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name:-0.0077888965606689
name:-0.0064160823822021
name:-0.0075540542602539
HA; Soon-mok Patent Filings

HA; Soon-mok

Patent Applications and Registrations

Patent applications and USPTO patent grants for HA; Soon-mok.The latest application filed is for "micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing t".

Company Profile
6.3.5
  • HA; Soon-mok - Hwaseong-si KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Micro-pattern Forming Method, Capacitor And Method Of Manufacturing The Same, Semiconductor Device And Method Of Manufacturing T
App 20200152638 - HA; Soon-mok ;   et al.
2020-05-14
Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor device
Grant 10,644,006 - Ha , et al.
2020-05-05
Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor device
Grant 10,600,789 - Ha , et al.
2020-03-24
Photomask For Negative-tone Development
App 20200089100 - HA; Soon Mok ;   et al.
2020-03-19
Micro-pattern Forming Method, Capacitor And Method Of Manufacturing The Same, Semiconductor Device And Method Of Manufacturing T
App 20190157276 - HA; Soon-mok ;   et al.
2019-05-23
Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor device
Grant 10,204,912 - Ha , et al. Feb
2019-02-12
Micro-pattern Forming Method, Capacitor And Method Of Manufacturing The Same, Semiconductor Device And Method Of Manufacturing The Same, And Electronic System Including Semiconductor Device
App 20180175043 - HA; Soon-mok ;   et al.
2018-06-21
Methods of Forming Pattern by Using Dual Tone Development Processes
App 20150309411 - HWANG; Sung-wook ;   et al.
2015-10-29

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