Glodde; Martin

Patent Applications and Registrations

Patent applications and USPTO patent grants for Glodde; Martin.The latest application filed is for "method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography".

Company Profile

11.39.36

Glodde; Martin - Pine Brook NJ
Glodde; Martin - Mahwah NJ
Glodde; Martin - Yorktown Heights NY US
Glodde; Martin - Hopewell Junction NY US
Glodde; Martin - Armonk NY US
Glodde; Martin - Mahawah NJ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography Grant 10,964,541 - Glodde , et al. March 30, 2	2021-03-30
Method to increase the lithographic process window of extreme ultra violet negative tone development resists Grant 10,727,055 - Felix , et al.	2020-07-28
Polymer brushes for extreme ultraviolet photolithography Grant 10,656,523 - Glodde , et al.	2020-05-19
Method To Improve Adhesion Of Photoresist On Silicon Substrate For Extreme Ultraviolet And Electron Beam Lithography App 20200090936 - Glodde; Martin ; et al.	2020-03-19
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography Grant 10,553,432 - Glodde , et al. Fe	2020-02-04
Polymer Brushes For Extreme Ultraviolet Photolithography App 20190285985 - Glodde; Martin ; et al.	2019-09-19
Method to increase the lithographic process window of extreme ultra violet negative tone development resists Grant 10,388,521 - Felix , et al. A	2019-08-20
Polymer brushes for extreme ultraviolet photolithography Grant 10,345,702 - Glodde , et al. July 9, 2	2019-07-09
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography Grant 10,312,087 - Glodde , et al.	2019-06-04
Polymer Brushes For Extreme Ultraviolet Photolithography App 20190064667 - Glodde; Martin ; et al.	2019-02-28
Adhesion of polymers on silicon substrates Grant 10,170,301 - Glodde J	2019-01-01
Method To Improve Adhesion Of Photoresist On Silicon Substrate For Extreme Ultraviolet And Electron Beam Lithography App 20180337048 - Glodde; Martin ; et al.	2018-11-22
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography Grant 10,096,477 - Glodde , et al. October 9, 2	2018-10-09
Adhesion Of Polymers On Silicon Substrates App 20180286670 - Glodde; Martin	2018-10-04
Method To Improve Adhesion Of Photoresist On Silicon Substrate For Extreme Ultraviolet And Electron Beam Lithography App 20180233363 - Glodde; Martin ; et al.	2018-08-16
Method To Increase The Lithographic Process Window Of Extreme Ultra Violet Negative Tone Development Resists App 20180233352 - Felix; Nelson M. ; et al.	2018-08-16
Method To Improve Adhesion Of Photoresist On Silicon Substrate For Extreme Ultraviolet And Electron Beam Lithography App 20180233362 - Glodde; Martin ; et al.	2018-08-16
Method To Increase The Lithographic Process Window Of Extreme Ultra Violet Negative Tone Development Resists App 20180233353 - Felix; Nelson M. ; et al.	2018-08-16
Wet strippable gap fill materials Grant 9,671,694 - Glodde , et al. June 6, 2	2017-06-06
Patterning process using a boron phosphorus silicon glass film Grant 9,580,623 - Tachibana , et al. February 28, 2	2017-02-28
Cleanability assessment of sublimate from lithography materials Grant 9,551,696 - Chace , et al. January 24, 2	2017-01-24
Wet strip process for an antireflective coating layer Grant 9,460,934 - Glodde , et al. October 4, 2	2016-10-04
Patterning Process App 20160276152 - TACHIBANA; Seiichiro ; et al.	2016-09-22
Deep well implant using blocking mask Grant 9,431,250 - Glodde , et al. August 30, 2	2016-08-30
Block mask litho on high aspect ratio topography with minimal semiconductor material damage Grant 9,425,053 - Glodde , et al. August 23, 2	2016-08-23
Acid-strippable silicon-containing antireflective coating Grant 9,348,228 - Glodde , et al. May 24, 2	2016-05-24
Dielectric tone inversion materials Grant 9,337,033 - Glodde , et al. May 10, 2	2016-05-10
Dielectric Tone Inversion Materials App 20160126097 - Glodde; Martin ; et al.	2016-05-05
Dielectric tone inversion materials Grant 9,281,212 - Glodde , et al. March 8, 2	2016-03-08
Block Mask Litho On High Aspect Ratio Topography With Minimal Semiconductor Material Damage App 20150380251 - Glodde; Martin ; et al.	2015-12-31
Cleanability Assessment Of Sublimate From Lithography Materials App 20150369789 - Chace; Mark S. ; et al.	2015-12-24
Deep Well Implant Using Blocking Mask App 20150255286 - Glodde; Martin ; et al.	2015-09-10
Silicon-containing antireflective coatings including non-polymeric silsesquioxanes Grant 8,999,625 - Glodde , et al. April 7, 2	2015-04-07
Wet Strip Process For An Antireflective Coating Layer App 20140273501 - Glodde; Martin ; et al.	2014-09-18
Patterning contacts in carbon nanotube devices Grant 8,816,328 - Chang , et al. August 26, 2	2014-08-26
Silicon-containing Antireflective Coatings Including Non-polymeric Silsesquioxanes App 20140227641 - Glodde; Martin ; et al.	2014-08-14
Patterning contacts in carbon nanotube devices Grant 8,803,129 - Chang , et al. August 12, 2	2014-08-12
Near-infrared Absorbing Film Compositions App 20140210034 - Huang; Wu-Song ; et al.	2014-07-31
Near-infrared absorbing film compositions Grant 8,772,376 - Huang , et al. July 8, 2	2014-07-08
Acid-strippable Silicon-containing Antireflective Coating App 20140186774 - Glodde; Martin ; et al.	2014-07-03
Patterning process Grant 8,759,220 - Ogihara , et al. June 24, 2	2014-06-24
Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer Grant 8,722,307 - Tachibana , et al. May 13, 2	2014-05-13
Method to transfer lithographic patterns into inorganic substrates Grant 8,658,050 - Engelmann , et al. February 25, 2	2014-02-25
Photoacid generators for extreme ultraviolet lithography Grant 8,652,712 - Glodde February 18, 2	2014-02-18
Near-infrared absorbing film compositions Grant 8,586,283 - Glodde , et al. November 19, 2	2013-11-19
Near-infrared Absorbing Film Composition For Lithographic Application App 20130157463 - Goldfarb; Dario L. ; et al.	2013-06-20
Patterning Contacts in Carbon Nanotube Devices App 20130089956 - Chang; Josephine B. ; et al.	2013-04-11
Patterning Contacts In Carbon Nanotube Devices App 20130087767 - Chang; Josephine B. ; et al.	2013-04-11
Integration process to improve focus leveling within a lot process variation Grant 8,395,228 - Li , et al. March 12, 2	2013-03-12
Method to Transfer Lithographic Patterns Into Inorganic Substrates App 20130026133 - Engelmann; Sebastian Ulrich ; et al.	2013-01-31
Near-Infrared Absorbing Film Compositions App 20130001484 - Glodde; Martin ; et al.	2013-01-03
Near-infrared Absorptive Layer-forming Composition And Multilayer Film Comprising Near-infrared Absorptive Layer App 20120301828 - TACHIBANA; Seiichiro ; et al.	2012-11-29
Near-infrared absorbing film compositions Grant 8,293,451 - Glodde , et al. October 23, 2	2012-10-23
Novel Integration Process to Improve Focus Leveling Within a Lot Process Variation App 20120112302 - Li; Wai-Kin ; et al.	2012-05-10
Near-infrared Absorptive Layer-forming Composition And Multilayer Film App 20110262863 - TACHIBANA; Seiichiro ; et al.	2011-10-27
Near-infrared Absorptive Layer-forming Composition And Multilayer Film App 20110262862 - OHASHI; Masaki ; et al.	2011-10-27
Photoacid generators for extreme ultraviolet lithography Grant 8,039,194 - Glodde October 18, 2	2011-10-18
Photoacid Generators for Extreme Ultraviolet Lithography App 20110143099 - Glodde; Martin	2011-06-16
Near-Infrared Absorbing Film Compositions App 20110042771 - Huang; Wu-Song ; et al.	2011-02-24
Near-Infrared Absorbing Film Compositions App 20110042653 - Glodde; Martin ; et al.	2011-02-24
Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions Grant 7,655,379 - Glodde , et al. February 2, 2	2010-02-02
Photoacid Generators For Extreme Ultraviolet Lithography App 20090176175 - Glodde; Martin	2009-07-09
Ionic, Organic Photoacid Generators For Duv, Muv And Optical Lithography Based On Peraceptor-substituted Aromatic Anions App 20090176173 - Glodde; Martin ; et al.	2009-07-09

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