loadpatents
name:-0.0040898323059082
name:-0.0036921501159668
name:-0.0054059028625488
Gurevich; Evgeni Patent Filings

Gurevich; Evgeni

Patent Applications and Registrations

Patent applications and USPTO patent grants for Gurevich; Evgeni.The latest application filed is for "imaging overlay targets using moire elements and rotational symmetry arrangements".

Company Profile
6.4.8
  • Gurevich; Evgeni - Yokneam Illit IL
  • Gurevich; Evgeni - Yoqneam Ilit IL
  • Gurevich; Evgeni - Yoqneam Ylit IL
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Imaging Overlay Targets Using Moire Elements And Rotational Symmetry Arrangements
App 20220171297 - Feler; Yoel ;   et al.
2022-06-02
Imaging overlay targets using Moire elements and rotational symmetry arrangements
Grant 11,256,177 - Feler , et al. February 22, 2
2022-02-22
Misregistration metrology by using fringe Moire and optical Moire effects
Grant 11,164,307 - Feler , et al. November 2, 2
2021-11-02
Accuracy Improvements In Optical Metrology
App 20210175132 - Bringoltz; Barak ;   et al.
2021-06-10
Reduction Or Elimination Of Pattern Placement Error In Metrology Measurements
App 20210149296 - Feler; Yoel ;   et al.
2021-05-20
Imaging Overlay Targets Using Moire Elements and Rotational Symmetry Arrangements
App 20210072650 - Feler; Yoel ;   et al.
2021-03-11
Determining the impacts of stochastic behavior on overlay metrology data
Grant 10,901,325 - Gurevich , et al. January 26, 2
2021-01-26
Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology
Grant 10,831,108 - Marciano , et al. November 10, 2
2020-11-10
Reduction Or Elimination Of Pattern Placement Error In Metrology Measurements
App 20190250504 - Feler; Yoel ;   et al.
2019-08-15
Determining The Impacts Of Stochastic Behavior On Overlay Metrology Data
App 20190049858 - GUREVICH; Evgeni ;   et al.
2019-02-14
Accuracy Improvements In Optical Metrology
App 20180047646 - Bringoltz; Barak ;   et al.
2018-02-15
Methods Of Analyzing And Utilizing Landscapes To Reduce Or Eliminate Inaccuracy In Overlay Optical Metrology
App 20160313658 - Marciano; Tal ;   et al.
2016-10-27

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