loadpatents
Patent applications and USPTO patent grants for Gondhalekar; Sudhir.The latest application filed is for "low profile process kit".
Patent | Date |
---|---|
Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing Grant 9,202,736 - Narendrnath , et al. December 1, 2 | 2015-12-01 |
Low profile process kit Grant 8,409,355 - Rasheed , et al. April 2, 2 | 2013-04-02 |
Method of making an electrostatic chuck with reduced plasma penetration and arcing Grant 8,108,981 - Lubomirsky , et al. February 7, 2 | 2012-02-07 |
Gas distribution system for improved transient phase deposition Grant 7,722,737 - Gondhalekar , et al. May 25, 2 | 2010-05-25 |
Low Profile Process Kit App 20090266299 - RASHEED; MUHAMMAD M. ;   et al. | 2009-10-29 |
Gas delivery system for semiconductor processing Grant 7,498,268 - Gondhalekar , et al. March 3, 2 | 2009-03-03 |
Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing App 20090034149 - Lubomirsky; Dmitry ;   et al. | 2009-02-05 |
Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing App 20090034147 - Narendrnath; Kadthala Ramaya ;   et al. | 2009-02-05 |
Method of making an electrostatic chuck with reduced plasma penetration and arcing App 20090034148 - Lubomirsky; Dmitry ;   et al. | 2009-02-05 |
Upper chamber for high density plasma CVD Grant 7,354,501 - Gondhalekar , et al. April 8, 2 | 2008-04-08 |
Gas Distribution System for Improved Transient Phase Deposition App 20080041821 - Gondhalekar; Sudhir ;   et al. | 2008-02-21 |
Gas Delivery System For Semiconductor Processing App 20070048446 - Gondhalekar; Sudhir ;   et al. | 2007-03-01 |
Gas delivery system for semiconductor processing Grant 7,141,138 - Gondhalekar , et al. November 28, 2 | 2006-11-28 |
High density plasma CVD chamber App 20060191478 - Gondhalekar; Sudhir ;   et al. | 2006-08-31 |
High density plasma CVD chamber Grant 7,074,298 - Gondhalekar , et al. July 11, 2 | 2006-07-11 |
Gas distribution system for improved transient phase deposition App 20060113038 - Gondhalekar; Sudhir ;   et al. | 2006-06-01 |
Gas delivery system for semiconductor processing App 20040231798 - Gondhalekar, Sudhir ;   et al. | 2004-11-25 |
Gas delivery system for semiconductor processing App 20040126952 - Gondhalekar, Sudhir ;   et al. | 2004-07-01 |
Substrate support with extended radio frequency electrode upper surface Grant 6,682,603 - Gondhalekar , et al. January 27, 2 | 2004-01-27 |
Upper chamber for high density plasma CVD App 20030213434 - Gondhalekar, Sudhir ;   et al. | 2003-11-20 |
High density plasma CVD chamber App 20030213562 - Gondhalekar, Sudhir ;   et al. | 2003-11-20 |
Substrate Support With Extended Radio Frequency Electrode Upper Surface App 20030211757 - Gondhalekar, Sudhir ;   et al. | 2003-11-13 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.