Patent | Date |
---|
Method for producing a ceramic component composed of a plurality of joined preforms and component obtained by the method Grant 10,696,600 - Polster , et al. June 30, 2 | 2020-06-30 |
Method For Producing A Ceramic Component Composed Of A Plurality Of Joined Preforms And Component Obtained By The Method App 20170226020 - POLSTER; PETER ;   et al. | 2017-08-10 |
Advanced CMOS using super steep retrograde wells Grant 8,703,568 - Babcock , et al. April 22, 2 | 2014-04-22 |
Method For Producing A Ceramic Component Composed Of A Plurality Of Joined Preforms And Component Obtained By The Method App 20140044979 - POLSTER; PETER ;   et al. | 2014-02-13 |
Fully embedded micromechanical device, system on chip and method for manufacturing the same Grant 8,648,432 - Haeusler February 11, 2 | 2014-02-11 |
Processes for producing a polymer-bonded fiber agglomerate and a fiber-reinforced composite material Grant 8,603,374 - Domagalski , et al. December 10, 2 | 2013-12-10 |
Semiconductor Device Including A Deep Contact And A Method Of Manufacturing Such A Device App 20130280906 - Haeusler; Alfred | 2013-10-24 |
Semiconductor device including a deep contact and a method of manufacturing such a device Grant 8,470,679 - Haeusler June 25, 2 | 2013-06-25 |
Fully Embedded Micromechanical Device, System On Chip And Method For Manufacturing The Same App 20130134531 - HAEUSLER; Alfred | 2013-05-30 |
Method For Producing A Component And Component Produced By The Method App 20130115390 - KIENZLE; ANDREAS ;   et al. | 2013-05-09 |
Method For Manufacturing An Electronic Device App 20120205775 - HAEUSLER; Alfred ;   et al. | 2012-08-16 |
Advanced Cmos Using Super Steep Retrograde Wells App 20120164802 - Babcock; Jeffrey A. ;   et al. | 2012-06-28 |
Advanced CMOS using super steep retrograde wells Grant 8,129,246 - Babcock , et al. March 6, 2 | 2012-03-06 |
Tuning of SOI substrate doping Grant 8,093,115 - Schwartz , et al. January 10, 2 | 2012-01-10 |
Processes For Producing A Polymer-bonded Fiber Agglomerate And A Fiber-reinforced Composite Material App 20110316179 - DOMAGALSKI; PETER ;   et al. | 2011-12-29 |
Advanced Cmos Using Super Steep Retrograde Wells App 20110111553 - Babcock; Jeffrey A. ;   et al. | 2011-05-12 |
Tuning Of Soi Substrate Doping App 20110070719 - SCHWARTZ; Wolfgang ;   et al. | 2011-03-24 |
Method of manufacturing an electronic device including a PNP bipolar transistor Grant 7,888,225 - Haeusler February 15, 2 | 2011-02-15 |
Advanced CMOS using super steep retrograde wells Grant 7,883,977 - Babcock , et al. February 8, 2 | 2011-02-08 |
Semiconductor Device Including a Deep Contact and a Method of Manufacturing Such a Device App 20100283119 - HAEUSLER; Alfred | 2010-11-11 |
Dopant Profile Control for Ultrashallow Arsenic Dopant Profiles App 20100148308 - HAEUSLER; Alfred ;   et al. | 2010-06-17 |
Advanced CMOS using super steep retrograde wells Grant 7,655,523 - Babcock , et al. February 2, 2 | 2010-02-02 |
Method Of Manufacturing An Electronic Device Including A Pnp Bipolar Transistor App 20090212393 - Haeusler; Alfred | 2009-08-27 |
Advanced Cmos Using Super Steep Retrograde Wells App 20090130805 - Babcock; Jeffrey A. ;   et al. | 2009-05-21 |
Advanced CMOS using super steep retrograde wells Grant 7,501,324 - Babcock , et al. March 10, 2 | 2009-03-10 |
Advanced CMOS Using Super Steep Retrograde Wells App 20080132012 - Babcock; Jeffrey A. ;   et al. | 2008-06-05 |
Method of fabricating an epitaxial silicon-germanium layer and an integrated semiconductor device comprising an epitaxial arsenic in-situ doped silicon-germanium layer Grant 7,217,322 - Babcock , et al. May 15, 2 | 2007-05-15 |
Advanced CMOS using super steep retrograde wells Grant 7,199,430 - Babcock , et al. April 3, 2 | 2007-04-03 |
Method of fabricating an integrated silicon-germanium heterobipolar transistor and an integrated silicon-germanium heterobipolar transistor Grant 7,118,981 - Haeusler , et al. October 10, 2 | 2006-10-10 |
Advanced CMOS using Super Steep Retrograde Wells App 20060197158 - Babcock; Jeffrey A. ;   et al. | 2006-09-07 |
Advanced CMOS using super steep retrograde wells App 20060175657 - Babcock; Jeffrey A. ;   et al. | 2006-08-10 |
Advanced CMOS using super steep retrograde wells Grant 7,064,399 - Babcock , et al. June 20, 2 | 2006-06-20 |
Method of fabricating an epitaxial silicon-germanium layer and an integrated semiconductor device comprising an epitaxial arsenic in-situ doped silicon-germanium layer App 20050098093 - Babcock, Jeffrey A. ;   et al. | 2005-05-12 |
Method of fabricating an integrated silicon-germanium heterobipolar transistor and an integrated silicon-germanium heterobipolar transistor App 20050001236 - Haeusler, Alfred ;   et al. | 2005-01-06 |
Method for manufacturing and structure of semiconductor device with shallow trench collector contact region App 20040209433 - Babcock, Jeffrey A. ;   et al. | 2004-10-21 |
Semiconductor device with a collector contact in a depressed well-region Grant 6,774,455 - Babcock , et al. August 10, 2 | 2004-08-10 |
Method for manufacturing and structure of semiconductor device with shallow trench collector contact region App 20030062589 - Babcock, Jeffrey A. ;   et al. | 2003-04-03 |
Advanced CMOS using super steep retrograde wells App 20020033511 - Babcock, Jeffrey A. ;   et al. | 2002-03-21 |