loadpatents
Patent applications and USPTO patent grants for HAAG; Walter.The latest application filed is for "filter candle".
Patent | Date |
---|---|
Filter Candle App 20210379521 - HEIDENREICH; Steffen ;   et al. | 2021-12-09 |
Antimicrobial glass coating Grant 10,130,097 - Meier , et al. November 20, 2 | 2018-11-20 |
Antimicrobial Glass Coating App 20170231229 - Meier; Pascal ;   et al. | 2017-08-17 |
Hot gas filtration system and process for regenerating said system Grant 9,669,344 - Heidenreich , et al. June 6, 2 | 2017-06-06 |
Hot Gas Filtration System And Process For Regenerating Said System App 20130220125 - HEIDENREICH; Steffen ;   et al. | 2013-08-29 |
Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source Grant 7,718,042 - Kadlec , et al. May 18, 2 | 2010-05-18 |
Sliding anode magnetron sputtering source Grant 7,678,239 - Haag , et al. March 16, 2 | 2010-03-16 |
Method Of Manufacturing At Least One Sputter-coated Substrate And Sputter Source App 20070175748 - Atamny; Fachri ;   et al. | 2007-08-02 |
Sputter method or device for the production of natural voltage optimized coatings App 20070009670 - Haag; Walter | 2007-01-11 |
Sputter method or device for the production of natural voltage optimized coatings App 20050233089 - Haag, Walter | 2005-10-20 |
Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source App 20050199485 - Kadlec, Stanislav ;   et al. | 2005-09-15 |
Method of manufacturing an object in a vacuum recipient Grant 6,878,248 - Signer , et al. April 12, 2 | 2005-04-12 |
Method for manufacturing a workpiece using a magnetron sputter source Grant 6,860,977 - Heinz , et al. March 1, 2 | 2005-03-01 |
Sliding anode magnetron sputtering source App 20050034975 - Haag, Walter ;   et al. | 2005-02-17 |
Magnetron atomization source and method of use thereof Grant 6,776,881 - Gruenenfelder , et al. August 17, 2 | 2004-08-17 |
Method for manufacturing a workpiece using a magnetron sputter source App 20040149565 - Heinz, Bernd ;   et al. | 2004-08-05 |
Magnetron sputter source Grant 6,682,637 - Heinz , et al. January 27, 2 | 2004-01-27 |
Method of producing flat panels Grant 6,679,977 - Haag , et al. January 20, 2 | 2004-01-20 |
Method of manufacturing an object in a vacuum recipient App 20030178300 - Signer, Hans ;   et al. | 2003-09-25 |
Magnetron sputter source App 20030136671 - Heinz, Bernd ;   et al. | 2003-07-24 |
Method of producing flat panels App 20030062255 - Haag, Walter ;   et al. | 2003-04-03 |
Magnetron sputtering source and method of use thereof Grant 6,540,883 - Gruenenfelder , et al. April 1, 2 | 2003-04-01 |
Magnetron atomization source and method of use thereof App 20030019740 - Gruenenfelder, Pius ;   et al. | 2003-01-30 |
Method of manufacturing an object in a vacuum recipient App 20020153242 - Signer, Hans ;   et al. | 2002-10-24 |
Magnetron sputtering source App 20020036133 - Haag, Walter ;   et al. | 2002-03-28 |
Process for sputter coating, a sputter coating source, and sputter coating apparatus with at least one such source Grant 6,337,001 - Haag , et al. January 8, 2 | 2002-01-08 |
Method of producing flat panels Grant 6,284,106 - Haag , et al. September 4, 2 | 2001-09-04 |
Method of manufacturing an object in a vacuum recipient Grant 6,176,979 - Signer , et al. January 23, 2 | 2001-01-23 |
Magnetron sputtering source Grant 6,093,293 - Haag , et al. July 25, 2 | 2000-07-25 |
Method of controlling a treatment process and vacuum treatment apparatus Grant 5,948,224 - Signer , et al. September 7, 1 | 1999-09-07 |
Sputter source with a target arrangement and a holding device Grant 5,833,823 - Gruenenfelder , et al. November 10, 1 | 1998-11-10 |
Sputter coating station Grant 5,753,089 - Haag May 19, 1 | 1998-05-19 |
Magnetron atomization source and method of use thereof Grant 5,688,381 - Gruenenfelder , et al. November 18, 1 | 1997-11-18 |
Method for the cooling of targets as well as cooling device for targets Grant 5,039,913 - Wegmann , et al. August 13, 1 | 1991-08-13 |
Method and apparatus for the reactive vapor deposition of layers of oxides, nitrides, oxynitrides and carbides on a substrate Grant 4,619,748 - Moll , et al. October 28, 1 | 1986-10-28 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.