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Patent applications and USPTO patent grants for Gonen; Serpil.The latest application filed is for "reversible photo bleachable materials based on nano sized semiconductor particles and their optical applications".
Patent | Date |
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Programmable photolithographic mask based on semiconductor nano-particle optical modulators Grant 7,605,390 - Chen , et al. October 20, 2 | 2009-10-20 |
Reversible Photo Bleachable Materials Based On Nano Sized Semiconductor Particles And Their Optical Applications App 20090220756 - Chen; Zhiyun ;   et al. | 2009-09-03 |
Reversible photobleachable materials based on nano-sized semiconductor particles and their optical applications Grant 7,510,818 - Chen , et al. March 31, 2 | 2009-03-31 |
Programmable photolithographic mask based on semiconductor nano-particle optical modulators App 20040150865 - Chen, Zhiyun ;   et al. | 2004-08-05 |
Reversible photobleachable materials based on nano-sized semiconductor particles and their optical applications App 20040152011 - Chen, Zhiyun ;   et al. | 2004-08-05 |
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