| Patent | Date |
|---|
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
Grant 10,964,541 - Glodde , et al. March 30, 2 | 2021-03-30 |
Drying an extreme ultraviolet (EUV) pellicle
Grant 10,828,678 - Goldfarb November 10, 2 | 2020-11-10 |
Method to increase the lithographic process window of extreme ultra violet negative tone development resists
Grant 10,727,055 - Felix , et al. | 2020-07-28 |
Polymer brushes for extreme ultraviolet photolithography
Grant 10,656,523 - Glodde , et al. | 2020-05-19 |
Method To Improve Adhesion Of Photoresist On Silicon Substrate For Extreme Ultraviolet And Electron Beam Lithography
App 20200090936 - Glodde; Martin ; et al. | 2020-03-19 |
Drying an extreme ultraviolet (EUV) pellicle
Grant 10,569,307 - Goldfarb Feb | 2020-02-25 |
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
Grant 10,553,432 - Glodde , et al. Fe | 2020-02-04 |
Polymer Brushes For Extreme Ultraviolet Photolithography
App 20190285985 - Glodde; Martin ; et al. | 2019-09-19 |
Mechanical isolation control for an extreme ultraviolet (EUV) pellicle
Grant 10,386,716 - Goldfarb A | 2019-08-20 |
Method to increase the lithographic process window of extreme ultra violet negative tone development resists
Grant 10,388,521 - Felix , et al. A | 2019-08-20 |
Polymer brushes for extreme ultraviolet photolithography
Grant 10,345,702 - Glodde , et al. July 9, 2 | 2019-07-09 |
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
Grant 10,312,087 - Glodde , et al. | 2019-06-04 |
Plasma shallow doping and wet removal of depth control cap
Grant 10,276,384 - Bruce , et al. | 2019-04-30 |
Mechanical isolation control for an extreme ultraviolet (EUV) pellicle
Grant 10,241,396 - Goldfarb | 2019-03-26 |
Polymer Brushes For Extreme Ultraviolet Photolithography
App 20190064667 - Glodde; Martin ; et al. | 2019-02-28 |
Method To Improve Adhesion Of Photoresist On Silicon Substrate For Extreme Ultraviolet And Electron Beam Lithography
App 20180337048 - Glodde; Martin ; et al. | 2018-11-22 |
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
Grant 10,096,477 - Glodde , et al. October 9, 2 | 2018-10-09 |
Method To Improve Adhesion Of Photoresist On Silicon Substrate For Extreme Ultraviolet And Electron Beam Lithography
App 20180233362 - Glodde; Martin ; et al. | 2018-08-16 |
Method To Improve Adhesion Of Photoresist On Silicon Substrate For Extreme Ultraviolet And Electron Beam Lithography
App 20180233363 - Glodde; Martin ; et al. | 2018-08-16 |
Method To Increase The Lithographic Process Window Of Extreme Ultra Violet Negative Tone Development Resists
App 20180233353 - Felix; Nelson M. ; et al. | 2018-08-16 |
Method To Increase The Lithographic Process Window Of Extreme Ultra Violet Negative Tone Development Resists
App 20180233352 - Felix; Nelson M. ; et al. | 2018-08-16 |
Plasma Shallow Doping And Wet Removal Of Depth Control Cap
App 20180218908 - Bruce; Robert L. ; et al. | 2018-08-02 |
Plasma Shallow Doping And Wet Removal Of Depth Control Cap
App 20180218909 - Bruce; Robert L. ; et al. | 2018-08-02 |
Plasma Shallow Doping And Wet Removal Of Depth Control Cap
App 20180218907 - Bruce; Robert L. ; et al. | 2018-08-02 |
Mechanical Isolation Control For An Extreme Ultraviolet (euv) Pellicle
App 20180129133 - Goldfarb; Dario L. | 2018-05-10 |
Drying An Extreme Ultraviolet (euv) Pellicle
App 20180117639 - Goldfarb; Dario L. | 2018-05-03 |
Drying an extreme ultraviolet (EUV) pellicle
Grant 9,950,349 - Goldfarb April 24, 2 | 2018-04-24 |
Mechanical isolation control for an extreme ultraviolet (EUV) pellicle
Grant 9,915,867 - Goldfarb March 13, 2 | 2018-03-13 |
Drying An Extreme Ultraviolet (euv) Pellicle
App 20170315440 - Goldfarb; Dario L. | 2017-11-02 |
Mechanical Isolation Control For An Extreme Ultraviolet (euv) Pellicle
App 20170269473 - Goldfarb; Dario L. | 2017-09-21 |
Mechanical Isolation Control For An Extreme Ultraviolet (euv) Pellicle
App 20170090281 - Goldfarb; Dario L. | 2017-03-30 |
Drying An Extreme Ultraviolet (euv) Pellicle
App 20170075212 - Goldfarb; Dario L. | 2017-03-16 |
Resist performance for the negative tone develop organic development process
Grant 9,389,516 - Bozano , et al. July 12, 2 | 2016-07-12 |
Extreme ultraviolet radiation (EUV) pellicle formation apparatus
Grant 9,182,686 - Goldfarb November 10, 2 | 2015-11-10 |
Resist Performance For The Negative Tone Develop Organic Development Process
App 20150309415 - BOZANO; LUISA D. ; et al. | 2015-10-29 |
Resist performance for the negative tone develop organic development process
Grant 9,057,960 - Bozano , et al. June 16, 2 | 2015-06-16 |
Extreme ultraviolet (EUV) radiation pellicle formation method
Grant 9,057,957 - Goldfarb June 16, 2 | 2015-06-16 |
Removal of alkaline crystal defects in lithographic patterning
Grant 9,012,133 - Perez , et al. April 21, 2 | 2015-04-21 |
Extreme Ultraviolet Radiation (euv) Pellicle Formation Apparatus
App 20140367248 - Goldfarb; Dario L. | 2014-12-18 |
Extreme Ultraviolet (euv) Radiation Pellicle Formation Method
App 20140370423 - Goldfarb; Dario L. | 2014-12-18 |
Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid
Grant 8,828,143 - Simons , et al. September 9, 2 | 2014-09-09 |
Resist Performance for the Negative Tone Develop Organic Development Process
App 20140220495 - Bozano; Luisa D. ; et al. | 2014-08-07 |
Near-infrared Absorbing Film Compositions
App 20140210034 - Huang; Wu-Song ; et al. | 2014-07-31 |
Near-infrared absorbing film compositions
Grant 8,772,376 - Huang , et al. July 8, 2 | 2014-07-08 |
Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer
Grant 8,722,307 - Tachibana , et al. May 13, 2 | 2014-05-13 |
Organic graded spin on BARC compositions for high NA lithography
Grant 8,652,762 - Goldfarb , et al. February 18, 2 | 2014-02-18 |
Forming an electrode having reduced corrosion and water decomposition on surface using a custom oxide layer
Grant 8,598,018 - Afzali-Azdakani , et al. December 3, 2 | 2013-12-03 |
Near-infrared absorbing film compositions
Grant 8,586,283 - Glodde , et al. November 19, 2 | 2013-11-19 |
Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme
Grant 8,536,031 - Arnold , et al. September 17, 2 | 2013-09-17 |
Apparatus And Method For The Rapid Thermal Control Of A Work Piece In Liquid Or Supercritical Fluid
App 20130210235 - Simons; John P. ; et al. | 2013-08-15 |
Near-infrared Absorbing Film Composition For Lithographic Application
App 20130157463 - Goldfarb; Dario L. ; et al. | 2013-06-20 |
Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid
Grant 8,388,758 - Simons , et al. March 5, 2 | 2013-03-05 |
Removal Of Alkaline Crystal Defects In Lithographic Patterning
App 20130052593 - Perez; Javier J. ; et al. | 2013-02-28 |
Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabrication
Grant 8,373,271 - Goldfarb , et al. February 12, 2 | 2013-02-12 |
Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme
App 20130026639 - Arnold; John C. ; et al. | 2013-01-31 |
Forming an electrode having reduced corrosion and water decomposition on surface using an organic protective layer
Grant 8,354,336 - Afzali-Ardakani , et al. January 15, 2 | 2013-01-15 |
Near-Infrared Absorbing Film Compositions
App 20130001484 - Glodde; Martin ; et al. | 2013-01-03 |
Near-infrared Absorptive Layer-forming Composition And Multilayer Film Comprising Near-infrared Absorptive Layer
App 20120301828 - TACHIBANA; Seiichiro ; et al. | 2012-11-29 |
Near-infrared absorbing film compositions
Grant 8,293,451 - Glodde , et al. October 23, 2 | 2012-10-23 |
Organic Graded Spin On Barc Compositions For High Na Lithography
App 20120205787 - Goldfarb; Dario L. ; et al. | 2012-08-16 |
Organic graded spin on BARC compositions for high NA lithography
Grant 8,137,874 - Goldfarb , et al. March 20, 2 | 2012-03-20 |
Molecular spacer layer for semiconductor oxide surface and high-K dielectric stack
Grant 8,124,485 - Goldfarb , et al. February 28, 2 | 2012-02-28 |
Self-segregating multilayer imaging stack with built-in antireflective properties
Grant 8,084,193 - Cheng , et al. December 27, 2 | 2011-12-27 |
Forming An Electrode Having Reduced Corrosion And Water Decomposition On Surface Using A Custom Oxide Layer
App 20110312164 - Afzali-Azdakani; Ali ; et al. | 2011-12-22 |
Forming An Electrode Having Reduced Corrosion And Water Decomposition On Surface Using An Organic Protective Layer
App 20110312176 - Afzali-Ardakani; Ali ; et al. | 2011-12-22 |
Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
App 20110300483 - Cheng; Joy ; et al. | 2011-12-08 |
Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
App 20110294068 - Cheng; Joy ; et al. | 2011-12-01 |
INTERCONNECT STRUCTURE WITH AN OXYGEN-DOPED SiC ANTIREFLECTIVE COATING AND METHOD OF FABRICATION
App 20110291284 - Goldfarb; Dario L. ; et al. | 2011-12-01 |
Near-infrared Absorptive Layer-forming Composition And Multilayer Film
App 20110262862 - OHASHI; Masaki ; et al. | 2011-10-27 |
Near-infrared Absorptive Layer-forming Composition And Multilayer Film
App 20110262863 - TACHIBANA; Seiichiro ; et al. | 2011-10-27 |
Method Of Fabricating Dual Damascene Structures Using A Multilevel Multiple Exposure Patterning Scheme
App 20110204523 - Arnold; John C. ; et al. | 2011-08-25 |
Near-Infrared Absorbing Film Compositions
App 20110042653 - Glodde; Martin ; et al. | 2011-02-24 |
Near-Infrared Absorbing Film Compositions
App 20110042771 - Huang; Wu-Song ; et al. | 2011-02-24 |
Photomask and method of making thereof
Grant 7,892,705 - Burns , et al. February 22, 2 | 2011-02-22 |
Reducing contamination in immersion lithography
Grant 7,869,002 - Shneyder , et al. January 11, 2 | 2011-01-11 |
Graded spin-on organic antireflective coating for photolithography
Grant 7,816,069 - Brodsky , et al. October 19, 2 | 2010-10-19 |
Apparatus and method for reducing contamination in immersion lithography
Grant 7,787,101 - Bezama , et al. August 31, 2 | 2010-08-31 |
Reducing contamination in immersion lithography
Grant 7,782,445 - Shneyder , et al. August 24, 2 | 2010-08-24 |
Method for fabricating dual damascene structures
Grant 7,727,708 - Colburn , et al. June 1, 2 | 2010-06-01 |
Self-segregating Multilayer Imaging Stack With Built-in Antireflective Properties
App 20100009132 - Cheng; Joy ; et al. | 2010-01-14 |
Apparatus And Method For The Rapid Thermal Control Of A Work Piece In Liquid Or Supercritical Fluid
App 20090235955 - Simons; John P. ; et al. | 2009-09-24 |
Graded spin-on organic antireflective coating for photolithography
Grant 7,588,879 - Brodsky , et al. September 15, 2 | 2009-09-15 |
Method for fabricating dual damascene structures
Grant 7,579,137 - Colburn , et al. August 25, 2 | 2009-08-25 |
Organic Graded Spin On Barc Compositions For High Na Lithography
App 20090186294 - Goldfarb; Dario L. ; et al. | 2009-07-23 |
Photomask And Method Of Making Thereof
App 20090087755 - Burns; Sean D. ; et al. | 2009-04-02 |
Reducing Contamination In Immersion Lithography
App 20080284994 - Shneyder; Dmitriy ; et al. | 2008-11-20 |
Reducing Contamination In Immersion Lithography
App 20080284993 - Shneyder; Dmitriy ; et al. | 2008-11-20 |
Apparatus and method for reducing contamination in immersion lithography
Grant 7,446,859 - Shneyder , et al. November 4, 2 | 2008-11-04 |
Method for Fabricating Dual Damascene Structures
App 20080214011 - Colburn; Matthew E. ; et al. | 2008-09-04 |
Graded Spin-on Organic Antireflective Coating for Photolithography
App 20080213707 - Brodsky; Colin J. ; et al. | 2008-09-04 |
Evaporation control using coating
Grant 7,351,348 - Corliss , et al. April 1, 2 | 2008-04-01 |
Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition
Grant 7,332,436 - Cotte , et al. February 19, 2 | 2008-02-19 |
Graded spin-on organic antireflective coating for photolithography
App 20080008955 - Brodsky; Colin J. ; et al. | 2008-01-10 |
Apparatus And Method For Reducing Contamination In Immersion Lithography
App 20070188731 - Bezama; Raschid J. ; et al. | 2007-08-16 |
Apparatus And Method For Reducing Contamination In Immersion Lithography
App 20070177124 - Shneyder; Dmitriy ; et al. | 2007-08-02 |
Method for fabricating dual damascene structures
App 20070148598 - Colburn; Matthew E. ; et al. | 2007-06-28 |
Method to reduce photoresist pattern collapse by controlled surface microroughening
Grant 7,229,936 - Brodsky , et al. June 12, 2 | 2007-06-12 |
Evaporation Control Using Coating
App 20070034605 - Corliss; Daniel A. ; et al. | 2007-02-15 |
Apparatus and method for rapid thermal control of a workpiece in liquid or dense phase fluid
Grant 6,997,197 - Simons , et al. February 14, 2 | 2006-02-14 |
Method To Reduce Photoresist Pattern Collapse By Controlled Surface Microroughening
App 20050245094 - Brodsky, Colin J. ; et al. | 2005-11-03 |
Process of removing residue from a precision surface using liquid or supercritical critical carbon dioxide composition
App 20050224748 - Cotte, John Michael ; et al. | 2005-10-13 |
Apparatus and method for rapid thermal control of a workpiece in liquid or dense phase fluid
App 20050211269 - Simons, John P. ; et al. | 2005-09-29 |
Liquid or supercritical carbon dioxide composition
Grant 6,838,015 - Cotte , et al. January 4, 2 | 2005-01-04 |
Liquid or supercritical carbon dioxide composition and process of removing residue from a precision surface using same
App 20030045117 - Cotte, John Michael ; et al. | 2003-03-06 |
Process of drying a cast polymeric film disposed on a workpiece
Grant 6,509,136 - Goldfarb , et al. January 21, 2 | 2003-01-21 |
Process Of Drying A Cast Polymeric Film Disposed On A Workpiece
App 20030008238 - Goldfarb, Dario L. ; et al. | 2003-01-09 |
Process of drying semiconductor wafers using liquid or supercritical carbon dioxide
Grant 6,398,875 - Cotte , et al. June 4, 2 | 2002-06-04 |
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