo-imageable Thin Films With High Dielectric Constants App 20180364572 - WOELFLE-GUPTA; Caroline ; et al.	2018-12-20
Photo-imageable Thin Films With High Dielectric Constants App 20180356724 - Woelfle-Gupta; Caroline ; et al.	2018-12-13
Methods of forming a pattern and methods of manufacturing a capacitor using the same Grant 7,985,347 - Kim , et al. July 26, 2	2011-07-26
Method of forming a pattern using a photoresist composition for immersion lithography Grant 7,968,275 - Han , et al. June 28, 2	2011-06-28
Alkaline developable photosensitive materials App 20100151389 - Park; Chun Geun ; et al.	2010-06-17
Method of forming a pattern and method of manufacturing a capacitor using the same Grant 7,638,388 - Kim , et al. December 29, 2	2009-12-29
Method Of Forming A Pattern Using A Photoresist Composition For Immersion Lithography App 20090176177 - Han; Seok ; et al.	2009-07-09
Methods of forming a pattern and methods of manufacturing a capacitor using the same App 20080142474 - Kim; Kyoung-Mi ; et al.	2008-06-19
Method Of Forming A Pattern And Method Of Manufacturing A Capacitor Using The Same App 20080124911 - Kim; Kyoung-Mi ; et al.	2008-05-29
Photoresist compositions and methods of forming a pattern using the same App 20080102403 - Kim; Seong-June ; et al.	2008-05-01
Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern using the photoresist composition Grant 7,326,519 - Han , et al. February 5, 2	2008-02-05
Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern using the photoresist composition App 20060188821 - Han; Seok ; et al.	2006-08-24

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