Hada; Hideo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hada; Hideo.The latest application filed is for "resist composition, method of forming resist pattern, novel compound, and acid generator".

Company Profile

0.91.89

Hada; Hideo - Kawasaki JP
HADA; Hideo - Kawasaki-shi JP
Hada; Hideo - Kanagawa JP
Hada; Hideo - Kanagawa-ken JP
Hada; Hideo - Kanagawa-shi JP
Hada; Hideo - Hiratsuka JP
Hada, Hideo - Hiratsuka-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern Grant 9,040,220 - Hada , et al. May 26, 2	2015-05-26
Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern Grant 9,034,556 - Hada , et al. May 19, 2	2015-05-19
Resist composition, method of forming resist pattern, novel compound, and acid generator Grant 9,012,129 - Hada , et al. April 21, 2	2015-04-21
Resist composition, method of forming resist pattern, novel compound, and acid generator Grant 8,808,959 - Hada , et al. August 19, 2	2014-08-19
Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern Grant 8,741,538 - Ogata , et al. June 3, 2	2014-06-03
Resist Composition, Method Of Forming Resist Pattern, Novel Compound, And Acid Generator App 20140120472 - HADA; Hideo ; et al.	2014-05-01
Resist composition, method of forming resist pattern, novel compound, and acid generator Grant 8,415,085 - Hada , et al. April 9, 2	2013-04-09
Compound, positive resist composition and resist pattern forming method Grant 8,389,197 - Hirosaki , et al. March 5, 2	2013-03-05
Resist composition, method of forming resist pattern, compound and acid generator Grant 8,367,299 - Kawaue , et al. February 5, 2	2013-02-05
Resist composition, method of forming resist pattern, novel compound, and acid generator Grant 8,338,076 - Kawaue , et al. December 25, 2	2012-12-25
Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern Grant 8,304,163 - Shiono , et al. November 6, 2	2012-11-06
Positive resist composition and method of forming resist pattern Grant 8,293,449 - Iwai , et al. October 23, 2	2012-10-23
Resist Composition, Method Of Forming Resist Pattern, Novel Compound, And Acid Generator App 20120264061 - HADA; Hideo ; et al.	2012-10-18
Compound, positive resist composition and method for formation of resist pattern Grant 8,257,903 - Shiono , et al. September 4, 2	2012-09-04
Compound, acid generator, resist composition, and method of forming resist pattern Grant 8,227,169 - Kawaue , et al. July 24, 2	2012-07-24
Novel Compound And Method Of Producing The Same, Acid Generator, Resist Composition And Method Of Forming Resist Pattern App 20120164580 - Hada; Hideo ; et al.	2012-06-28
Resist composition, method of forming resist pattern, compound and acid generator Grant 8,206,890 - Kawaue , et al. June 26, 2	2012-06-26
Resist composition Grant 8,198,004 - Hirayama , et al. June 12, 2	2012-06-12
Positive resist composition and method of forming resist pattern Grant 8,187,789 - Yonemura , et al. May 29, 2	2012-05-29
Resist composition, method of forming resist pattern, novel compound, and acid generator Grant 8,124,313 - Seshimo , et al. February 28, 2	2012-02-28
Film-forming material and method of forming pattern Grant 8,101,013 - MatsuMaru , et al. January 24, 2	2012-01-24
Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film Grant 8,097,397 - Takayama , et al. January 17, 2	2012-01-17
Resist Composition, Method Of Forming Resist Pattern, Compound And Acid Generator App 20120009521 - Kawaue; Akiya ; et al.	2012-01-12
Method for manufacturing a structure Grant 8,025,923 - Fujikawa , et al. September 27, 2	2011-09-27
Compound, positive resist composition and method for forming resist pattern Grant 8,017,300 - Shiono , et al. September 13, 2	2011-09-13
Resist composition and method of forming resist pattern Grant 8,012,669 - Shimizu , et al. September 6, 2	2011-09-06
Method of forming a nano-structure and the nano-structure Grant 7,993,706 - Fujikawa , et al. August 9, 2	2011-08-09
Compound, method for producing same, positive resist composition and method for forming resist pattern Grant 7,960,089 - Shiono , et al. June 14, 2	2011-06-14
Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern Grant 7,943,284 - Shiono , et al. May 17, 2	2011-05-17
Pattern coating material and pattern forming method Grant 7,932,013 - Matsumaru , et al. April 26, 2	2011-04-26
Compound, Dissolution Inhibitor, Positive Type Resist Composition, And Method Of Forming Resist Pattern App 20110091810 - SHIONO; Daiju ; et al.	2011-04-21
Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator Grant 7,927,780 - Kawaue , et al. April 19, 2	2011-04-19
Materials for photoresist, photoresist composition and method of forming resist pattern Grant 7,910,284 - Kojima , et al. March 22, 2	2011-03-22
Resist composition and process for formation of resist patterns Grant 7,901,865 - Hirayama , et al. March 8, 2	2011-03-08
Positive resist composition and method of forming resist pattern Grant 7,897,319 - Shiono , et al. March 1, 2	2011-03-01
Resist composition for electron beam or EUV Grant 7,879,528 - Watanabe , et al. February 1, 2	2011-02-01
Resist Composition And Method Of Forming Resist Pattern App 20110008728 - NAKAMURA; Tsuyoshi ; et al.	2011-01-13
Compound, positive resist composition and method of forming resist pattern Grant 7,862,981 - Shiono , et al. January 4, 2	2011-01-04
Positive resist composition and method of forming resist pattern Grant 7,855,044 - Takeshita , et al. December 21, 2	2010-12-21
Polymer compound, positive resist composition and resist pattern forming method Grant 7,851,127 - Ogata , et al. December 14, 2	2010-12-14
Resist composition, resist pattern forming method and compound Grant 7,851,129 - Shiono , et al. December 14, 2	2010-12-14
Resin for photoresist composition, photoresist composition and method for forming resist pattern Grant 7,829,259 - Hada , et al. November 9, 2	2010-11-09
Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method Grant 7,807,328 - Ogata , et al. October 5, 2	2010-10-05
Resist composition, method of forming resist pattern, compound and acid generator Grant 7,776,510 - Iwai , et al. August 17, 2	2010-08-17
Process for producing photoresist composition, filter, coater and photoresist composition Grant 7,771,911 - Hada , et al. August 10, 2	2010-08-10
Polymer, positive resist composition and method for forming resist pattern Grant 7,763,412 - Takeshita , et al. July 27, 2	2010-07-27
Compound, Method For Producing Same, Positive Resist Composition And Method For Forming Resist Pattern App 20100183974 - Shiono; Daiju ; et al.	2010-07-22
Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern Grant 7,745,097 - Hada , et al. June 29, 2	2010-06-29
Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method Grant 7,741,008 - Furuya , et al. June 22, 2	2010-06-22
Polymer Compound, Photoresist Composition Containing Such Polymer Compound, And Method For Forming Resist Pattern App 20100151383 - Ogata; Toshiyuki ; et al.	2010-06-17
Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern Grant 7,736,842 - Hada , et al. June 15, 2	2010-06-15
Resist composition, method of forming resist pattern, novel compound, and acid generator App 20100136478 - Kawaue; Akiya ; et al.	2010-06-03
Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method Grant 7,723,007 - Ogata , et al. May 25, 2	2010-05-25
Resist Composition, Method Of Forming Resist Pattern, Novel Compound, And Acid Generator App 20100121077 - Seshimo; Takehiro ; et al.	2010-05-13
Resist composition, method of forming resist pattern, novel compound, and acid generator App 20100119974 - Hada; Hideo ; et al.	2010-05-13
Resist composition, method of forming resist pattern, novel compound, and acid generator Grant 7,713,679 - Ishiduka , et al. May 11, 2	2010-05-11
Compound, Acid Generator, Resist Composition, And Method Of Forming Resist Pattern App 20100104973 - Kawaue; Akiya ; et al.	2010-04-29
Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern Grant 7,700,259 - Ogata , et al. April 20, 2	2010-04-20
Material For Formation Of Protective Film, Method For Formation Of Photoresist Pattern, And Solution For Washing/removal Of Protective Film App 20100086879 - Takayama; Toshikazu ; et al.	2010-04-08
Resist composition, method of forming resist pattern, novel compound, and acid generator Grant 7,682,772 - Seshimo , et al. March 23, 2	2010-03-23
Resist composition and method for forming resist pattern Grant 7,682,770 - Hada , et al. March 23, 2	2010-03-23
Positive Resist Composition And Method Of Forming Resist Pattern App 20100015548 - Takeshita; Masaru ; et al.	2010-01-21
Resist Composition, Method Of Forming Resist Pattern, Compound And Acid Generator App 20100015552 - Kawaue; Akiya ; et al.	2010-01-21
Positive resist composition, method for forming resist pattern and compound Grant 7,648,816 - Shiono , et al. January 19, 2	2010-01-19
Compound, Positive Resist Composition And Method Of Forming Resist Pattern App 20100009284 - Shiono; Daiju ; et al.	2010-01-14
Composition For Formation Of Mold App 20090286936 - Ogata; Toshiyuki ; et al.	2009-11-19
Positive Resist Composition And Method Of Forming Resist Pattern App 20090269700 - Yonemura; Koji ; et al.	2009-10-29
Compound, Positive Resist Composition And Method For Formation Of Resist Pattern App 20090269698 - Shiono; Daiju ; et al.	2009-10-29
Resin for photoresist composition, photoresist composition and method for forming resist pattern Grant 7,592,123 - Hada , et al. September 22, 2	2009-09-22
Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition Grant 7,592,122 - Ogata , et al. September 22, 2	2009-09-22
Resist Composition And Method Of Forming Resist Pattern App 20090226842 - Shimizu; Hiroaki ; et al.	2009-09-10
Compound, Positive Resist Composition And Method For Forming Resist Pattern App 20090202939 - Shiono; Daiju ; et al.	2009-08-13
Polymer Compound, Positive Resist Composition And Resist Pattern Forming Method App 20090162784 - Ogata; Toshiyuki ; et al.	2009-06-25
Novel Compound And Method Of Producing The Same, Acid Generator, Resist Composition And Method Of Forming Resist Pattern App 20090162788 - Hada; Hideo ; et al.	2009-06-25
Resist Composition, Resist Pattern Forming Method And Compound App 20090162781 - Shiono; Daiju ; et al.	2009-06-25
Resist composition, multilayer body, and method for forming resist pattern Grant 7,544,460 - Hada , et al. June 9, 2	2009-06-09
Resin For Photoresist Composition, Photoresist Composition And Method For Forming Resist Pattern App 20090142700 - Hada; Hideo ; et al.	2009-06-04
Positive Resist Composition, Positive Resist Composition For Thermal Flow, And Resist Pattern Forming Method App 20090142696 - Furuya; Sanae ; et al.	2009-06-04
Resist composition Grant 7,541,138 - Hirayama , et al. June 2, 2	2009-06-02
Film-forming Material And Method Of Forming Pattern App 20090134119 - Matsumaru; Shogo ; et al.	2009-05-28
Resist Composition, Method Of Forming Resist Pattern, Novel Compound, And Acid Generator App 20090130597 - Seshimo; Takehiro ; et al.	2009-05-21
Resist Composition App 20090130605 - Hirayama; Taku ; et al.	2009-05-21
Compound, Positive Resist Composition And Resist Pattern Forming Method App 20090117488 - Hirosaki; Takako ; et al.	2009-05-07
Resist composition Grant 7,527,909 - Hirayama , et al. May 5, 2	2009-05-05
Resist Composition, Method Of Forming Resist Pattern, Novel Compound, And Acid Generator App 20090104563 - Ishiduka; Keita ; et al.	2009-04-23
Method For Manufacturing Structure, And Structure App 20090087625 - Fujikawa; Shigenori ; et al.	2009-04-02
Compound, Dissolution Inhibitor, Positive Type Resist Composition, And Method Of Forming Resist Pattern App 20090081580 - Shiono; Daiju ; et al.	2009-03-26
Positive resist composition, method for resist pattern formation and compound Grant 7,504,196 - Shiono , et al. March 17, 2	2009-03-17
Resist Composition, Method Of Forming Resist Pattern, Novel Compound And Method Of Producing The Same, And Acid Generator App 20090068591 - Kawaue; Akiya ; et al.	2009-03-12
Resist composition Grant 7,501,220 - Hirayama , et al. March 10, 2	2009-03-10
Positive type resist composition and resist pattern formation method using same Grant 7,501,221 - Iwai , et al. March 10, 2	2009-03-10
Anisotropic Film And Method Of Manufacturing Anisotropic Film App 20090061170 - Fujikawa; Shigenori ; et al.	2009-03-05
Positive resist compositions and process for the formation of resist patterns with the same Grant 7,494,759 - Hada , et al. February 24, 2	2009-02-24
Resist composition, method of forming resist pattern, compound and acid generator Grant 7,488,568 - Iwai , et al. February 10, 2	2009-02-10
Positive Resist Composition, Method For Forming Resist Pattern And Compound App 20090035691 - Shiono; Daiju ; et al.	2009-02-05
Pattern Coating Material And Pattern Forming Method App 20090029284 - Matsumaru; Shogo ; et al.	2009-01-29
Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns Grant 7,482,108 - Matsumaru , et al. January 27, 2	2009-01-27
Novel Compound, Manufacturing Method Thereof, Acid Generator, Resist Composition And Method Of Forming A Resist Pattern App 20090023095 - Hada; Hideo ; et al.	2009-01-22
Resist Composition, Method Of Forming Resist Pattern, Compound And Acid Generator App 20080311522 - Iwai; Takeshi ; et al.	2008-12-18
Positive type resist composition and resist pattern formation method using same Grant 7,435,530 - Iwai , et al. October 14, 2	2008-10-14
Resist Composition, Method Of Forming Resist Pattern, Compound And Acid Generator App 20080248422 - Iwai; Takeshi ; et al.	2008-10-09
Positive Resist Composition For Immersion Exposure and Method of Forming Resist Pattern App 20080193871 - Ogata; Toshiyuki ; et al.	2008-08-14
Resist composition for electron beam or EUV Grant 7,407,734 - Watanabe , et al. August 5, 2	2008-08-05
Resist Composition For Electron Beam Or Euv App 20080176170 - Watanabe; Takeo ; et al.	2008-07-24
Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method App 20080166655 - Ogata; Toshiyuki ; et al.	2008-07-10
Positive type resist composition and resist pattern formation method using same Grant 7,390,612 - Iwai , et al. June 24, 2	2008-06-24
Positive Resist Composition, Method For Resist Pattern Formation and Compound App 20080145784 - Shiono; Daiju ; et al.	2008-06-19
Materials For Photoresist, Photoresist Composition And Method Of Forming Resist Pattern App 20080081281 - KOJIMA; Kyoko ; et al.	2008-04-03
Polymer, Positive Resist Composition and Method for Forming Resist Pattern App 20080063975 - Takeshita; Masaru ; et al.	2008-03-13
Method of Forming a Nano-Structure and the Nano-Structure App 20080050564 - Fujikawa; Shigenori ; et al.	2008-02-28
Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound Grant 7,326,512 - Ogata , et al. February 5, 2	2008-02-05
Positive type resist composition and resist pattern formation method using same Grant 7,326,515 - Iwai , et al. February 5, 2	2008-02-05
Positive type resist composition and resist pattern formation method using same Grant 7,323,287 - Iwai , et al. January 29, 2	2008-01-29
Resist Composition and Process for Formation of Resist Patterns App 20080020288 - Hirayama; Taku ; et al.	2008-01-24
Positive type resist composition and resist pattern formation method using same Grant 7,316,888 - Iwai , et al. January 8, 2	2008-01-08
Method of forming resist pattern, positive resist composition, and layered product Grant 7,316,885 - Hada , et al. January 8, 2	2008-01-08
Positive type resist composition and resist pattern formation method using same Grant 7,316,889 - Iwai , et al. January 8, 2	2008-01-08
Process for refining crude resin for electronic material Grant 7,312,015 - Hada , et al. December 25, 2	2007-12-25
Resist Composition and Method for Forming Resist Pattern App 20070275307 - Hada; Hideo ; et al.	2007-11-29
Decomposable composition and method for using the same App 20070275328 - Shiono; Daiju ; et al.	2007-11-29
Resist Composition for Electron Beam or Euv (Extreme Ultraviolet) and Method for Forming Resist Pattern App 20070269744 - Hada; Hideo ; et al.	2007-11-22
Positive Resist Composition and Method of Forming Resist Pattern App 20070259273 - Shiono; Daiju ; et al.	2007-11-08
Polymer Compound, Acid Generator, Positive Resist Composition, and Method for Formation of Resist Patterns App 20070231708 - Matsumaru; Shogo ; et al.	2007-10-04
Process for refining crude resin for resist Grant 7,276,575 - Hada , et al. October 2, 2	2007-10-02
Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same App 20070224538 - Hada; Hideo ; et al.	2007-09-27
Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern App 20070224520 - Ogata; Toshiyuki ; et al.	2007-09-27
Resist Composition App 20070190436 - Hirayama; Taku ; et al.	2007-08-16
Positive Type Resist Composition And Resist Pattern Formation Method Using Same App 20070190455 - Iwai; Takeshi ; et al.	2007-08-16
Resist Composition App 20070178394 - Hirayama; Taku ; et al.	2007-08-02
Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method App 20070172757 - Ogata; Toshiyuki ; et al.	2007-07-26
Resist composition for electron beam or euv App 20070077512 - Watanabe; Takeo ; et al.	2007-04-05
Resin for photoresist composition, photoresist composition and method for forming resist pattern App 20070065748 - Hada; Hideo ; et al.	2007-03-22
Negative-working photoresist composition Grant 7,183,368 - Hada , et al. February 27, 2	2007-02-27
Photoresist composition and, used in the photoresist composition, low-molecular compound and high-molecular compound App 20060210913 - Ogata; Toshiyuki ; et al.	2006-09-21
Positive resist composition and method for forming resist pattern using same App 20060194141 - Hada; Hideo ; et al.	2006-08-31
Resin for resist positive resist composition and method of forming resist pattern App 20060183876 - Hayashi; Ryotaro ; et al.	2006-08-17
Resist composition, multilayer body, and method for forming resist pattern App 20060154174 - Hada; Hideo ; et al.	2006-07-13
Method of forming resist pattern, positive resist composition, and layered product App 20060154181 - Hada; Hideo ; et al.	2006-07-13
Positive resist composition and method of forming resist pattern from the same Grant 7,074,543 - Iwai , et al. July 11, 2	2006-07-11
Polymer and positive type resist composition App 20060147832 - Hada; Hideo ; et al.	2006-07-06
Process for refining crude resin for electronic material App 20060141384 - Hada; Hideo ; et al.	2006-06-29
Resist composition and method of forming resist pattern using same App 20060141382 - Takeshita; Masaru ; et al.	2006-06-29
Positive type resist composition and resist pattern formation method using same App 20060134553 - Iwai; Takeshi ; et al.	2006-06-22
Process for refining crude resin for resist App 20060135745 - Hada; Hideo ; et al.	2006-06-22
Positive type resist composition and resist pattern formation method using same App 20060134552 - Iwai; Takeshi ; et al.	2006-06-22
Positive type resist composition and resist pattern formation method using same App 20060127807 - Iwai; Takeshi ; et al.	2006-06-15
Positive type resist composition and resist pattern formation method using same App 20060127808 - Iwai; Takeshi ; et al.	2006-06-15
Positive type resist composition and resist pattern formation method using same App 20060127806 - Iwai; Takeshi ; et al.	2006-06-15
Process for producing photoresist composition, filter, coater and photoresist composition App 20060014098 - Hada; Hideo ; et al.	2006-01-19
Method of producing (meth) acrylic acid derivative polymer for resist App 20060009583 - Kubota; Naotaka ; et al.	2006-01-12
Positive resist composition and method of forming resist pattern Grant 6,982,140 - Hada , et al. January 3, 2	2006-01-03
Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound App 20050130056 - Ogata, Toshiyuki ; et al.	2005-06-16
Negative-working photoresist composition Grant 6,897,012 - Hada , et al. May 24, 2	2005-05-24
Positive type resist composition and resist pattern formation method using same App 20050095535 - Iwai, Takeshi ; et al.	2005-05-05
Negative-working photoresist composition App 20050065312 - Hada, Hideo ; et al.	2005-03-24
Resist composition App 20050014090 - Hirayama, Taku ; et al.	2005-01-20
Negative-working photoresist composition App 20040202966 - Hada, Hideo ; et al.	2004-10-14
Positive-working resist composition Grant 6,759,176 - Iwai , et al. July 6, 2	2004-07-06
Negative-working photoresist composition Grant 6,749,991 - Hada , et al. June 15, 2	2004-06-15
Positive-working photoresist composition Grant 6,749,989 - Hada , et al. June 15, 2	2004-06-15
Positive resist composition and method of forming resist pattern from the same App 20040110085 - Iwai, Takeshi ; et al.	2004-06-10
Positive resist composition and method of forming resist pattern App 20040058270 - Iwai, Takeshi ; et al.	2004-03-25
Positive resist composition and method of forming resist pattern App 20040058269 - Hada, Hideo ; et al.	2004-03-25
Negative-working photoresist composition App 20030008233 - Hada, Hideo ; et al.	2003-01-09
Positive-working resist composition App 20020102492 - Iwai, Takeshi ; et al.	2002-08-01
Positive-working photoresist composition App 20020068238 - Hada, Hideo ; et al.	2002-06-06
Chemical-sensitization photoresist composition Grant 6,388,101 - Hada , et al. May 14, 2	2002-05-14
Negative-working photoresist composition App 20010049073 - Hada, Hideo ; et al.	2001-12-06
Chemical-sensitization photoresist composition Grant 6,063,953 - Hada , et al. May 16, 2	2000-05-16
Chemical-sensitization photoresist composition Grant 6,022,666 - Hada , et al. February 8, 2	2000-02-08
Compounds for use in a positive-working resist composition Grant 5,929,271 - Hada , et al. July 27, 1	1999-07-27
Cyano group-containing oxime sulfonate compounds Grant 5,892,095 - Hada , et al. April 6, 1	1999-04-06
Cyanooxime sulfonate compound Grant 5,714,625 - Hada , et al. February 3, 1	1998-02-03