| Patent | Date |
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Cmp Composition Including A Novel Abrasive
App 20210301178 - HAINS; Alexander W. ; et al. | 2021-09-30 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane
Grant 11,034,862 - Grumbine , et al. June 15, 2 | 2021-06-15 |
Composition and method for copper barrier CMP
Grant 10,988,635 - Kraft , et al. April 27, 2 | 2021-04-27 |
Composition and method for metal CMP
Grant 10,968,366 - Kraft , et al. April 6, 2 | 2021-04-06 |
Composition And Method For Metal Cmp
App 20200172760 - KRAFT; Steven ; et al. | 2020-06-04 |
Composition And Method For Copper Barrier Cmp
App 20200172762 - KRAFT; Steven ; et al. | 2020-06-04 |
Composition And Method For Cobalt Cmp
App 20200172759 - HUNG LOW; Fernando ; et al. | 2020-06-04 |
Tungsten buff polishing compositions with improved topography
Grant 10,647,887 - Dockery , et al. | 2020-05-12 |
Polishing Composition And Method Utilizing Abrasive Particles Treated With An Aminosilane
App 20200056069 - Grumbine; Steven ; et al. | 2020-02-20 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane
Grant 10,508,219 - Grumbine , et al. Dec | 2019-12-17 |
CMP compositions and methods for polishing nickel phosphorous surfaces
Grant 10,358,579 - Zhang , et al. July 23, 2 | 2019-07-23 |
Tungsten Buff Polishing Compositions With Improved Topography
App 20190211227 - DOCKERY; Kevin P. ; et al. | 2019-07-11 |
Methods for fabricating a chemical-mechanical polishing composition
Grant 9,803,106 - Grumbine , et al. October 31, 2 | 2017-10-31 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane
Grant 9,617,450 - Grumbine , et al. April 11, 2 | 2017-04-11 |
Methods And Compositions For Processing Dielectric Substrate
App 20170066944 - CUI; Ji ; et al. | 2017-03-09 |
Polishing Composition And Method Utilizing Abrasive Particles Treated With An Aminosilane
App 20170051181 - GRUMBINE; Steven ; et al. | 2017-02-23 |
Composition for tungsten CMP
Grant 9,566,686 - Grumbine , et al. February 14, 2 | 2017-02-14 |
Tungsten chemical-mechanical polishing composition
Grant 9,567,491 - Fu , et al. February 14, 2 | 2017-02-14 |
Copper barrier chemical-mechanical polishing composition
Grant 9,556,363 - Fu , et al. January 31, 2 | 2017-01-31 |
Colloidal silica chemical-mechanical polishing composition
Grant 9,499,721 - Grumbine , et al. November 22, 2 | 2016-11-22 |
Colloidal silica chemical-mechanical polishing composition
Grant 9,422,456 - Grumbine , et al. August 23, 2 | 2016-08-23 |
Colloidal silica chemical-mechanical polishing concentrate
Grant 9,422,457 - Grumbine , et al. August 23, 2 | 2016-08-23 |
Composition for tungsten buffing
Grant 9,309,442 - Fu , et al. April 12, 2 | 2016-04-12 |
Composition for tungsten CMP
Grant 9,303,188 - Grumbine , et al. April 5, 2 | 2016-04-05 |
Composition for tungsten CMP
Grant 9,303,189 - Grumbine , et al. April 5, 2 | 2016-04-05 |
Mixed abrasive tungsten CMP composition
Grant 9,303,190 - Ward , et al. April 5, 2 | 2016-04-05 |
Composition For Tungsten Cmp
App 20160089763 - GRUMBINE; Steven ; et al. | 2016-03-31 |
Composition for tungsten CMP
Grant 9,238,754 - Grumbine , et al. January 19, 2 | 2016-01-19 |
Copper Barrier Chemical-mechanical Polishing Composition
App 20150376463 - Fu; Lin ; et al. | 2015-12-31 |
Methods For Fabricating A Chemical-mechanical Polishing Composition
App 20150376460 - Grumbine; Steven ; et al. | 2015-12-31 |
Tungsten Chemical-mechanical Polishing Composition
App 20150376462 - Fu; Lin ; et al. | 2015-12-31 |
Colloidal Silica Chemical-mechanical Polishing Concentrate
App 20150376461 - Grumbine; Steven ; et al. | 2015-12-31 |
Colloidal Silica Chemical-mechanical Polishing Composition
App 20150376459 - Grumbine; Steven ; et al. | 2015-12-31 |
Colloidal Silica Chemical-mechanical Polishing Composition
App 20150376458 - Grumbine; Steven ; et al. | 2015-12-31 |
Mixed Abrasive Tungsten Cmp Composition
App 20150267083 - WARD; William ; et al. | 2015-09-24 |
Composition For Tungsten Buffing
App 20150267081 - Fu; Lin ; et al. | 2015-09-24 |
Mixed Abrasive Tungsten Cmp Composition
App 20150267082 - Grumbine; Steven ; et al. | 2015-09-24 |
Composition For Tungsten Cmp
App 20150259572 - GRUMBINE; Steven ; et al. | 2015-09-17 |
Composition For Tungsten Cmp
App 20150259574 - GRUMBINE; Steven ; et al. | 2015-09-17 |
Composition For Tungsten Cmp
App 20150259573 - GRUMBINE; Steven ; et al. | 2015-09-17 |
Mixed abrasive tungsten CMP composition
Grant 9,127,187 - Grumbine , et al. September 8, 2 | 2015-09-08 |
Polishing Composition And Method Utilizing Abrasive Particles Treated With An Aminosilane
App 20150184029 - GRUMBINE; Steven ; et al. | 2015-07-02 |
Cmp Compositions And Methods For Polishing Nickel Phosphorous Surfaces
App 20150152289 - Zhang; Ke ; et al. | 2015-06-04 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane
Grant 9,028,572 - Grumbine , et al. May 12, 2 | 2015-05-12 |
Wiresaw cutting method
Grant 8,960,177 - Grumbine , et al. February 24, 2 | 2015-02-24 |
CMP compositions with low solids content and methods related thereto
Grant 8,961,807 - Fu , et al. February 24, 2 | 2015-02-24 |
Chemical-mechanical polishing composition containing zirconia and metal oxidizer
Grant 08920667 - | 2014-12-30 |
Chemical-mechanical polishing composition containing zirconia and metal oxidizer
Grant 8,920,667 - Fu , et al. December 30, 2 | 2014-12-30 |
Self-cleaning wiresaw apparatus and method
Grant 8,851,059 - Grumbine , et al. October 7, 2 | 2014-10-07 |
Cmp Compositions With Low Solids Content And Methods Related Thereto
App 20140263184 - Fu; Lin ; et al. | 2014-09-18 |
Chemical-mechanical Polishing Composition Containing Zirconia And Metal Oxidizer
App 20140209566 - Fu; Lin ; et al. | 2014-07-31 |
Composition And Method For Polishing Aluminum Semiconductor Substrates
App 20140103250 - CUI; Ji ; et al. | 2014-04-17 |
Wiresaw apparatus and method for continuous removal of magnetic impurties during wiresaw cutting
Grant 8,636,560 - Grumbine , et al. January 28, 2 | 2014-01-28 |
Composition and method for polishing aluminum semiconductor substrates
Grant 8,623,766 - Cui , et al. January 7, 2 | 2014-01-07 |
Composition for improving dryness during wire sawing
Grant 8,597,538 - Naguib Sant , et al. December 3, 2 | 2013-12-03 |
Compositions for CMP of semiconductor materials
Grant 8,529,680 - De Rege Thesauro , et al. September 10, 2 | 2013-09-10 |
Wire saw slurry recycling process
Grant 8,425,639 - Gaudet , et al. April 23, 2 | 2013-04-23 |
Composition And Method For Polishing Aluminum Semiconductor Substrates
App 20130072021 - Cui; Ji ; et al. | 2013-03-21 |
Barrier slurry for low-k dielectrics
Grant 8,252,687 - Li , et al. August 28, 2 | 2012-08-28 |
Slurry composition containing non-ionic polymer and method for use
Grant 8,157,876 - Grumbine , et al. April 17, 2 | 2012-04-17 |
Self-cleaning Wiresaw Apparatus And Method
App 20120006312 - Grumbine; Steven ; et al. | 2012-01-12 |
Wiresaw Cutting Method
App 20110303210 - Grumbine; Steven ; et al. | 2011-12-15 |
Cutting Fluid Composition For Wiresawing
App 20110240002 - Grumbine; Steven ; et al. | 2011-10-06 |
Composition For Improving Dryness During Wire Sawing
App 20110239836 - Naguib Sant; Nevin ; et al. | 2011-10-06 |
Wiresaw Apparatus And Method For Continuous Removal Of Magnetic Impurities During Wiresaw Cutting
App 20110240001 - Grumbine; Steven ; et al. | 2011-10-06 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane
Grant 7,994,057 - Dysard , et al. August 9, 2 | 2011-08-09 |
Compositions For Cmp Of Semiconductor Materials
App 20100314576 - THESAURO; Francesco DE REGE ; et al. | 2010-12-16 |
Cmp System Utilizing Halogen Adduct
App 20100276392 - GRUMBINE; Steven ; et al. | 2010-11-04 |
Compositions and methods for CMP of semiconductor materials
Grant 7,803,203 - De Rege Thesauro , et al. September 28, 2 | 2010-09-28 |
CMP system utilizing halogen adduct
Grant 7,776,230 - Grumbine , et al. August 17, 2 | 2010-08-17 |
Barrier slurry for low-k dielectrics
App 20100075502 - Li; Shoutian ; et al. | 2010-03-25 |
Wire Saw Slurry Recycling Process
App 20090293369 - GAUDET; Gregory ; et al. | 2009-12-03 |
Slurry composition containing non-ionic polymer and method for use
App 20090126713 - Grumbine; Steven ; et al. | 2009-05-21 |
Polishing Composition And Method Utilizing Abrasive Particles Treated With An Aminosilane
App 20090081927 - Grumbine; Steven ; et al. | 2009-03-26 |
Polishing Composition And Method Utilizing Abrasive Particles Treated With An Aminosilane
App 20090081871 - Dysard; Jeffrey ; et al. | 2009-03-26 |
Cmp System Utilizing Halogen Adduct
App 20080057715 - Grumbine; Steven ; et al. | 2008-03-06 |
Compositions And Methods For Cmp Of Semiconductor Materials
App 20070181535 - De Rege Thesauro; Francesco ; et al. | 2007-08-09 |
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