| Patent | Date |
|---|
Dual endpoint detection for advanced phase shift and binary photomasks
Grant 10,453,696 - Grimbergen Oc | 2019-10-22 |
Dual Endpoint Detection For Advanced Phase Shift And Binary Photomasks
App 20180047574 - GRIMBERGEN; Michael | 2018-02-15 |
Etch rate detection for anti-reflective coating layer and absorber layer etching
Grant 9,142,467 - Grimbergen September 22, 2 | 2015-09-22 |
Etch Rate Detection For Anti-reflective Coating Layer And Absorber Layer Etching
App 20150111315 - GRIMBERGEN; Michael | 2015-04-23 |
Apparatus and methods for etching quartz substrate in photomask manufacturing applications
Grant 8,956,809 - Grimbergen February 17, 2 | 2015-02-17 |
Etch rate detection for anti-reflective coating layer and absorber layer etching
Grant 8,900,469 - Grimbergen December 2, 2 | 2014-12-02 |
Etch rate detection for reflective multi-material layers etching
Grant 8,808,559 - Grimbergen August 19, 2 | 2014-08-19 |
Apparatus And Methods For Etching Quartz Substrate In Photomask Manufacturing Applications
App 20140038091 - Grimbergen; Michael | 2014-02-06 |
Etch Rate Detection For Anti-reflective Coating Layer And Absorber Layer Etching
App 20130157388 - Grimbergen; Michael | 2013-06-20 |
Etch Rate Detection For Reflective Multi-material Layers Etching
App 20130130409 - Grimbergen; Michael | 2013-05-23 |
Method For Etching An Euv Reflective Multi-material Layers Utilized To Form A Photomask
App 20130092655 - Yu; Keven ; et al. | 2013-04-18 |
Methods For In-situ Chamber Dry Clean In Photomask Plasma Etching Processing Chamber
App 20130048606 - Mao; Zhigang ; et al. | 2013-02-28 |
Endpoint detection for photomask etching
Grant 8,158,526 - Grimbergen April 17, 2 | 2012-04-17 |
Endpoint detection for photomask etching
Grant 8,092,695 - Grimbergen January 10, 2 | 2012-01-10 |
Method for plasma etching a chromium layer suitable for photomask fabrication
Grant 7,829,243 - Chen , et al. November 9, 2 | 2010-11-09 |
Methods And Apparatus For In-situ Chamber Dry Clean During Photomask Plasma Etching
App 20090325387 - Chen; Xiaoyi ; et al. | 2009-12-31 |
Apparatus and method for monitoring processing of a substrate
Grant 7,632,419 - Grimbergen , et al. December 15, 2 | 2009-12-15 |
Endpoint Detection For Photomask Etching
App 20090014409 - Grimbergen; Michael | 2009-01-15 |
Monitoring etching of a substrate in an etch chamber
App 20080272089 - Grimbergen; Michael ; et al. | 2008-11-06 |
Endpoint Detection For Photomask Etching
App 20080261335 - Grimbergen; Michael | 2008-10-23 |
Mask Etch Process
App 20080179282 - Chandrachood; Madhavi R. ; et al. | 2008-07-31 |
Endpoint Detection For Photomask Etching
App 20080176149 - Grimbergen; Michael | 2008-07-24 |
Endpoint Detection For Photomask Etching
App 20080099436 - Grimbergen; Michael | 2008-05-01 |
Endpoint Detection For Photomask Etching
App 20080099435 - Grimbergen; Michael | 2008-05-01 |
Monitoring Processing Of A Substrate In A Processing Chamber
App 20070068456 - Grimbergen; Michael ; et al. | 2007-03-29 |
Method for plasma etching a chromium layer suitable for photomask fabrication
App 20060166107 - Chen; Xiaoyi ; et al. | 2006-07-27 |
Method and apparatus for monitoring and controlling wafer fabrication process
Grant 6,632,321 - Lill , et al. October 14, 2 | 2003-10-14 |
Method And Apparatus For Monitoring And Controlling Wafer Fabrication Process
App 20030029834 - LILL, THORSTEN ; et al. | 2003-02-13 |
Plasma assisted processing chamber with separate control of species density
Grant 6,352,049 - Yin , et al. March 5, 2 | 2002-03-05 |
Method for controlling the shape of the etch front in the etching of polysilicon
Grant 6,284,665 - Lill , et al. September 4, 2 | 2001-09-04 |
Apparatus for monitoring processing of a substrate
Grant 6,129,807 - Grimbergen , et al. October 10, 2 | 2000-10-10 |
Process for control of the shape of the etch front in the etching of polysilicon
Grant 6,074,954 - Lill , et al. June 13, 2 | 2000-06-13 |
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