loadpatents
Patent applications and USPTO patent grants for Graur; Ioana.The latest application filed is for "test patterns for determining sizing and spacing of sub-resolution assist features (srafs)".
Patent | Date |
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Test patterns for determining sizing and spacing of sub-resolution assist features (SRAFs) Grant 9,904,757 - Abdo , et al. February 27, 2 | 2018-02-27 |
TEST PATTERNS FOR DETERMINING SIZING AND SPACING OF SUB-RESOLUTION ASSIST FEATURES (SRAFs) App 20170193150 - Abdo; Amr Y. ;   et al. | 2017-07-06 |
Photomask error correction Grant 9,330,225 - Chaudhary , et al. May 3, 2 | 2016-05-03 |
Photomask Error Correction App 20150356228 - Chaudhary; Aditya ;   et al. | 2015-12-10 |
Pattern improvement in multiprocess patterning Grant 9,087,739 - Dunn , et al. July 21, 2 | 2015-07-21 |
Pattern improvement in multiprocess patterning Grant 9,034,562 - Dunn , et al. May 19, 2 | 2015-05-19 |
Pattern Improvement in Multiprocess Patterning App 20140162380 - Dunn; Derren Neylon ;   et al. | 2014-06-12 |
Calibration of lithographic process models Grant 8,174,681 - Graur , et al. May 8, 2 | 2012-05-08 |
Photomask design verification Grant 8,166,423 - Mansfield , et al. April 24, 2 | 2012-04-24 |
Short path customized mask correction Grant 8,108,804 - Graur , et al. January 31, 2 | 2012-01-31 |
Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations Grant 8,078,995 - Tirapu Azpiroz , et al. December 13, 2 | 2011-12-13 |
Method and system for obtaining bounds on process parameters for OPC-verification Grant 8,059,884 - Mukherjee , et al. November 15, 2 | 2011-11-15 |
Pattern Improvement in Multiprocess Patterning App 20110091815 - Dunn; Derren N. ;   et al. | 2011-04-21 |
Photomask Design Verification App 20110061030 - Mansfield; Scott M. ;   et al. | 2011-03-10 |
Methodology for image fidelity verification Grant 7,860,701 - Graur , et al. December 28, 2 | 2010-12-28 |
Short Path Customized Mask Correction App 20100185999 - Graur; Ioana ;   et al. | 2010-07-22 |
Efficient Isotropic Modeling Approach To Incorporate Electromagnetic Effects Into Lithographic Process Simulations App 20100175042 - Tirapu Azpiroz; Jaione ;   et al. | 2010-07-08 |
Calibration Of Lithographic Process Models App 20100171031 - Graur; Ioana ;   et al. | 2010-07-08 |
System for coloring a partially colored design in an alternating phase shift mask Grant 7,687,207 - Graur , et al. March 30, 2 | 2010-03-30 |
Local coloring for hierarchical OPC Grant 7,650,587 - Baum , et al. January 19, 2 | 2010-01-19 |
Closed-loop design for manufacturability process Grant 7,624,369 - Graur , et al. November 24, 2 | 2009-11-24 |
Designer's intent tolerance bands for proximity correction and checking Grant 7,607,114 - Mansfield , et al. October 20, 2 | 2009-10-20 |
Method and System for Obtaining Bounds on Process Parameters for OPC-Verification App 20090123057 - Mukherjee; Maharaj ;   et al. | 2009-05-14 |
Generating mask patterns for alternating phase-shift mask lithography Grant 7,475,380 - Liebmann , et al. January 6, 2 | 2009-01-06 |
System for Coloring a Partially Colored Design in an Alternating Phase Shift Mask App 20080244503 - Graur; Ioana ;   et al. | 2008-10-02 |
Local Coloring For Hierarchical Opc App 20080134130 - Baum; Zachary ;   et al. | 2008-06-05 |
Closed-loop Design For Manufacturability Process App 20080127029 - Graur; Ioana ;   et al. | 2008-05-29 |
System for coloring a partially colored design in an alternating phase shift mask Grant 7,378,195 - Graur , et al. May 27, 2 | 2008-05-27 |
Methodology For Image Fidelity Verification App 20080071512 - Graur; Ioana ;   et al. | 2008-03-20 |
Methodology for image fidelity verification Grant 7,305,334 - Graur , et al. December 4, 2 | 2007-12-04 |
Designer's Intent Tolerance Bands For Proximity Correction And Checking App 20070261013 - Mansfield; Scott M. ;   et al. | 2007-11-08 |
Designer's intent tolerance bands for proximity correction and checking Grant 7,266,798 - Mansfield , et al. September 4, 2 | 2007-09-04 |
Designer's Intent Tolerance Bands For Proximity Correction And Checking App 20070083847 - Mansfield; Scott M. ;   et al. | 2007-04-12 |
Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masks Grant 7,175,942 - Liebmann , et al. February 13, 2 | 2007-02-13 |
Methodology For Image Fidelity Verification App 20060282246 - Graur; Ioana ;   et al. | 2006-12-14 |
Generating mask patterns for alternating phase-shift mask lithography App 20060107248 - Liebmann; Lars W. ;   et al. | 2006-05-18 |
Generating mask patterns for alternating phase-shift mask lithography Grant 6,993,741 - Liebmann , et al. January 31, 2 | 2006-01-31 |
System For Coloring A Partially Colored Design In An Alternating Phase Shift Mask App 20050287444 - Graur, Ioana ;   et al. | 2005-12-29 |
Method Of Conflict Avoidance In Fabrication Of Gate-shrink Alternating Phase Shifting Masks App 20050175906 - Liebmann, Lars W. ;   et al. | 2005-08-11 |
Alternating phase shift mask design with optimized phase shapes Grant 6,927,005 - Liebmann , et al. August 9, 2 | 2005-08-09 |
Phase-width balanced alternating phase shift mask design Grant 6,901,576 - Liebmann , et al. May 31, 2 | 2005-05-31 |
Generating Mask Patterns For Alternating Phase-shift Mask Lithography App 20050014074 - Liebmann, Lars W. ;   et al. | 2005-01-20 |
Priority coloring for VLSI designs Grant 6,795,961 - Liebmann , et al. September 21, 2 | 2004-09-21 |
Alternating phase shift mask design with optimized phase shapes App 20040175635 - Liebmann, Lars W. ;   et al. | 2004-09-09 |
Alternating phase shift mask design with optimized phase shapes Grant 6,757,886 - Liebmann , et al. June 29, 2 | 2004-06-29 |
Phase-width balanced alternating phase shift mask design App 20040096752 - Liebmann, Lars W. ;   et al. | 2004-05-20 |
Priority coloring for VLSI designs App 20030200524 - Liebmann, Lars W. ;   et al. | 2003-10-23 |
Priority coloring for VLSI designs Grant 6,609,245 - Liebmann , et al. August 19, 2 | 2003-08-19 |
Priority Coloring For Vlsi Designs App 20030101430 - Liebmann, Lars W. ;   et al. | 2003-05-29 |
Alternating phase shift mask design with optimized phase shapes App 20030093766 - Liebmann, Lars W. ;   et al. | 2003-05-15 |
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