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Electronic device and method for fabricating the same Grant 11,245,070 - Ha , et al. February 8, 2 | 2022-02-08 |
Electronic device and method for fabricating the same Grant 11,183,629 - Ha November 23, 2 | 2021-11-23 |
Electronic Device And Method For Fabricating The Same App 20200313077 - Ha; Ga-Young | 2020-10-01 |
Electronic device and method for fabricating the same Grant 10,600,956 - Ha | 2020-03-24 |
Electronic device and method for fabricating the same using treatment with nitrogen and hydrogen Grant 10,559,422 - Ha , et al. Feb | 2020-02-11 |
Semiconductor memory with a multi-layer passivation layer formed over sidewalls of a variable resistance element Grant 10,522,738 - Ha Dec | 2019-12-31 |
Electronic Device And Method For Fabricating The Same App 20190280199 - Ha; Ga-Young ;   et al. | 2019-09-12 |
Electronic Device And Method For Fabricating The Same App 20190214546 - Ha; Ga-Young | 2019-07-11 |
Electronic device and method for fabricating the same Grant 10,333,060 - Ha , et al. | 2019-06-25 |
Electronic device and method for fabricating the same Grant 10,333,061 - Ha , et al. | 2019-06-25 |
Electronic Device And Method For Fabricating The Same App 20190067565 - Ha; Ga-Young ;   et al. | 2019-02-28 |
Electronic Device And Method For Fabricating The Same App 20190036014 - Ha; Ga-Young | 2019-01-31 |
Electronic Device And Method For Fabricating The Same App 20180182956 - Ha; Ga-Young ;   et al. | 2018-06-28 |
Electronic Device And Method For Fabricating The Same App 20180123030 - Ha; Ga-Young ;   et al. | 2018-05-03 |
Electronic Device And Method For Fabricating The Same App 20180114639 - Ha; Ga-Young ;   et al. | 2018-04-26 |
Electronic Device And Method Of Fabricating The Same App 20170200883 - Ha; Ga-Young | 2017-07-13 |
Electronic device and method for fabricating the same Grant 9,619,392 - Do , et al. April 11, 2 | 2017-04-11 |
Semiconductor memory with a multi-layer passivation layer formed over sidewalls of a variable resistance element Grant 9,559,298 - Ha January 31, 2 | 2017-01-31 |
Electronic device and method for fabricating the same Grant 9,515,250 - Ha December 6, 2 | 2016-12-06 |
Semiconductor Device And Method For Fabricating The Same App 20160181510 - HA; Ga-Young ;   et al. | 2016-06-23 |
Electronic Device And Method For Fabricating The Same App 20160079524 - Do; Kwan-Woo ;   et al. | 2016-03-17 |
Nonvolatile Semiconductor Memory Device And Method Of Manufacturing The Same App 20150295170 - TSUBATA; Shuichi ;   et al. | 2015-10-15 |
Electronic Device And Method For Fabricating The Same App 20150249204 - Ha; Ga-Young | 2015-09-03 |
Nonvolatile semiconductor memory device and method of manufacturing the same Grant 9,093,632 - Tsubata , et al. July 28, 2 | 2015-07-28 |
Semiconductor device and method for fabricating the same Grant 9,029,964 - Ha , et al. May 12, 2 | 2015-05-12 |
Electronic Device And Method Of Fabricating The Same App 20150092482 - Ha; Ga-Young | 2015-04-02 |
Nonvolatile Semiconductor Memory Device And Method Of Manufacturing The Same App 20150069559 - TSUBATA; Shuichi ;   et al. | 2015-03-12 |
Semiconductor device and method for fabricating the same Grant 8,866,216 - Ha , et al. October 21, 2 | 2014-10-21 |
Method for forming tungsten film having low resistivity and good surface roughness and method for forming wiring of semiconductor device using the same Grant 8,629,062 - Ha , et al. January 14, 2 | 2014-01-14 |
Semiconductor Device And Method For Fabricating The Same App 20130075842 - HA; Ga Young ;   et al. | 2013-03-28 |
Semiconductor Device And Method For Fabricating The Same App 20130075841 - HA; Ga Young ;   et al. | 2013-03-28 |
Semiconductor Device And Method For Fabricating The Same App 20120012926 - HA; Ga Young ;   et al. | 2012-01-19 |
Method For Forming Metal Line Of Semiconductor Device Without Production Of Sidewall Oxide In Metal Line Forming Region App 20090184422 - HA; Ga Young ;   et al. | 2009-07-23 |
Dual damascene method of forming a metal line of semiconductor device Grant 7,550,389 - Yoo , et al. June 23, 2 | 2009-06-23 |
Method For Forming Tungsten Film Having Low Resistivity And Good Surface Roughness And Method For Forming Wiring Of Semiconductor Device Using The Same App 20090142925 - HA; Ga Young ;   et al. | 2009-06-04 |