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Patent applications and USPTO patent grants for Gorin; Georges J..The latest application filed is for "end point detection method for plasma etching of semiconductor wafers with low exposed area".
Patent | Date |
---|---|
Plasma initiation in an inductive RF coupling mode Grant 10,588,212 - Gorin | 2020-03-10 |
Plasma concentration apparatus and method Grant 9,386,677 - Gorin July 5, 2 | 2016-07-05 |
Plasma de-activation apparatus and method Grant 8,852,522 - Gorin October 7, 2 | 2014-10-07 |
Plasma extension and concentration apparatus and method Grant 8,841,574 - Gorin September 23, 2 | 2014-09-23 |
End point detection method for plasma etching of semiconductor wafers with low exposed area Grant 7,871,830 - Johal , et al. January 18, 2 | 2011-01-18 |
End point detection method for plasma etching of semiconductor wafers with low exposed area App 20060157446 - Johel; Sumer ;   et al. | 2006-07-20 |
Higher power density downstream plasma Grant 7,015,415 - Gorin March 21, 2 | 2006-03-21 |
Higher power density downstream plasma App 20050178746 - Gorin, Georges J. | 2005-08-18 |
Downstream plasma using oxygen gas mixtures Grant 6,263,831 - Gorin July 24, 2 | 2001-07-24 |
Downstream plasma using oxygen gas mixture Grant 6,112,696 - Gorin September 5, 2 | 2000-09-05 |
Plasma reactor apparatus Grant 4,579,618 - Celestino , et al. April 1, 1 | 1986-04-01 |
Plasma reactor apparatus and method Grant 4,464,223 - Gorin August 7, 1 | 1984-08-07 |
Apparatus for controlling a plasma reaction Grant 4,357,195 - Gorin November 2, 1 | 1982-11-02 |
Reactor apparatus for plasma etching or deposition Grant 4,264,393 - Gorin , et al. April 28, 1 | 1981-04-28 |
Method for process control of a plasma reaction Grant 4,263,088 - Gorin April 21, 1 | 1981-04-21 |
Plasma reactor apparatus Grant 4,209,357 - Gorin , et al. June 24, 1 | 1980-06-24 |
Gas Reaction Apparatus Grant 3,775,621 - Gorin November 27, 1 | 1973-11-27 |
Gas Reaction Apparatus Grant 3,619,403 - Gorin November 9, 1 | 1971-11-09 |
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