loadpatents
Patent applications and USPTO patent grants for Guo; Baonian.The latest application filed is for "ion implantation to reduce nanosheet gate length variation".
Patent | Date |
---|---|
Ion implantation to reduce nanosheet gate length variation Grant 11,430,877 - Gu , et al. August 30, 2 | 2022-08-30 |
Ion Implantation To Reduce Nanosheet Gate Length Variation App 20220157968 - Gu; Sipeng ;   et al. | 2022-05-19 |
Uniform gate dielectric for DRAM device Grant 10,522,549 - Guo , et al. Dec | 2019-12-31 |
Uniform Gate Dielectric For Dram Device App 20190259764 - Guo; Baonian ;   et al. | 2019-08-22 |
FinFET device fabrication using thermal implantation Grant 8,722,431 - Pradhan , et al. May 13, 2 | 2014-05-13 |
Finfet Device Fabrication Using Thermal Implantation App 20130252349 - Pradhan; Nilay Anil ;   et al. | 2013-09-26 |
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