| Patent | Date |
|---|
Inrush Current Prevention Circuit
App 20170271867 - HAMADA; Yoshitaka | 2017-09-21 |
Parallel Monitoring Circuit For Capacitor
App 20160036248 - HAMADA; Yoshitaka | 2016-02-04 |
Formation of conductive circuit, conductive circuit, and conductive ink composition
Grant 9,018,095 - Hamada April 28, 2 | 2015-04-28 |
Computer System And Communication Route Changing Method
App 20150063361 - Hamada; Yoshitaka | 2015-03-05 |
Formation Of Conductive Circuit
App 20140374005 - Hamada; Yoshitaka | 2014-12-25 |
Formation Of Conductive Circuit, Conductive Circuit, And Conductive Ink Composition
App 20140374905 - Hamada; Yoshitaka | 2014-12-25 |
Conductive Ink Composition, Formation Of Conductive Circuit, And Conductive Circuit
App 20140060903 - HAMADA; Yoshitaka ; et al. | 2014-03-06 |
Silicone resin composition and optical material
Grant 8,604,126 - Hamada , et al. December 10, 2 | 2013-12-10 |
Organic silane compound for forming Si-containing film by plasma CVD and method for forming Si-containing film
Grant 8,546,597 - Hamada October 1, 2 | 2013-10-01 |
SIP telephone set, and file transfer system, file transfer method and file transfer program thereof
Grant 8,537,808 - Hamada September 17, 2 | 2013-09-17 |
Three-level Power Converting Apparatus
App 20130193762 - FUJII; Kansuke ; et al. | 2013-08-01 |
Preparation process of trisilylamine
Grant 8,461,367 - Hamada , et al. June 11, 2 | 2013-06-11 |
Packaging bag
Grant 8,434,637 - Mita , et al. May 7, 2 | 2013-05-07 |
Method For Forming Conductive Circuit
App 20130092423 - HAMADA; Yoshitaka ; et al. | 2013-04-18 |
High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device
Grant 8,277,600 - Hamada , et al. October 2, 2 | 2012-10-02 |
Substrate joining method and 3-D semiconductor device
Grant 8,257,528 - Yagihashi , et al. September 4, 2 | 2012-09-04 |
Conductive Pattern-forming Composition And Method
App 20120207917 - Hamada; Yoshitaka ; et al. | 2012-08-16 |
Silicone Resin Composition And Optical Material
App 20120184674 - HAMADA; Yoshitaka ; et al. | 2012-07-19 |
Method For Preparing Purified Aminosilane
App 20120165564 - Hamada; Yoshitaka ; et al. | 2012-06-28 |
Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing
Grant 8,153,836 - Nakashima , et al. April 10, 2 | 2012-04-10 |
Preparation Process Of Trisilylamine
App 20110178322 - Hamada; Yoshitaka ; et al. | 2011-07-21 |
Semiconductor device producing method and substrate processing apparatus
Grant 7,981,815 - Miya , et al. July 19, 2 | 2011-07-19 |
Process for preparing a dispersion liquid of zeolite fine particles
Grant 7,923,522 - Hamada , et al. April 12, 2 | 2011-04-12 |
Sip Telephone Set, And File Transfer System, File Transfer Method And File Transfer Program Thereof
App 20110051720 - HAMADA; YOSHITAKA | 2011-03-03 |
Film-forming Composition, Insulating Film With Low Dielectric Constant, Formation Method Thereof, And Semiconductor Device
App 20100283133 - Hamada; Yoshitaka ; et al. | 2010-11-11 |
Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device
App 20100233482 - Hamada; Yoshitaka ; et al. | 2010-09-16 |
Method for forming insulating film with low dielectric constant
Grant 7,786,022 - Hamada , et al. August 31, 2 | 2010-08-31 |
Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device
Grant 7,754,330 - Hamada , et al. July 13, 2 | 2010-07-13 |
Resist composition and patterning process using the same
Grant 7,745,094 - Nakashima , et al. June 29, 2 | 2010-06-29 |
Organic Silane Compound For Forming Si-containing Film By Plasma Cvd And Method For Forming Si-containing Film
App 20100137626 - Hamada; Yoshitaka | 2010-06-03 |
Method For Depositing Si-containing Film, Insulator Film, And Semiconductor Device
App 20100061915 - Hamada; Yoshitaka | 2010-03-11 |
Substrate Joining Method And 3-d Semiconductor Device
App 20100040893 - Yagihashi; Fujio ; et al. | 2010-02-18 |
High-temperature Bonding Composition, Substrate Bonding Method, And 3-d Semiconductor Device
App 20100040895 - Hamada; Yoshitaka ; et al. | 2010-02-18 |
Positive resist material and pattern formation method using the same
Grant 7,651,829 - Hamada , et al. January 26, 2 | 2010-01-26 |
Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
Grant 7,638,256 - Kinsho , et al. December 29, 2 | 2009-12-29 |
Organic Silicon Oxide Fine Particles And Preparation Method Thereof, Porous Film-forming Composition, Porous Film And Formation Method Thereof, And Semiconductor Device
App 20090294726 - Hamada; Yoshitaka ; et al. | 2009-12-03 |
Organic Silicon Oxide Fine Particle And Preparation Method Thereof, Porous Film-forming Composition, Porous Film And Formation Method Thereof, And Semiconductor Device
App 20090294922 - Hamada; Yoshitaka ; et al. | 2009-12-03 |
Resist composition and patterning process
Grant 7,550,247 - Nakashima , et al. June 23, 2 | 2009-06-23 |
Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same
Grant 7,541,134 - Iwabuchi , et al. June 2, 2 | 2009-06-02 |
Semiconductor Device Producing Method and Substrate Processing Apparatus
App 20090053906 - Miya; Hironobu ; et al. | 2009-02-26 |
Packaging Bag
App 20090035424 - Mita; Kozo ; et al. | 2009-02-05 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
Grant 7,485,690 - Hamada , et al. February 3, 2 | 2009-02-03 |
Silsesquioxane Compound Mixture, Hydrolyzable Silane Compound, Making Methods, Resist Composition, Patterning Process, And Substrate Processing
App 20080311514 - NAKASHIMA; Mutsuo ; et al. | 2008-12-18 |
Siloxane Polymer, Preparation Method Thereof, Porous-film Forming Coating Solution Containing The Polymer, Porous Film, And Semiconductor Device Using The Porous Film
App 20080292863 - Yagihashi; Fujio ; et al. | 2008-11-27 |
Film-forming Composition, Insulating Film With Low Dielectric Constant, Formation Method Thereof, And Semiconductor Device
App 20080290521 - Hamada; Yoshitaka ; et al. | 2008-11-27 |
Semiconductor Interlayer-insulating Film Forming Composition, Preparation Method Thereof, Film Forming Method, And Semiconductor Device
App 20080290472 - Yagihashi; Fujio ; et al. | 2008-11-27 |
Silicon-containing Film, Forming Material, Making Method, And Semiconductor Device
App 20080274627 - HAMADA; Yoshitaka ; et al. | 2008-11-06 |
Process for Preparing a Zeolite-Containing Film
App 20080248328 - Hamada; Yoshitaka ; et al. | 2008-10-09 |
Process for Preparing a Dispersion Liquid of Zeolite Fine Particles
App 20080248280 - Hamada; Yoshitaka ; et al. | 2008-10-09 |
Porous film-forming composition, patterning process, and porous sacrificial film
Grant 7,417,104 - Iwabuchi , et al. August 26, 2 | 2008-08-26 |
Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device
Grant 7,402,621 - Ogihara , et al. July 22, 2 | 2008-07-22 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
Grant 7,385,021 - Hamada , et al. June 10, 2 | 2008-06-10 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,357,961 - Iwabuchi , et al. April 15, 2 | 2008-04-15 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,341,775 - Hamada , et al. March 11, 2 | 2008-03-11 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device
Grant 7,332,446 - Ogihara , et al. February 19, 2 | 2008-02-19 |
Silsesquioxane compound mixture, method of making, resist composition, and patterning process
App 20080038664 - Hamada; Yoshitaka ; et al. | 2008-02-14 |
Silsesquioxane compound mixture, method of making, resist composition, and patterning process
Grant 7,265,234 - Hamada , et al. September 4, 2 | 2007-09-04 |
Resist composition and patterning process using the same
App 20070190457 - Nakashima; Mutsuo ; et al. | 2007-08-16 |
Resist composition and patterning process using the same
App 20070190458 - Nakashima; Mutsuo ; et al. | 2007-08-16 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20070178319 - Hamada; Yoshitaka ; et al. | 2007-08-02 |
Composition for forming a porous film prepared by hydrolysis and condensation of an alkoxysilane using a trialkylmethylammonium hydroxide catalyst
Grant 7,239,018 - Hamada , et al. July 3, 2 | 2007-07-03 |
Composition For Forming Porous Film, Porous Film And Method For Forming The Same, Interlevel Insulator Film, And Semiconductor Device
App 20070135565 - Ogihara; Tsutomu ; et al. | 2007-06-14 |
Composition For Forming Porous Film, Porous Film And Method For Forming The Same, Interlevel Insulator Film, And Semiconductor Device
App 20070087124 - Iwabuchi; Motoaki ; et al. | 2007-04-19 |
Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
App 20070009832 - Kinsho; Takeshi ; et al. | 2007-01-11 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20060289849 - Yagihashi; Fujio ; et al. | 2006-12-28 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,132,473 - Ogihara , et al. November 7, 2 | 2006-11-07 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,126,208 - Iwabuchi , et al. October 24, 2 | 2006-10-24 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film
Grant 7,119,354 - Yagihashi , et al. October 10, 2 | 2006-10-10 |
Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device
App 20060220253 - Hamada; Yoshitaka ; et al. | 2006-10-05 |
Silsesquioxane compound mixture, method of making, resist composition, and patterning process
App 20060224009 - Hamada; Yoshitaka ; et al. | 2006-10-05 |
Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device
Grant 7,084,505 - Hamada , et al. August 1, 2 | 2006-08-01 |
Resist composition and patterning process
App 20060040206 - Nakashima; Mutsuo ; et al. | 2006-02-23 |
Porous film-forming composition, patterning process, and porous sacrificial film
App 20050277756 - Iwabuchi, Motoaki ; et al. | 2005-12-15 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
App 20050277755 - Hamada, Yoshitaka ; et al. | 2005-12-15 |
Sacrificial film-forming composition, patterning process, sacrificial film and removal method
App 20050274692 - Hamada, Yoshitaka ; et al. | 2005-12-15 |
Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same
App 20050277058 - Iwabuchi, Motoaki ; et al. | 2005-12-15 |
Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device
Grant 6,930,393 - Hamada , et al. August 16, 2 | 2005-08-16 |
Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device
App 20050165197 - Ogihara, Tsutomu ; et al. | 2005-07-28 |
Radiation-sensitive polymer composition and pattern forming method using the same
App 20050079443 - Noda, Kazumi ; et al. | 2005-04-14 |
Positive resist material and pattern formation method using the same
App 20040241579 - Hamada, Yoshitaka ; et al. | 2004-12-02 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040232553 - Iwabuchi, Motoaki ; et al. | 2004-11-25 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040235971 - Hamada, Yoshitaka ; et al. | 2004-11-25 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040219372 - Ogihara, Tsutomu ; et al. | 2004-11-04 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040216641 - Hamada, Yoshitaka ; et al. | 2004-11-04 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040201007 - Yagihashi, Fujio ; et al. | 2004-10-14 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040202874 - Iwabuchi, Motoaki ; et al. | 2004-10-14 |
Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device
App 20040195660 - Hamada, Yoshitaka ; et al. | 2004-10-07 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device
App 20040188809 - Ogihara, Tsutomu ; et al. | 2004-09-30 |
Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device
App 20040188846 - Hamada, Yoshitaka ; et al. | 2004-09-30 |
Composition for forming porous film and method for forming the same, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040180554 - Hamada, Yoshitaka ; et al. | 2004-09-16 |
Conductive powder and making process
Grant 6,680,081 - Fukushima , et al. January 20, 2 | 2004-01-20 |
Conductive powder and making process
Grant 6,485,831 - Fukushima , et al. November 26, 2 | 2002-11-26 |
Conductive powder and making process
App 20020142094 - Fukushima, Motoo ; et al. | 2002-10-03 |
Purification of organic silicon polymer
Grant 6,114,500 - Mori , et al. September 5, 2 | 2000-09-05 |
Conductive circuit board and method for making
Grant 5,955,192 - Fukushima , et al. September 21, 1 | 1999-09-21 |
Conductive polymers and process for preparing the same
Grant 5,554,710 - Mori , et al. September 10, 1 | 1996-09-10 |
Organosiloxane compound with one end stopped with an aminoalkyl group and a manufacturing method thereof
Grant 4,981,988 - Ichinohe , et al. January 1, 1 | 1991-01-01 |
Integrated circuit card with increased number of connecting terminals
Grant 4,794,243 - Hamada December 27, 1 | 1988-12-27 |
Integrated circuit card and connector arrangement using same
Grant 4,780,603 - Hamada October 25, 1 | 1988-10-25 |
Integrated circuit card having memory errasable with ultraviolet ray
Grant 4,766,480 - Hamada August 23, 1 | 1988-08-23 |
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