Graur; Ioana C.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Graur; Ioana C..The latest application filed is for "creating knowledge base for optical proximity correction to reduce sub-resolution assist feature printing".

Company Profile

1.11.8

Graur; Ioana C. - Poughkeepsie NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Creating knowledge base for optical proximity correction to reduce sub-resolution assist feature printing Grant 10,386,714 - Kohli , et al. A	2019-08-20
Process-metrology reproducibility bands for lithographic photomasks Grant 10,210,292 - Bailey , et al. Feb	2019-02-19
Expansion of allowed design rule space by waiving benign geometries Grant 10,042,973 - Graur , et al. August 7, 2	2018-08-07
Creating Knowledge Base For Optical Proximity Correction To Reduce Sub-resolution Assist Feature Printing App 20180196340 - Kohli; Kriteshwar K. ; et al.	2018-07-12
Process-metrology Reproducibility Bands For Lithographic Photomasks App 20180101630 - Bailey; Todd C. ; et al.	2018-04-12
Expansion Of Allowed Design Rule Space By Waiving Benign Geometries App 20180096093 - Graur; Ioana C. ; et al.	2018-04-05
Process-metrology reproducibility bands for lithographic photomasks Grant 9,928,316 - Bailey , et al. March 27, 2	2018-03-27
Generative learning for realistic and ground rule clean hot spot synthesis Grant 9,690,898 - Graur , et al. June 27, 2	2017-06-27
Generative Learning For Realistic And Ground Rule Clean Hot Spot Synthesis App 20160378902 - Graur; Ioana C. ; et al.	2016-12-29
Process-metrology Reproducibility Bands For Lithographic Photomasks App 20160283617 - Bailey; Todd C. ; et al.	2016-09-29
Decomposition with multiple exposures in a process window based OPC flow using tolerance bands Grant 8,392,871 - Mansfield , et al. March 5, 2	2013-03-05
Decomposition With Multiple Exposures In A Process Window Based Opc Flow Using Tolerance Bands App 20110271238 - Mansfield; Scott M. ; et al.	2011-11-03
Alternating Phase Shift Mask Optimization For Improved Process Window App 20090037866 - Graur; Ioana C. ; et al.	2009-02-05
Pliant SRAF for improved performance and manufacturability Grant 7,115,343 - Gordon , et al. October 3, 2	2006-10-03
Method for verification of resolution enhancement techniques and optical proximity correction in lithography Grant 6,996,797 - Liebmann , et al. February 7, 2	2006-02-07
Pliant Sraf For Improved Performance And Manufacturability App 20050202321 - Gordon, Ronald L. ; et al.	2005-09-15
Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith Grant 6,057,063 - Liebmann , et al. May 2, 2	2000-05-02
Phase shifted design verification routine Grant 5,923,566 - Galan , et al. July 13, 1	1999-07-13

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.