Glashauser; Walter

Patent Applications and Registrations

Patent applications and USPTO patent grants for Glashauser; Walter.The latest application filed is for "configuration and method for mounting a backing film to a polish head".

Company Profile

0.11.6

Glashauser; Walter - Oberhaching DE
Glashauser; Walter - Poughkeepsie NY
Glashauser; Walter - Ringstrasse DE
Glashauser; Walter - Unterhaching DE
Glashauser; Walter - Diesenhofen DE
Glashauser; Walter - Deisenhofen DE
Glashauser; Walter - Munich DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Configuration and method for mounting a backing film to a polish head Grant 7,156,933 - Ebner , et al. January 2, 2	2007-01-02
Method and configuration for conditioning a polishing pad surface Grant 7,097,535 - Glashauser , et al. August 29, 2	2006-08-29
Arrangement and method for conditioning a polishing pad Grant 7,070,479 - Faustmann , et al. July 4, 2	2006-07-04
Self-aligned mask to reduce cell layout area Grant 6,974,770 - Costrini , et al. December 13, 2	2005-12-13
Configuration and method for mounting a backing film to a polish head App 20050075049 - Ebner, Katrin ; et al.	2005-04-07
Self-aligned mask to reduce cell layout area App 20040259358 - Costrini, Gregory ; et al.	2004-12-23
Configuration for polishing disk-shaped objects Grant 6,824,456 - Ebner , et al. November 30, 2	2004-11-30
Recessed metal lines for protective enclosure in integrated circuits Grant 6,812,141 - Gaidis , et al. November 2, 2	2004-11-02
Arrangement and method for conditioning a polishing pad App 20040192168 - Faustmann, Peter ; et al.	2004-09-30
Wafer cleaning apparatus Grant 6,739,013 - Glashauser , et al. May 25, 2	2004-05-25
Configuration for polishing disk-shaped objects App 20030181061 - Ebner, Katrin ; et al.	2003-09-25
Method for determining an endpoint and semiconductor wafer Grant 6,593,238 - Haggart, Jr. , et al. July 15, 2	2003-07-15
Method and configuration for conditioning a polishing pad surface App 20020142706 - Glashauser, Walter ; et al.	2002-10-03
Wafer cleaning apparatus App 20020088069 - Glashauser, Walter ; et al.	2002-07-11
Manufacturing self-aligned polysilicon fet devices isolated with maskless shallow trench isolation and gate conductor fill technology with active devices and dummy doped regions formed in mesas Grant 6,103,592 - Levy , et al. August 15, 2	2000-08-15
Method of filling shallow trenches Grant 5,804,490 - Fiegl , et al. September 8, 1	1998-09-08
Method of stress-free development of irradiated polymethylmetacrylate Grant 4,393,129 - Glashauser , et al. July 12, 1	1983-07-12

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