Goodwin; Francis

Patent Applications and Registrations

Patent applications and USPTO patent grants for Goodwin; Francis.The latest application filed is for "extreme ultraviolet (euv) lithography mask".

Company Profile

2.9.13

Goodwin; Francis - Halfmoon NY
Goodwin; Francis - Clifton Park NY US
Goodwin; Francis - Delmar NY
Goodwin; Francis - Albany NY
Goodwin; Francis - Mechanicsville VA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Extreme ultraviolet (EUV) lithography mask Grant 10,802,393 - Sun , et al. October 13, 2	2020-10-13
Extreme ultraviolet mirrors and masks with improved reflectivity Grant 10,468,149 - Chen , et al. No	2019-11-05
Extreme Ultraviolet (euv) Lithography Mask App 20190113836 - SUN; Lei ; et al.	2019-04-18
Extreme Ultraviolet Mirrors And Masks With Improved Reflectivity App 20180226166 - Chen; Yulu ; et al.	2018-08-09
Plasma as a band pass filter for photo lithography Grant 8,493,546 - Goodwin July 23, 2	2013-07-23
Plasma as a Band Pass Filter for Photo Lithography App 20110149260 - Goodwin; Francis	2011-06-23
Inspection systems and methods App 20080119060 - Goodwin; Francis	2008-05-22
Inspection systems and methods App 20080078941 - Goodwin; Francis	2008-04-03
Lithography systems and methods App 20070287073 - Goodwin; Francis	2007-12-13
Fluids for immersion lithography systems Grant 7,291,569 - Goodwin , et al. November 6, 2	2007-11-06
Closing disk for immersion head Grant 7,286,205 - Goodwin October 23, 2	2007-10-23
Method and arrangement for controlling focus parameters of an exposure tool Grant 7,279,258 - Goodwin October 9, 2	2007-10-09
Dynamic memory App 20070189067 - Goodwin; Francis	2007-08-16
Debris apparatus, system, and method App 20070182943 - Goodwin; Francis	2007-08-09
Fluids for immersion lithography systems App 20070004234 - Goodwin; Francis ; et al.	2007-01-04
Closing disk for immersion head App 20060238900 - Goodwin; Francis	2006-10-26
Method of determining the overlay accuracy of multiple patterns formed on a semiconductor wafer Grant 6,948,149 - Goodwin September 20, 2	2005-09-20
Method and arrangement for controlling focus parameters of an exposure tool App 20050202327 - Goodwin, Francis	2005-09-15
Method Of Determining The Overlay Accuracy Of Multiple Patterns Formed On A Semiconductor Wafer App 20050188342 - Goodwin, Francis	2005-08-25
Method of forming a gate contact in a semiconductor device Grant 6,927,462 - Goodwin , et al. August 9, 2	2005-08-09
Method of forming a gate contact in a semiconductor device App 20040043592 - Goodwin, Francis ; et al.	2004-03-04

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