Hagiwara; Ryoji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hagiwara; Ryoji.The latest application filed is for "method for fabricating euvl mask".

Company Profile

0.13.8

Hagiwara; Ryoji - Chiba JP
Hagiwara; Ryoji - Chiba-shi JP
Hagiwara; Ryoji - Kawasaki JP
Hagiwara; Ryoji - Yokohama JP
Hagiwara; Ryoji - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for fabricating EUVL mask Grant 7,927,769 - Hagiwara , et al. April 19, 2	2011-04-19
Method for fabricating EUVL mask App 20090226825 - Hagiwara; Ryoji ; et al.	2009-09-10
Focused ion beam processing method Grant 7,576,340 - Hagiwara , et al. August 18, 2	2009-08-18
Charged particle beam irradiation method and charged particle beam apparatus Grant 7,488,961 - Muramatsu , et al. February 10, 2	2009-02-10
Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing method Grant 7,485,880 - Kozakai , et al. February 3, 2	2009-02-03
Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope Grant 7,375,352 - Takaoka , et al. May 20, 2	2008-05-20
Focused ion beam processing method App 20070158590 - Hagiwara; Ryoji ; et al.	2007-07-12
Charged particle beam processing method and charged particle beam apparatus App 20070114460 - Muramatsu; Masashi ; et al.	2007-05-24
Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing method App 20070114454 - Kozakai; Tomokazu ; et al.	2007-05-24
Charged particle beam irradiation method and charged particle beam apparatus App 20070114462 - Muramatsu; Masashi ; et al.	2007-05-24
Electron beam processing method Grant 7,018,683 - Takaoka , et al. March 28, 2	2006-03-28
Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope App 20050285033 - Takaoka, Osamu ; et al.	2005-12-29
Electron beam processing method App 20050276932 - Takaoka, Osamu ; et al.	2005-12-15
Method for repairing a phase shift mask and a focused ion beam apparatus for carrying out method Grant 6,891,171 - Hagiwara , et al. May 10, 2	2005-05-10
Charged particle processing for forming pattern boundaries at a uniform thickness Grant 6,780,551 - Hagiwara , et al. August 24, 2	2004-08-24
Charged particle processing for forming pattern boundaries at a uniform thickness App 20020177055 - Hagiwara, Ryoji ; et al.	2002-11-28
Flash memory with improved erasability and its circuitry Grant 5,770,963 - Akaogi , et al. June 23, 1	1998-06-23
Flash memory with improved erasability and its circuitry Grant 5,592,419 - Akaogi , et al. January 7, 1	1997-01-07
Semiconductor memory device having non-volatile and volatile memory cells Grant 5,249,156 - Hagiwara , et al. September 28, 1	1993-09-28
X-ray image sensor Grant 5,109,159 - Hagiwara , et al. April 28, 1	1992-04-28
Semiconductor memory device having function of checking and correcting error of read-out data Grant 4,937,830 - Kawashima , et al. June 26, 1	1990-06-26

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