Grimm; Volker

Patent Applications and Registrations

Patent applications and USPTO patent grants for Grimm; Volker.The latest application filed is for "method for operating a container treatment system with fault diagnosis".

Company Profile

0.16.16

Grimm; Volker - Wenzenbach N/A DE
Grimm; Volker - Langebrueck N/A DE
Grimm; Volker - Langebruck DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for operating a container treatment system with fault diagnosis Grant 10,489,263 - Grimm Nov	2019-11-26
Enhancing transistor performance by reducing exposure to oxygen plasma in a dual stress liner approach Grant 9,318,345 - Naumann , et al. April 19, 2	2016-04-19
Shrinkage of critical dimensions in a semiconductor device by selective growth of a mask material Grant 9,070,639 - Chumakov , et al. June 30, 2	2015-06-30
Method for selectively removing a spacer in a dual stress liner approach Grant 9,006,114 - Frohberg , et al. April 14, 2	2015-04-14
Method and apparatus for checking gripping elements Grant 8,869,636 - Grimm October 28, 2	2014-10-28
Method For Operating A Container Treatment System With Fault Diagnosis App 20140298100 - Grimm; Volker	2014-10-02
Method And Apparatus For Checking Gripping Elements App 20130228025 - Grimm; Volker	2013-09-05
Enhancing Transistor Performance by Reducing Exposure to Oxygen Plasma in a Dual Stress Liner Approach App 20130089985 - NAUMANN; Ronald ; et al.	2013-04-11
Shrinkage of Critical Dimensions in a Semiconductor Device by Selective Growth of a Mask Material App 20120244710 - Chumakov; Dmytro ; et al.	2012-09-27
Semiconductor Device Comprising Sophisticated Conductive Elements in a Dielectric Material System Formed by Using a Barrier Layer App 20110266685 - Chumakov; Dmytro ; et al.	2011-11-03
Technique for removing resist material after high dose implantation in a semiconductor device Grant 7,816,273 - Krueger , et al. October 19, 2	2010-10-19
Stressed interlayer dielectric with reduced probability for void generation in a semiconductor device by using an intermediate etch control layer of increased thickness Grant 7,763,507 - Richter , et al. July 27, 2	2010-07-27
Method For Selectively Removing A Spacer In A Dual Stress Liner Approach App 20090273035 - Frohberg; Kai ; et al.	2009-11-05
Method And Apparatus For Checking Gripping Elements App 20090205448 - Grimm; Volker	2009-08-20
Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device Grant 7,550,396 - Frohberg , et al. June 23, 2	2009-06-23
Stressed Interlayer Dielectric With Reduced Probability For Void Generation In A Semiconductor Device By Using An Intermediate Etch Control Layer Of Increased Thickness App 20090140396 - Richter; Ralf ; et al.	2009-06-04
Technique For Removing Resist Material After High Dose Implantation In A Semiconductor Device App 20080160729 - Krueger; Christian ; et al.	2008-07-03
Method For Reducing Resist Poisoning During Patterning Of Silicon Nitride Layers In A Semiconductor Device App 20080081480 - Frohberg; Kai ; et al.	2008-04-03
Method of forming contact pads Grant 7,166,530 - Naumann , et al. January 23, 2	2007-01-23
Method of forming contact pads App 20060141758 - Naumann; Ronald ; et al.	2006-06-29
Method of adjusting etch selectivity by adapting aspect ratios in a multi-level etch process Grant 6,969,676 - Schwan , et al. November 29, 2	2005-11-29
Methods of forming a transistor having a recessed gate electrode structure Grant 6,897,114 - Krueger , et al. May 24, 2	2005-05-24
Method of adjusting etch selectivity by adapting aspect ratios in a multi-level etch process App 20040241984 - Schwan, Christoph ; et al.	2004-12-02
Advanced recessed gate transistor and a method of forming the same App 20040126965 - Krueger, Christian ; et al.	2004-07-01

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