loadpatents
name:-0.015755176544189
name:-0.016902208328247
name:-0.00057601928710938
Gleason; Allan Patent Filings

Gleason; Allan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Gleason; Allan.The latest application filed is for "transparent window in a polishing pad".

Company Profile
0.16.12
  • Gleason; Allan - Klamath Falls OR
  • Gleason; Allan - San Jose CA US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Apparatus and method for in-situ endpoint detection for semiconductor processing operations
Grant 8,795,029 - Birang , et al. August 5, 2
2014-08-05
Transparent Window In A Polishing Pad
App 20140038501 - Birang; Manoocher ;   et al.
2014-02-06
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
Grant 8,506,356 - Birang , et al. August 13, 2
2013-08-13
Apparatus And Method For In-situ Endpoint Detection For Semiconductor Processing Operations
App 20130130413 - Birang; Manoocher ;   et al.
2013-05-23
Apparatus And Method For In-situ Endpoint Detection For Chemical Mechanical Polishing Operations
App 20100297917 - Birang; Manoocher ;   et al.
2010-11-25
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
Grant 7,775,852 - Birang , et al. August 17, 2
2010-08-17
Substrate polishing metrology using interference signals
App 20080227367 - Birang; Manoocher ;   et al.
2008-09-18
Polishing assembly with a window
Grant 7,255,629 - Birang , et al. August 14, 2
2007-08-14
Polishing Assembly With A Window
App 20070021037 - Birang; Manoocher ;   et al.
2007-01-25
Apparatus and Method for In-Situ Endpoint Detection for Chemical Mechanical Polishing Operations
App 20070015441 - Birang; Manoocher ;   et al.
2007-01-18
Polishing pad with window and method of fabricating a window in a polishing pad
Grant 7,118,450 - Birang , et al. October 10, 2
2006-10-10
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
Grant 7,011,565 - Birang , et al. March 14, 2
2006-03-14
Method of fabricating a window in a polishing pad
App 20060014476 - Birang; Manoocher ;   et al.
2006-01-19
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
App 20050170751 - Birang, Manoocher ;   et al.
2005-08-04
Method of forming a transparent window in a polishing pad
Grant 6,910,944 - Birang , et al. June 28, 2
2005-06-28
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
Grant 6,876,454 - Birang , et al. April 5, 2
2005-04-05
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
Grant 6,875,078 - Birang , et al. April 5, 2
2005-04-05
Polishing pad for in-situ endpoint detection
Grant 6,860,791 - Birang , et al. March 1, 2
2005-03-01
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
Grant 6,719,818 - Birang , et al. April 13, 2
2004-04-13
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
App 20040014395 - Birang, Manoocher ;   et al.
2004-01-22
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
Grant 6,676,717 - Birang , et al. January 13, 2
2004-01-13
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
App 20030190867 - Birang, Manoocher ;   et al.
2003-10-09
Method for in-situ endpoint detection for chemical mechanical polishing operations
Grant 6,537,133 - Birang , et al. March 25, 2
2003-03-25
Forming a transparent window in a polishing pad for a chemical mehcanical polishing apparatus
App 20010036805 - Birang, Manoocher M.B. ;   et al.
2001-11-01
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
Grant 6,045,439 - Birang , et al. April 4, 2
2000-04-04
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
Grant 5,893,796 - Birang , et al. April 13, 1
1999-04-13

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