loadpatents
name:-0.017637014389038
name:-0.012714862823486
name:-0.0083529949188232
Gu; Man Patent Filings

Gu; Man

Patent Applications and Registrations

Patent applications and USPTO patent grants for Gu; Man.The latest application filed is for "finfet with shorter fin height in drain region than source region and related method".

Company Profile
8.12.14
  • Gu; Man - Malta NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
LDMOS finFET structure with buried insulator layer and method for forming same
Grant 11,410,998 - Li , et al. August 9, 2
2022-08-09
Transistors with hybrid source/drain regions
Grant 11,374,002 - Li , et al. June 28, 2
2022-06-28
Passive devices over polycrystalline semiconductor fins
Grant 11,289,474 - Gu , et al. March 29, 2
2022-03-29
Finfet With Shorter Fin Height In Drain Region Than Source Region And Related Method
App 20220052158 - Gu; Man ;   et al.
2022-02-17
Transistors with an asymmetrical source and drain
Grant 11,239,366 - Li , et al. February 1, 2
2022-02-01
Transistors With Hybrid Source/drain Regions
App 20220028854 - Li; Wenjun ;   et al.
2022-01-27
Ic Structure With Fin Having Subfin Extents With Different Lateral Dimensions
App 20220005954 - Gu; Man ;   et al.
2022-01-06
FinFET with shorter fin height in drain region than source region and related method
Grant 11,211,453 - Gu , et al. December 28, 2
2021-12-28
Novel Gate Structure For An Ldmos Transistor Device
App 20210351293 - Gu; Man ;   et al.
2021-11-11
Passive devices over polycrystalline semiconductor fins
App 20210327872 - Gu; Man ;   et al.
2021-10-21
Integrated Circuit Structure Including Asymmetric, Recessed Source And Drain Region And Method For Forming Same
App 20210273094 - Gu; Man ;   et al.
2021-09-02
Ldmos Finfet Structure With Buried Insulator Layer And Method For Forming Same
App 20210265342 - Li; Wenjun ;   et al.
2021-08-26
Field-effect transistors with diffusion blocking spacer sections
Grant 11,101,364 - Mulfinger , et al. August 24, 2
2021-08-24
Transistors With Asymmetrically-positioned Source/drain Regions
App 20210249307 - Gu; Man ;   et al.
2021-08-12
Transistors With An Asymmetrical Source And Drain
App 20210242339 - Li; Wenjun ;   et al.
2021-08-05
Epitaxial structures of a semiconductor device having a wide gate pitch
Grant 10,971,625 - Aquilino , et al. April 6, 2
2021-04-06
Methods of forming source/drain regions of a FinFET device and the resulting structures
Grant 10,964,598 - Liu , et al. March 30, 2
2021-03-30
Methods Of Forming Source/drain Regions Of A Finfet Device And The Resulting Structures
App 20210020515 - Liu; Bingwu ;   et al.
2021-01-21
Epitaxial Structures Of A Semiconductor Device Having A Wide Gate Pitch
App 20200411689 - AQUILINO; MICHAEL V. ;   et al.
2020-12-31
Formation of epi source/drain material on transistor devices and the resulting structures
Grant 10,777,463 - Gu , et al. Sept
2020-09-15
Field-effect Transistors With Diffusion Blocking Spacer Sections
App 20200287019 - Mulfinger; George R. ;   et al.
2020-09-10
Spacer with laminate liner
Grant 10,755,918 - Gu , et al. A
2020-08-25
Formation Of Epi Source/drain Material On Transistor Devices And The Resulting Structures
App 20200227320 - Gu; Man ;   et al.
2020-07-16
Spacer With Laminate Liner
App 20200161122 - GU; Man ;   et al.
2020-05-21
Semiconductor devices with robust low-k sidewall spacers and method for producing the same
Grant 10,192,791 - Gu , et al. Ja
2019-01-29
Laminated spacers for field-effect transistors
Grant 10,008,456 - Han , et al. June 26, 2
2018-06-26

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