Haerle; Andrew G.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Haerle; Andrew G..The latest application filed is for "polishing slurry including zirconia particles and a method of using the polishing slurry".

Company Profile

0.19.17

Haerle; Andrew G. - Sutton MA
Haerle; Andrew G. - Northboro MA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Polishing slurry including zirconia particles and a method of using the polishing slurry Grant 9,410,063 - Haerle , et al. August 9, 2	2016-08-09
Chemical mechanical planarization using nanodiamond Grant 9,343,321 - Wang , et al. May 17, 2	2016-05-17
Polishing Slurry Including Zirconia Particles And A Method Of Using The Polishing Slurry App 20150315441 - Haerle; Andrew G. ; et al.	2015-11-05
Polishing slurry including zirconia particles and a method of using the polishing slurry Grant 9,120,200 - Haerle , et al. September 1, 2	2015-09-01
Chemical Mechanical Planarization Using Nanodiamond App 20150155181 - Wang; Jun ; et al.	2015-06-04
Abrasive Particulate Material Including Superabrasive Material Having A Coating Of Metal App 20150113882 - Tumavitch; Nicholas J. ; et al.	2015-04-30
Chemical mechanical planarization using nanodiamond Grant 8,980,113 - Wang , et al. March 17, 2	2015-03-17
Nickel Coated Diamond Particles And Method Of Making Said Particles App 20150004890 - KRSTIC; Zoran ; et al.	2015-01-01
Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material Grant 8,685,123 - Wang , et al. April 1, 2	2014-04-01
Ceramic particulate material and processes for forming same Grant 8,343,415 - Bauer , et al. January 1, 2	2013-01-01
Ceria material and method of forming same Grant 8,216,328 - Haerle , et al. July 10, 2	2012-07-10
Polishing Slurry Including Zirconia Particles And A Method Of Using The Polishing Slurry App 20120171936 - Haerle; Andrew G. ; et al.	2012-07-05
Ceramic Particulate Material And Processes For Forming Same App 20120153547 - Bauer; Ralph ; et al.	2012-06-21
Polishing slurries Grant 8,105,135 - Laconto , et al. January 31, 2	2012-01-31
Ceria Material And Method Of Forming Same App 20110252714 - Haerle; Andrew G. ; et al.	2011-10-20
Ceria material and method of forming same Grant 7,993,420 - Haerle , et al. August 9, 2	2011-08-09
Chemical Mechanical Planarization Using Nanodiamond App 20100233880 - Wang; Jun ; et al.	2010-09-16
High resistivity silicon carbide Grant 7,727,919 - Haerle , et al. June 1, 2	2010-06-01
Ceria Material And Method Of Forming Same App 20090199488 - Haerle; Andrew G. ; et al.	2009-08-13
High Resistivity Silicon Carbide App 20090111678 - Haerle; Andrew G. ; et al.	2009-04-30
Ceramic Particulate Material And Processes For Forming Same App 20080176075 - Bauer; Ralph ; et al.	2008-07-24
Polishing slurries and methods for utilizing same App 20070087667 - Laconto; Ronald W. ; et al.	2007-04-19
Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material App 20070084134 - Wang; Jun ; et al.	2007-04-19
Method for treating semiconductor processing components and components formed thereby Grant 7,053,411 - Haerle , et al. May 30, 2	2006-05-30
Methods for forming high purity components and components formed thereby Grant 6,881,262 - Haerle , et al. April 19, 2	2005-04-19
Method for treating semiconductor processing components and components formed thereby Grant 6,825,123 - Haerle , et al. November 30, 2	2004-11-30
Method for treating semiconductor processing components and components formed thereby App 20040208815 - Haerle, Andrew G. ; et al.	2004-10-21
Method for treating semiconductor processing components and components formed thereby App 20040209445 - Haerle, Andrew G. ; et al.	2004-10-21
Wafer carrier having improved processing characteristics App 20040188319 - Buckley, Richard F. ; et al.	2004-09-30
Semiconductor processing component having low surface contaminant concentration Grant 6,723,437 - Haerle , et al. April 20, 2	2004-04-20
Process for cleaning ceramic articles Grant 6,565,667 - Haerle , et al. May 20, 2	2003-05-20
Process for cleaning ceramic articles App 20020006766 - Haerle, Andrew G. ; et al.	2002-01-17
Process for cleaning ceramic articles Grant 6,296,716 - Haerle , et al. October 2, 2	2001-10-02

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