Gschwandtner; Alexander

Patent Applications and Registrations

Patent applications and USPTO patent grants for Gschwandtner; Alexander.The latest application filed is for "method for forming a layer on a substrate at low temperatures".

Company Profile

0.10.13

Gschwandtner; Alexander - Munich N/A DE
Gschwandtner; Alexander - Munchen DE
Gschwandtner; Alexander - Muenchen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for forming a layer on a substrate at low temperatures Grant 9,252,011 - Niess , et al. February 2, 2	2016-02-02
Method For Forming A Layer On A Substrate At Low Temperatures App 20140179117 - Niess; Jurgen ; et al.	2014-06-26
Method And Device For Cleaning The Waste Gases Of A Processing System App 20100322827 - Gschwandtner; Alexander	2010-12-23
Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles Grant 7,665,416 - Gschwandtner , et al. February 23, 2	2010-02-23
Process For Forming A Dielectric On A Copper-containing Metallization And Capacitor Arrangement App 20090269914 - Gschwandtner; Alexander ; et al.	2009-10-29
Semiconductor Device and Method for Producing the Same App 20090122460 - Gschwandtner; Alexander ; et al.	2009-05-14
Method Of Depositing Silicon With High Step Coverage App 20080003763 - Raaijmakers; Ivo ; et al.	2008-01-03
Device for producing excited and/or ionized particles in a plasma App 20070227451 - Gschwandtner; Alexander	2007-10-04
Device and method for generating excited and/or ionized particles in a plasma App 20070189918 - Gschwandtner; Alexander	2007-08-16
Use of dissolved hafnium alkoxides or zirconium alkoxides as precursors for hafnium oxide and hafnium oxynitride layers or zirconium oxide and zirconium oxynitride layers App 20070031599 - Gschwandtner; Alexander ; et al.	2007-02-08
Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles App 20060290301 - Gschwandtner; Alexander ; et al.	2006-12-28
Process for forming a dielectric on a copper-containing metallization and capacitor arrangement App 20060252240 - Gschwandtner; Alexander ; et al.	2006-11-09
Device to generate excited/ionized particles in a plasma Grant 6,706,141 - Steinhardt , et al. March 16, 2	2004-03-16
Method of depositing silicon with high step coverage App 20030129811 - Raaijmakers, Ivo ; et al.	2003-07-10
Method for fabricating capacitor electrodes Grant 6,559,005 - Gutsche , et al. May 6, 2	2003-05-06
Method for fabricating capacitor electrodes App 20020022316 - Gutsche, Martin ; et al.	2002-02-21
Method of depositing silicon with high step coverage Grant 6,232,196 - Raaijmakers , et al. May 15, 2	2001-05-15
Method for etching a semiconductor substrate and etching system Grant 5,874,366 - Sporer , et al. February 23, 1	1999-02-23
Method and apparatus for determining emissivity of semiconductor material Grant 5,727,017 - Maurer , et al. March 10, 1	1998-03-10
Method for locally and globally planarizing chemical vapor deposition of SiO.sub.2 layers onto structured silicon substrates Grant 5,399,389 - Hieber , et al. March 21, 1	1995-03-21
Method for cleaning reaction chambers by plasma etching Grant 5,281,302 - Gabric , et al. January 25, 1	1994-01-25

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