Han; Nianci

Patent Applications and Registrations

Patent applications and USPTO patent grants for Han; Nianci.The latest application filed is for "method of forming a process chamber component having electroplated yttrium containing coating".

Company Profile

0.15.11

Han; Nianci - San Jose CA US
Han; Nianci - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process chamber component having yttrium--aluminum coating Grant 9,012,030 - Han , et al. April 21, 2	2015-04-21
Method Of Forming A Process Chamber Component Having Electroplated Yttrium Containing Coating App 20120138472 - HAN; Nianci ; et al.	2012-06-07
Process Chamber Component Having Yttrium-aluminum Coating App 20120135155 - HAN; Nianci ; et al.	2012-05-31
Process chamber component having electroplated yttrium containing coating Grant 8,114,525 - Han , et al. February 14, 2	2012-02-14
Method of manufacturing a process chamber component having yttrium-aluminum coating Grant 8,110,086 - Han , et al. February 7, 2	2012-02-07
Electroplating an yttrium-containing coating on a chamber component Grant 7,833,401 - Han , et al. November 16, 2	2010-11-16
Process chamber component having electroplated yttrium containing coating App 20080223725 - Han; Nianci ; et al.	2008-09-18
Process chamber component having yttrium-aluminum coating App 20080110760 - Han; Nianci ; et al.	2008-05-15
Process chamber component having electroplated yttrium containing coating Grant 7,371,467 - Han , et al. May 13, 2	2008-05-13
Forming A Chamber Component Having A Yttrium-containing Coating App 20080017516 - Han; Nianci ; et al.	2008-01-24
Bonded multi-layer RF window App 20070079936 - Li; Maocheng ; et al.	2007-04-12
Process chamber having component with yttrium-aluminum coating Grant 6,942,929 - Han , et al. September 13, 2	2005-09-13
Coating boron carbide on aluminum Grant 6,808,747 - Shih , et al. October 26, 2	2004-10-26
Process chamber component having electroplated yttrium containing coating App 20040191545 - Han, Nianci ; et al.	2004-09-30
Substrate processing using a member comprising an oxide of a group IIIB metal Grant 6,641,697 - Han , et al. November 4, 2	2003-11-04
Cleaning ceramic surfaces App 20030190870 - Shih, Hong ; et al.	2003-10-09
Wavy and roughened dome in plasma processing reactor Grant 6,623,595 - Han , et al. September 23, 2	2003-09-23
Corrosion-resistant protective coating for an apparatus and method for processing a substrate Grant 6,592,707 - Shih , et al. July 15, 2	2003-07-15
Process chamber having component with yttrium-aluminum coating App 20030127049 - Han, Nianci ; et al.	2003-07-10
Diamond coated parts in a plasma reactor Grant 6,508,911 - Han , et al. January 21, 2	2003-01-21
Substrate processing using a member comprising an oxide of a group IIIB metal App 20020100554 - Han, Nianci ; et al.	2002-08-01
Corrosion-resistant protective coating for an apparatus and method for processing a substrate App 20020066532 - Shih, Hong ; et al.	2002-06-06
Ceramic composition for an apparatus and method for processing a substrate Grant 6,352,611 - Han , et al. March 5, 2	2002-03-05
Boron carbide parts and coatings in a plasma reactor Grant 6,120,640 - Shih , et al. September 19, 2	2000-09-19
Silicon carbide composite article particularly useful for plasma reactors Grant 5,904,778 - Lu , et al. May 18, 1	1999-05-18

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