Hamasaki; Bunei

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hamasaki; Bunei.The latest application filed is for "parameter editing method and semiconductor exposure system".

Company Profile

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Hamasaki; Bunei - Ayase JP
Hamasaki; Bunei - Yokohama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Parameter editing method and semiconductor exposure system Grant 6,499,007 - Kuroki , et al. December 24, 2	2002-12-24
Alignment and exposure apparatus and method for manufacture of integrated circuits Grant 5,365,342 - Ayata , et al. November 15, 1	1994-11-15
Alignment and exposure apparatus and method for manufacture of integrated circuits Grant 5,050,111 - Ayata , et al. September 17, 1	1991-09-17
Alignment and exposure apparatus and method for manufacture of integrated circuits Grant 4,937,618 - Ayata , et al. June 26, 1	1990-06-26
Alignment method usable in a step-and-repeat type exposure apparatus for either global or dye-by-dye alignment Grant 4,918,320 - Hamasaki , et al. April 17, 1	1990-04-17
Alignment method Grant 4,811,059 - Hamasaki , et al. March 7, 1	1989-03-07
Alignment and exposure apparatus having an objective lens system capable of observing a mark on an exposure optical holding member to permit alignment of a mask relative to the exposure optical system Grant 4,801,808 - Hamasaki January 31, 1	1989-01-31
Wafer prober Grant 4,677,474 - Sato , et al. June 30, 1	1987-06-30

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