Hagiwara; Kazuyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hagiwara; Kazuyuki.The latest application filed is for "method and system for dimensional uniformity using charged particle beam lithography".

Company Profile

1.20.21

Hagiwara; Kazuyuki - Tokyo JP
Hagiwara; Kazuyuki - Wako N/A JP
Hagiwara; Kazuyuki - Wako-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and system for dimensional uniformity using charged particle beam lithography Grant 10,431,422 - Fujimura , et al. O	2019-10-01
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography App 20180108513 - Fujimura; Akira ; et al.	2018-04-19
Method and system for dimensional uniformity using charged particle beam lithography Grant 9,859,100 - Fujimura , et al. January 2, 2	2018-01-02
Method and system for design of enhanced edge slope patterns for charged particle beam lithography Grant 9,612,530 - Fujimura , et al. April 4, 2	2017-04-04
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography App 20160260581 - Fujimura; Akira ; et al.	2016-09-08
Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam Lithography App 20160195805 - Fujimura; Akira ; et al.	2016-07-07
Method and system for dimensional uniformity using charged particle beam lithography Grant 9,343,267 - Fujimura , et al. May 17, 2	2016-05-17
Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam Lithography App 20150338737 - Fujimura; Akira ; et al.	2015-11-26
Method and system for design of enhanced edge slope patterns for charged particle beam lithography Grant 9,057,956 - Fujimura , et al. June 16, 2	2015-06-16
Color distribution design assistance system Grant 9,047,693 - Adachi , et al. June 2, 2	2015-06-02
Method and system for forming high accuracy patterns using charged particle beam lithography Grant 9,043,734 - Fujimura , et al. May 26, 2	2015-05-26
Method and system for dimensional uniformity using charged particle beam lithography Grant 8,959,463 - Fujimura , et al. February 17, 2	2015-02-17
Method and system for forming a diagonal pattern using charged particle beam lithography Grant 8,949,750 - Jacques , et al. February 3, 2	2015-02-03
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography App 20140359542 - Fujimura; Akira ; et al.	2014-12-04
Method and system for forming a diagonal pattern using charged particle beam lithography Grant 8,865,377 - Jacques , et al. October 21, 2	2014-10-21
Method And System For Forming A Diagonal Pattern Using Charged Particle Beam Lithography App 20140272675 - Jacques; Etienne ; et al.	2014-09-18
Method And System For Forming A Diagonal Pattern Using Charged Particle Beam Lithography App 20140282304 - Jacques; Etienne ; et al.	2014-09-18
Method and System for Forming High Accuracy Patterns Using Charged Particle Beam Lithography App 20140223393 - Fujimura; Akira ; et al.	2014-08-07
Color Distribution Design Assistance System App 20140168251 - Adachi; Takashi ; et al.	2014-06-19
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography App 20140129996 - Fujimura; Akira ; et al.	2014-05-08
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography App 20140129997 - Fujimura; Akira ; et al.	2014-05-08
Method And System For Design Of Enhanced Accuracy Patterns For Charged Particle Beam Lithography App 20130252143 - Fujimura; Akira ; et al.	2013-09-26
Method and system for forming high accuracy patterns using charged particle beam lithography Grant 8,473,875 - Fujimura , et al. June 25, 2	2013-06-25
Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur Grant 8,431,914 - Hagiwara , et al. April 30, 2	2013-04-30
Method And System For Design Of Enhanced Edge Slope Patterns For Charged Particle Beam Lithography App 20120221981 - Fujimura; Akira ; et al.	2012-08-30
Method And System For Design Of Enhanced Accuracy Patterns For Charged Particle Beam Lithography App 20120221980 - Fujimura; Akira ; et al.	2012-08-30
Method and System for Forming High Accuracy Patterns Using Charged Particle Beam Lithography App 20120096412 - Fujimura; Akira ; et al.	2012-04-19
Method for optical proximity correction of a reticle to be manufactured using character projection lithography Grant 7,901,845 - Fujimura , et al. March 8, 2	2011-03-08
Method And System For Manufacturing A Surface Using Charged Particle Beam Lithography With Variable Beam Blur App 20110053093 - Hagiwara; Kazuyuki ; et al.	2011-03-03
Method and system for design of a reticle to be manufactured using character projection lithography Grant 7,759,027 - Fujimura , et al. July 20, 2	2010-07-20
Method and system for manufacturing a reticle using character projection particle beam lithography Grant 7,759,026 - Fujimura , et al. July 20, 2	2010-07-20
Method and system for manufacturing a reticle using character projection lithography Grant 7,745,078 - Fujimura , et al. June 29, 2	2010-06-29
Method And System For Manufacturing A Reticle Using Character Projection Particle Beam Lithography App 20100053579 - Fujimura; Akira ; et al.	2010-03-04
Method And System For Manufacturing A Reticle Using Character Projection Lithography App 20100055619 - Fujimura; Akira ; et al.	2010-03-04
Method And System For Design Of A Reticle To Be Manufactured Using Character Projection Lithography App 20100058282 - Fujimura; Akira ; et al.	2010-03-04
Method For Optical Proximity Correction Of A Reticle To Be Manufactured Using Character Projection Lithography App 20100058281 - Fujimura; Akira ; et al.	2010-03-04

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