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Patent applications and USPTO patent grants for Hah; Sang-lock.The latest application filed is for "method of manufacturing a semiconductor device having a silicide layer".
Patent | Date |
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Method of removing contaminants from integrated circuit substrates using cleaning solutions Grant 6,513,538 - Chung , et al. February 4, 2 | 2003-02-04 |
Method of manufacturing a semiconductor device having a silicide layer App 20020045355 - Chong, Seung-Pil ;   et al. | 2002-04-18 |
Method of removing contaminants from integrated circuit substrates using cleaning solutions App 20020028585 - Chung, Seung-Pil ;   et al. | 2002-03-07 |
Method of manufacturing a semiconductor capacitor having a hemispherical grain layer using a dry cleaning process App 20010021565 - Chung, Seung-pil ;   et al. | 2001-09-13 |
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