Grimbergen; Michael N.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Grimbergen; Michael N..The latest application filed is for "adjustable achromatic collimator assembly for endpoint detection systems".

Company Profile

2.28.27

Grimbergen; Michael N. - Redwood City CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Adjustable Achromatic Collimator Assembly For Endpoint Detection Systems App 20220050303 - Han; Pengyu ; et al.	2022-02-17
Etch Processing System Having Reflective Endpoint Detection App 20210263408 - Grimbergen; Michael N. ; et al.	2021-08-26
Etch processing system having reflective endpoint detection Grant 11,022,877 - Grimbergen , et al. June 1, 2	2021-06-01
Chamber lid heater ring assembly Grant 10,595,365 - Ouye , et al.	2020-03-17
Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall Grant 10,170,280 - Chandrachood , et al. J	2019-01-01
Etch Processing System Having Reflective Endpoint Detection App 20180259848 - GRIMBERGEN; Michael N. ; et al.	2018-09-13
Dual endpoint detection for advanced phase shift and binary photomasks Grant 9,805,939 - Grimbergen October 31, 2	2017-10-31
Dual Endpoint Detection For Advanced Phase Shift And Binary Photomasks App 20160351403 - Grimbergen; Michael N.	2016-12-01
Inductively coupled plasma reactor having RF phase control and methods of use thereof Grant 9,378,930 - Grimbergen , et al. June 28, 2	2016-06-28
Plasma Reactor Having An Array Of Plural Individually Controlled Gas Injectors Arranged Along A Circular Side Wall App 20160042917 - Chandrachood; Madhavi R. ; et al.	2016-02-11
Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors Grant 9,218,944 - Chandrachood , et al. December 22, 2	2015-12-22
Etch rate detection for photomask etching Grant 8,961,804 - Grimbergen February 24, 2	2015-02-24
Methods for reducing photoresist interference when monitoring a target layer in a plasma process Grant 8,778,204 - Grimbergen July 15, 2	2014-07-15
Etch Rate Detection For Photomask Etching App 20130109112 - Grimbergen; Michael N.	2013-05-02
Methods For Reducing Photoresist Interference When Monitoring A Target Layer In A Plasma Process App 20120103936 - Grimbergen; Michael N.	2012-05-03
Chamber Lid Heater Ring Assembly App 20120090784 - Ouye; Alan H. ; et al.	2012-04-19
Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside Grant 8,017,029 - Chandrachood , et al. September 13, 2	2011-09-13
Process for etching a transparent workpiece including backside endpoint detection steps Grant 8,012,366 - Lewington , et al. September 6, 2	2011-09-06
Mask etch plasma reactor with cathode providing a uniform distribution of etch rate Grant 8,002,946 - Lewington , et al. August 23, 2	2011-08-23
Mask etch plasma reactor with variable process gas distribution Grant 7,976,671 - Chandrachood , et al. July 12, 2	2011-07-12
Plasma reactor for processing a workpiece and having a tunable cathode Grant 7,967,930 - Lewington , et al. June 28, 2	2011-06-28
Inductively Coupled Plasma Reactor Having Rf Phase Control And Methods Of Use Thereof App 20100276391 - GRIMBERGEN; MICHAEL N. ; et al.	2010-11-04
Inductively Coupled Plasma Reactor Having Rf Phase Control And Methods Of Use Thereof App 20100224321 - GRIMBERGEN; MICHAEL N. ; et al.	2010-09-09
Phase shifting photomask and a method of fabricating thereof Grant 7,635,546 - Anderson , et al. December 22, 2	2009-12-22
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another Grant 7,520,999 - Chandrachood , et al. April 21, 2	2009-04-21
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator Grant 7,504,041 - Chandrachood , et al. March 17, 2	2009-03-17
Plasma reactor with a dynamically adjustable plasma source power applicator Grant 7,431,797 - Chandrachood , et al. October 7, 2	2008-10-07
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another Grant 7,419,551 - Chandrachood , et al. September 2, 2	2008-09-02
Mask etch plasma reactor with cathode providing a uniform distribution of etch rate App 20080100222 - Lewington; Richard ; et al.	2008-05-01
Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution App 20080099450 - Lewington; Richard ; et al.	2008-05-01
Plasma reactor for processing a transparent workpiece with backside process endpoint detection App 20080099437 - Lewington; Richard ; et al.	2008-05-01
Process for etching a transparent workpiece including backside endpoint detection steps App 20080099432 - Lewington; Richard ; et al.	2008-05-01
Mask etch plasma reactor with variable process gas distribution App 20080102202 - Chandrachood; Madhavi R. ; et al.	2008-05-01
Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside App 20080099434 - Chandrachood; Madhavi R. ; et al.	2008-05-01
Plasma reactor for processing a workpiece and having a tunable cathode App 20080100223 - Lewington; Richard ; et al.	2008-05-01
Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors App 20080102001 - Chandrachood; Madhavi R. ; et al.	2008-05-01
Phase Shifting Photomask And A Method Of Fabricating Thereof App 20080070130 - ANDERSON; SCOTT ALAN ; et al.	2008-03-20
Plasma reactor with a dynamically adjustable plasma source power applicator App 20070256787 - Chandrachood; Madhavi R. ; et al.	2007-11-08
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another App 20070256784 - Chandrachood; Madhavi R. ; et al.	2007-11-08
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another App 20070257008 - Chandrachood; Madhavi R. ; et al.	2007-11-08
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator App 20070257009 - Chandrachood; Madhavi R. ; et al.	2007-11-08
Method and apparatus for endpoint detection during an etch process App 20050070103 - Deshmukh, Shashank C. ; et al.	2005-03-31
Reducing deposition of process residues on a surface in a chamber Grant 6,835,275 - Grimbergen , et al. December 28, 2	2004-12-28
Substrate monitoring method and apparatus Grant 6,824,813 - Lill , et al. November 30, 2	2004-11-30
Chamber having process monitoring window Grant 6,712,927 - Grimbergen , et al. March 30, 2	2004-03-30
Monitoring A Process And Compensating For Radiation Source Fluctuations App 20040035529 - GRIMBERGEN, MICHAEL N.	2004-02-26
Stabilized pulse light drive circuit apparatus and method for endpoint detection in a semiconductor process App 20030066946 - Grimbergen, Michael N.	2003-04-10
Endpoint detection in the fabrication of electronic devices Grant 6,406,924 - Grimbergen , et al. June 18, 2	2002-06-18
Chamber having improved process monitoring window Grant 6,390,019 - Grimbergen , et al. May 21, 2	2002-05-21

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