| Patent | Date |
|---|
Method Of Manufacturing Semiconductor Device
App 20150255302 - YOON; BYOUNG-MOON ; et al. | 2015-09-10 |
Methods of manufacturing flash memory devices by selective removal of nitrogen atoms
Grant 8,492,223 - Choi , et al. July 23, 2 | 2013-07-23 |
Semiconductor Devices
App 20120007165 - LEE; Myoung-Bum ; et al. | 2012-01-12 |
Methods of fabricating flash memory devices comprising forming a silicide on exposed upper and side surfaces of a control gate
Grant 8,043,914 - Choi , et al. October 25, 2 | 2011-10-25 |
Methods of Manufacturing Flash Memory Devices by Selective Removal of Nitrogen Atoms
App 20110256708 - Choi; Jong-wan ; et al. | 2011-10-20 |
Semiconductor Devices Including Lower And Upper Device Isolation Patterns
App 20110037109 - KIM; Hong-Gun ; et al. | 2011-02-17 |
Flash memory device and method of fabricating the same
Grant 7,842,569 - Kim , et al. November 30, 2 | 2010-11-30 |
Method of fabricating semiconductor device
App 20100240194 - Jung; DeokYoung ; et al. | 2010-09-23 |
Semiconductor device having trench isolation region and methods of fabricating the same
Grant 7,781,304 - Byun , et al. August 24, 2 | 2010-08-24 |
Method Of Forming Semiconductor Device
App 20100203700 - Byun; Kyungmun ; et al. | 2010-08-12 |
Method of Fabricating Flash Memory Device
App 20100167490 - Choi; Jong-wan ; et al. | 2010-07-01 |
Method of forming an isolation layer, method of manufacturing a semiconductor device using the same, and semiconductor device having an isolation layer
App 20100072569 - Han; Tae-Jong ; et al. | 2010-03-25 |
Semiconductor device isolation structures and methods of fabricating such structures
Grant 7,674,685 - Choi , et al. March 9, 2 | 2010-03-09 |
Method for forming a silicon oxide layer using spin-on glass
Grant 7,517,817 - Goo , et al. April 14, 2 | 2009-04-14 |
Semiconductor device having trench isolation region and methods of fabricating the same
App 20090020847 - Byun; Kyung-Mun ; et al. | 2009-01-22 |
Compositions Including Perhydro-polysilazane Used In A Semiconductor Manufacturing Process
App 20090012221 - Hong; Eunkee ; et al. | 2009-01-08 |
Semiconductor device and method of manufacturing having the same
App 20080121977 - Choi; Yong-Soon ; et al. | 2008-05-29 |
Methods of filling gaps by deposition on materials having different deposition rates
Grant 7,358,190 - Kim , et al. April 15, 2 | 2008-04-15 |
Methods of forming trench isolation layers using high density plasma chemical vapor deposition
Grant 7,332,409 - Cha , et al. February 19, 2 | 2008-02-19 |
Flash Memory Device And Method Of Fabricating The Same
App 20080035984 - KIM; Hong-Gun ; et al. | 2008-02-14 |
Semiconductor device isolation structures and methods of fabricating such structures
App 20080014711 - Choi; Jong-Wan ; et al. | 2008-01-17 |
Method for forming a silicon oxide layer using spin-on glass
App 20070117412 - Goo; Ju-seon ; et al. | 2007-05-24 |
Method for forming a silicon oxide layer using spin-on glass
Grant 7,192,891 - Goo , et al. March 20, 2 | 2007-03-20 |
Method of forming an isolation layer and method of manufacturing a field effect transistor using the same
App 20070020879 - Baek; Eun-Kyung ; et al. | 2007-01-25 |
Method of manufacturing a non-volatile semiconductor device
App 20070004139 - Kim; Hong-Gun ; et al. | 2007-01-04 |
Methods of manufacturing silicon oxide isolation layers and semiconductor devices that include such isolation layers
App 20060089008 - Hong; Eunkee ; et al. | 2006-04-27 |
Methods of forming trench isolation layers using high density plasma chemical vapor deposition
App 20050277265 - Cha, Yong-Won ; et al. | 2005-12-15 |
Method for forming a silicon oxide layer using spin-on glass
App 20050026443 - Goo, Ju-Seon ; et al. | 2005-02-03 |
Methods for forming a thin film on an integrated circuit including soft baking a silicon glass film
App 20040169005 - Kim, Hong-Gun ; et al. | 2004-09-02 |
Methods of filling gaps by deposition on materials having different deposition rates
App 20040144749 - Kim, Hong-Gun ; et al. | 2004-07-29 |
Method of forming a silicon oxide layer of a semiconductor device and method of forming a wiring having the same
Grant 6,645,879 - Hong , et al. November 11, 2 | 2003-11-11 |
Method of forming a spin-on-glass insulation layer
Grant 6,635,586 - Goo , et al. October 21, 2 | 2003-10-21 |
Method of forming an insulating layer in a trench isolation type semiconductor device
Grant 6,566,229 - Hong , et al. May 20, 2 | 2003-05-20 |
Method of forming a silicon oxide layer of a semiconductor device and method of forming a wiring having the same
App 20030036291 - Hong, Eun-Kee ; et al. | 2003-02-20 |
Method of forming a spin-on-glass insulation layer
Grant 6,489,252 - Goo , et al. December 3, 2 | 2002-12-03 |
Method of forming an insulating layer in a trench isolation type semiconductor device
App 20020123206 - Hong, Soo-Jin ; et al. | 2002-09-05 |
Method of forming a spin-on-glass insulation layer
App 20020119675 - Goo, Ju-Seon ; et al. | 2002-08-29 |
Method of forming a spin-on-glass insulation layer
App 20020072246 - Goo, Ju-Seon ; et al. | 2002-06-13 |
Method for forming interlevel dielectric layer in semiconductor device using electron beams
Grant 6,057,251 - Goo , et al. May 2, 2 | 2000-05-02 |
Method of fabricating and curing spin-on-glass layers by electron beam irradiation
Grant 5,989,983 - Goo , et al. November 23, 1 | 1999-11-23 |
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