Griesshammer; Rudolf

Patent Applications and Registrations

Patent applications and USPTO patent grants for Griesshammer; Rudolf.The latest application filed is for "process for the hydrophilizing and/or cement-residue-removing surface treatment of silicon wafers".

Company Profile

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Griesshammer; Rudolf - Altotting DE
Griesshammer; Rudolf - Burghausen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process for the hydrophilizing and/or cement-residue-removing surface treatment of silicon wafers Grant 5,049,200 - Brunner , et al. September 17, 1	1991-09-17
Method for producing articles of high-purity synthetic quartz glass Grant 4,572,729 - Lang , et al. February 25, 1	1986-02-25
Process for processing waste gases resulting during the production of silicon Grant 4,515,762 - Griesshammer , et al. May 7, 1	1985-05-07
Method for the deposition of pure semiconductor material Grant 4,311,545 - Bugl , et al. January 19, 1	1982-01-19
Process for the deposition of pure semiconductor material Grant 4,179,530 - Koppl , et al. December 18, 1	1979-12-18
Silverplated vapor deposition chamber Grant 4,173,944 - Koppl , et al. November 13, 1	1979-11-13
Process for cleaning semi-conductor discs Grant 4,156,619 - Griesshammer May 29, 1	1979-05-29
Process for producing large-size, self-supporting plates of silicon Grant 4,131,659 - Authier , et al. December 26, 1	1978-12-26
Process for producing large-size substrate-based semiconductor material utilizing vapor-phase deposition and subsequent resolidification Grant 4,113,532 - Authier , et al. September 12, 1	1978-09-12

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