Habiro; Masanobu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Habiro; Masanobu.The latest application filed is for "polishing solution for cmp and polishing method using the polishing solution".

Company Profile

0.5.7

Habiro; Masanobu - Hitachi JP
Habiro; Masanobu - Hitachi-shi JP
Habiro; Masanobu - Tsukuba JP
Habiro; Masanobu - Ibaraki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Polishing solution for CMP and polishing method using the polishing solution Grant 9,022,834 - Satou , et al. May 5, 2	2015-05-05
Polishing slurry for metal, and polishing method Grant 8,486,837 - Ono , et al. July 16, 2	2013-07-16
Polishing Solution For Cmp And Polishing Method Using The Polishing Solution App 20110275285 - Satou; Eiichi ; et al.	2011-11-10
Polishing Slurry For Cmp App 20110027994 - Mabuchi; Katsumi ; et al.	2011-02-03
Polishing slurry for metal, and polishing method App 20090117829 - Ono; Hiroshi ; et al.	2009-05-07
Polishing pad for CMP, method for polishing substrate using it and method for producing polishing pad for CMP Grant 7,374,474 - Nishiyama , et al. May 20, 2	2008-05-20
Polishing Slurry for Cmp App 20080105651 - Mabuchi; Katsumi ; et al.	2008-05-08
Abrasive-free polishing slurry and CMP process App 20070147551 - Mabuchi; Katsumi ; et al.	2007-06-28
Polishing fluid for metal, and polishing method App 20060143990 - Ono; Hiroshi ; et al.	2006-07-06
Polishing pad for cmp, method for polishing substrate using it and method for producing polishing pad for cmp App 20040224623 - Nishiyama, Masaya ; et al.	2004-11-11

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