Hamanaka; Nobuaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hamanaka; Nobuaki.The latest application filed is for "positive electrode for lithium ion secondary battery and lithium ion secondary battery using same".

Company Profile

1.9.12

Hamanaka; Nobuaki - Kanagawa JP
Hamanaka; Nobuaki - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Negative electrode, method for producing the same, and battery Grant 10,038,194 - Hamanaka July 31, 2	2018-07-31
Positive Electrode For Lithium Ion Secondary Battery And Lithium Ion Secondary Battery Using Same App 20160351902 - HAMANAKA; Nobuaki	2016-12-01
Negative Electrode, Method For Producing The Same, And Battery App 20160211525 - Hamanaka; Nobuaki	2016-07-21
Semiconductor Device And Process For Producing The Same App 20100330799 - HAMANAKA; Nobuaki ; et al.	2010-12-30
Semiconductor device, designing method for semiconductor device, computer-readable medium, and manufacturing method for semiconductor device App 20100289150 - Hamanaka; Nobuaki	2010-11-18
Semiconductor device and method of manufacturing the same Grant 7,217,654 - Nagahara , et al. May 15, 2	2007-05-15
Semiconductor device and method of manufacturing the same App 20070096331 - Nagahara; Seiji ; et al.	2007-05-03
Method of manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device Grant 7,199,058 - Maruyama , et al. April 3, 2	2007-04-03
Semiconductor device and method of manufacturing the same App 20050124168 - Nagahara, Seiji ; et al.	2005-06-09
Method of manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device App 20040241928 - Maruyama, Takuya ; et al.	2004-12-02
Photo mask for fabricating semiconductor device having dual damascene structure Grant 6,821,687 - Hamanaka , et al. November 23, 2	2004-11-23
Semiconductor device and method of manufacturing the same App 20030170993 - Nagahara, Seiji ; et al.	2003-09-11
Method for forming a silicide of metal with a high melting point in a semiconductor device Grant 6,569,766 - Hamanaka , et al. May 27, 2	2003-05-27
Method For Forming A Refractory-metal-silicide Layer In A Semiconductor Device App 20030077901 - HAMANAKA, NOBUAKI ; et al.	2003-04-24
Method for forming a refractory-metal-silicide layer in a semiconductor device Grant 6,548,421 - Hamanaka , et al. April 15, 2	2003-04-15
Process for fabricating semiconductor device having silicide layer with low resistance and uniform profile and sputtering system used therein Grant 6,544,890 - Hamanaka April 8, 2	2003-04-08
Fabrication Method Of Implanting Siliconions Into The Silicon Substrate App 20020155701 - Hamanaka, Nobuaki	2002-10-24
Photo mask for fabricating semiconductor device having dual damascene structure App 20020142235 - Hamanaka, Nobuaki ; et al.	2002-10-03
Method of forming MOS transistor Grant 6,436,783 - Ono , et al. August 20, 2	2002-08-20
Process for fabricating semiconductor device having silicide layer with low resistance and uniform profile and sputtering system used therein App 20020081827 - Hamanaka, Nobuaki	2002-06-27
Method of manufacturing a semiconductor device Grant 6,337,272 - Hamanaka January 8, 2	2002-01-08

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