| Patent | Date |
|---|
System And Method For Focus Control In Extreme Ultraviolet Lithography Systems Using A Focus-sensitive Metrology Target
App 20220214625 - Gronheid; Roel ; et al. | 2022-07-07 |
Inspection sensitivity improvements for optical and electron beam inspection
Grant 11,092,893 - Cross , et al. August 17, 2 | 2021-08-17 |
Reduction Or Elimination Of Pattern Placement Error In Metrology Measurements
App 20210149296 - Feler; Yoel ; et al. | 2021-05-20 |
Determining the impacts of stochastic behavior on overlay metrology data
Grant 10,901,325 - Gurevich , et al. January 26, 2 | 2021-01-26 |
Lithographic mask layer
Grant 10,824,078 - Gronheid , et al. November 3, 2 | 2020-11-03 |
Combined anneal and selective deposition process
Grant 10,741,394 - Maes , et al. A | 2020-08-11 |
Method for manufacturing a mask
Grant 10,720,336 - Gallagher , et al. | 2020-07-21 |
Inspection Sensitivity Improvements For Optical And Electron Beam Inspection
App 20200183283 - Cross; Andrew ; et al. | 2020-06-11 |
Method of forming a directed self-assembled layer on a substrate
Grant 10,551,741 - Knaepen , et al. Fe | 2020-02-04 |
Reduction Or Elimination Of Pattern Placement Error In Metrology Measurements
App 20190250504 - Feler; Yoel ; et al. | 2019-08-15 |
Combined Anneal And Selective Deposition Process
App 20190157086 - MAES; Jan Willem ; et al. | 2019-05-23 |
Method Of Forming A Directed Self-assembled Layer On A Substrate
App 20190155159 - Knaepen; Werner ; et al. | 2019-05-23 |
Method for Manufacturing a Mask
App 20190074186 - Gallagher; Emily ; et al. | 2019-03-07 |
Determining The Impacts Of Stochastic Behavior On Overlay Metrology Data
App 20190049858 - GUREVICH; Evgeni ; et al. | 2019-02-14 |
Combined anneal and selective deposition process
Grant 10,204,782 - Maes , et al. Feb | 2019-02-12 |
Method for producing fin structures of a semiconductor device in a substrate
Grant 10,192,956 - Chan , et al. Ja | 2019-01-29 |
Selective fin cut
Grant 10,186,459 - Gronheid , et al. Ja | 2019-01-22 |
Quality assessment of directed self-assembling method
Grant 10,048,212 - Gronheid , et al. August 14, 2 | 2018-08-14 |
Lithographic Mask Layer
App 20180173109 - Gronheid; Roel ; et al. | 2018-06-21 |
Selective Fin Cut
App 20180076092 - Gronheid; Roel ; et al. | 2018-03-15 |
Method for Manufacturing Pillar or Hole Structures in a Layer of a Semiconductor Device, and Associated Semiconductor Structure
App 20170330760 - SINGH; Arjun ; et al. | 2017-11-16 |
Combined Anneal And Selective Deposition Process
App 20170301542 - MAES; Jan Willem ; et al. | 2017-10-19 |
Method for Producing Fin Structures of a Semiconductor Device in a Substrate
App 20160322461 - Chan; Boon Teik ; et al. | 2016-11-03 |
Method for producing fin structures of a semiconductor device in a substrate
Grant 9,391,141 - Chan , et al. July 12, 2 | 2016-07-12 |
Quality Assessment of Directed Self-Assembling Method
App 20150276624 - Gronheid; Roel ; et al. | 2015-10-01 |
Method for Producing Fin Structures of a Semiconductor Device in a Substrate
App 20150243509 - Chan; Boon Teik ; et al. | 2015-08-27 |
Conformal anti-reflective coating
Grant 9,041,164 - Gronheid , et al. May 26, 2 | 2015-05-26 |
Conformal Anti-Reflective Coating
App 20140231968 - Gronheid; Roel ; et al. | 2014-08-21 |
Method of process optimization for dual tone development
Grant 8,257,911 - Gronheid , et al. September 4, 2 | 2012-09-04 |
Methods and devices for lithography using electromagnetic radiation with short wavelengths
Grant 7,695,877 - Leunissen , et al. April 13, 2 | 2010-04-13 |
Method Of Process Optimization For Dual Tone Development
App 20100055625 - Gronheid; Roel ; et al. | 2010-03-04 |
Method Of Patterning A Substrate Using Dual Tone Development
App 20100055624 - Gronheid; Roel ; et al. | 2010-03-04 |
Watermark Defect Reduction By Resist Optimization
App 20080213689 - Kocsis; Michael ; et al. | 2008-09-04 |
Methods and devices for lithography using electromagnetic radiation with short wavelengths
App 20070154817 - Leunissen; Leonardus ; et al. | 2007-07-05 |
Method of studying interaction between immersion fluid and substrate
App 20070117232 - Gronheid; Roel | 2007-05-24 |
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