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name:-0.017772912979126
name:-0.01352596282959
name:-0.0040950775146484
Han; Kwen Woo Patent Filings

Han; Kwen Woo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Han; Kwen Woo.The latest application filed is for "composition for etching silicon nitride film and etching method using same".

Company Profile
3.15.18
  • Han; Kwen Woo - Suwon-si KR
  • Han; Kwen-Woo - Uiwang-si N/A KR
  • Han; Kwen-Woo - Seoul N/A KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Etching composition for silicon nitride layer and method of etching silicon nitride layer using the same
Grant 11,254,871 - Choi , et al. February 22, 2
2022-02-22
Composition For Etching Silicon Nitride Film And Etching Method Using Same
App 20210363423 - HWANG; Ki Wook ;   et al.
2021-11-25
Etching Composition For Silicon Nitride Layer And Method Of Etching Silicon Nitride Layer Using The Same
App 20210115335 - CHOI; Jung Min ;   et al.
2021-04-22
Composition For Forming Silica Layer, Manufacturing Method For Silica Layer, And Silica Layer
App 20200369915 - NOH; Kunbae ;   et al.
2020-11-26
Resist underlayer composition, and method of forming patterns using the composition
Grant 10,732,504 - Bae , et al.
2020-08-04
Resist Underlayer Composition, And Method Of Forming Patterns Using The Composition
App 20190129307 - KWON; Soonhyung ;   et al.
2019-05-02
Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer
Grant 10,093,830 - Lim , et al. October 9, 2
2018-10-09
Resist Underlayer Composition, And Method Of Forming Patterns Using The Composition
App 20180224744 - BAE; Shinhyo ;   et al.
2018-08-09
Composition for forming silica based layer, and method for manufacturing silica based layer
Grant 9,902,873 - Bae , et al. February 27, 2
2018-02-27
Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming
Grant 9,890,255 - Song , et al. February 13, 2
2018-02-13
Composition For Forming Silica Layer, Method For Manufacturing Silica Layer, And Silica Layer
App 20170250206 - Han; Kwen-Woo ;   et al.
2017-08-31
Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layer
Grant 9,738,787 - Yun , et al. August 22, 2
2017-08-22
Composition For Forming A Silica Based Layer, Method For Manufacturing Silica Based Layer, And Electronic Device Including The Silica Based Layer
App 20160177133 - Lim; Wan-Hee ;   et al.
2016-06-23
Rinse liquid for insulating film and method of rinsing insulating film
Grant 9,312,122 - Bae , et al. April 12, 2
2016-04-12
Composition For Forming Silica Based Layer, And Method For Manufacturing Silica Based Layer
App 20150337168 - BAE; Jin-Hee ;   et al.
2015-11-26
Composition For Forming Silica-based Insulating Layer, Method For Preparing Composition For Forming Silica-based Insulating Layer, Silica-based Insulating Layer, And Method For Manufacturing Silica-based Insulating Layer
App 20150274980 - Yun; Hui-Chan ;   et al.
2015-10-01
Modified Hydrogenated Polysiloxazane, Composition Comprising Same For Forming Silica-based Insulation Layer, Method For Preparing Composition For Forming Silica-based Insulation Layer, Silica-based Insulation Layer, And Method For Preparing Silica-based Insulation Layer
App 20150225508 - Song; Hyun-Ji ;   et al.
2015-08-13
Composition For A Silica Based Layer, Silica Based Layer, And Method Of Manufacturing A Silica Based Layer
App 20150093545 - HAN; Kwen-Woo ;   et al.
2015-04-02
Resist underlayer composition and process of producing integrated circuit devices using the same
Grant 8,962,747 - Kim , et al. February 24, 2
2015-02-24
Rinse Liquid For Insulating Film And Method Of Rinsing Insulating Film
App 20140315367 - BAE; Jin-Hee ;   et al.
2014-10-23
Resist underlayer composition and process of producing integrated circuit devices using same
Grant 8,841,218 - Han , et al. September 23, 2
2014-09-23
Resin composition for protection layer of color filter, protection layer of color filter using same and image sensor including same
Grant 8,628,698 - Choi , et al. January 14, 2
2014-01-14
Resist Underlayer Composition And Process Of Producing Integrated Circuit Devices Using Same
App 20130037921 - HAN; Kwen-Woo ;   et al.
2013-02-14
Resist Underlayer Composition And Process Of Producing Integrated Circuit Devices Using The Same
App 20120270981 - KIM; Mi-Young ;   et al.
2012-10-25
Resin Composition for Protection Layer of Color Filter, Protection Layer of Color Filter Using Same and Image Sensor Including Same
App 20110156185 - CHOI; Se-Young ;   et al.
2011-06-30
Photosensitive resin composition for pad protective layer, and method for making image sensor using the same
Grant 7,851,789 - Lee , et al. December 14, 2
2010-12-14
Photosensitive Resin Composition For Pad Protective Layer, And Method For Making Image Sensor Using The Same
App 20090146236 - LEE; Kil-Sung ;   et al.
2009-06-11

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