HA; Tae Joong

Patent Applications and Registrations

Patent applications and USPTO patent grants for HA; Tae Joong.The latest application filed is for "pellicle for euv lithography and method of manufacturing the same".

Company Profile

0.10.14

HA; Tae Joong - Icheon-si Gyeonggi-do KR
HA; Tae Joong - Daejeon KR
Ha; Tae Joong - Cheongju-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Pellicle For Euv Lithography And Method Of Manufacturing The Same App 20220252973 - HA; Tae Joong	2022-08-11
Methods Of Fabricating Phase Shift Photomasks App 20220121106 - RYU; Choong Han ; et al.	2022-04-21
Blank Phase Shift Photomasks, Phase Shift Photomasks Fabricated Using Blank Phase Shift Photomasks, And Methods Of Fabricating P App 20190354004 - RYU; Choong Han ; et al.	2019-11-21
Photomask including transfer patterns for reducing a thermal stress Grant 10,338,464 - Ha	2019-07-02
Photomask blank and photomask for suppressing heat absorption Grant 10,036,950 - Ha July 31, 2	2018-07-31
Photomask Including Transfer Patterns For Reducing A Thermal Stress App 20180074396 - HA; Tae Joong	2018-03-15
Photomask including transfer patterns for reducing a thermal stress Grant 9,846,358 - Ha December 19, 2	2017-12-19
Reflective mask and method of fabricating the same Grant 9,612,524 - Lee , et al. April 4, 2	2017-04-04
Photomask Blank And Photomask For Suppressing Heat Absorption App 20160363855 - HA; Tae Joong	2016-12-15
Photomask Including Transfer Patterns For Reducing A Thermal Stress App 20160291459 - HA; Tae Joong	2016-10-06
Photomask blank and photomask for suppressing heat absorption Grant 9,454,073 - Ha September 27, 2	2016-09-27
Reflective Mask And Method Of Fabricating The Same App 20160209741 - LEE; In Hwan ; et al.	2016-07-21
Photomask Blank And Photomask For Suppressing Heat Absorption App 20150227040 - HA; Tae Joong	2015-08-13
Method for correcting pattern critical dimension in photomask Grant 7,993,802 - Ha August 9, 2	2011-08-09
Method of correcting defect in photomask Grant 7,955,760 - Ha , et al. June 7, 2	2011-06-07
Method with correction of hard mask pattern critical dimension for fabricating photomask Grant 7,901,844 - Ha March 8, 2	2011-03-08
Photomask and method of fabricating the same Grant 7,901,849 - Ha March 8, 2	2011-03-08
Method for repairing bridge in photo mask Grant 7,670,728 - Ha March 2, 2	2010-03-02
Method for Correcting Pattern Critical Dimension in Photomask App 20100003607 - Ha; Tae Joong	2010-01-07
Photomask and Method of Fabricating the Same App 20090253052 - Ha; Tae Joong	2009-10-08
Method of Correcting Defect in Photomask App 20090098470 - Ha; Tae Joong ; et al.	2009-04-16
Method for Fabricating Photomask App 20090075181 - Ha; Tae Joong	2009-03-19
Blank Mask and Method for Fabricating Photomask Using the Same App 20090053620 - Ha; Tae Joong	2009-02-26
Method For Repairing Bridge In Photo Mask App 20080160428 - Ha; Tae Joong	2008-07-03

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