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Patent applications and USPTO patent grants for Halling; Alfred M..The latest application filed is for "dose uniformity correction technique".
Patent | Date |
---|---|
Dose uniformity correction technique Grant 7,692,164 - Halling April 6, 2 | 2010-04-06 |
Dose Uniformity Correction Technique App 20080067438 - Halling; Alfred M. | 2008-03-20 |
Beam angle control in a batch ion implantation system Grant 6,984,832 - Halling , et al. January 10, 2 | 2006-01-10 |
Beam angle control in a batch ion implantation system App 20050230642 - Halling, Alfred M. ;   et al. | 2005-10-20 |
System and methods for ion beam containment using localized electrostatic fields in an ion beam passageway App 20040227106 - Halling, Alfred M. | 2004-11-18 |
In-process wafer charge monitor and control system for ion implanter Grant 6,600,163 - Halling July 29, 2 | 2003-07-29 |
In-process wafer charge monitor and control system for ion implanter App 20020079465 - Halling, Alfred M. | 2002-06-27 |
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