Ghanayem; Steve

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ghanayem; Steve.The latest application filed is for "methods for substrate surface cleaning suitable for fabricating silicon-on-insulator structures".

Company Profile

0.10.7

Ghanayem; Steve - Los Altos CA
Ghanayem; Steve - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods for surface activation by plasma immersion ion implantation process utilized in silicon-on-insulator structure Grant 7,745,309 - Thakur , et al. June 29, 2	2010-06-29
Methods For Substrate Surface Cleaning Suitable For Fabricating Silicon-on-insulator Structures App 20080268617 - Thakur; Randhir P. S. ; et al.	2008-10-30
Methods For Surface Activation By Plasma Immersion Ion Implantation Process Utilized In Silicon-on-insulator Structure App 20080038900 - Thakur; Randhir P S ; et al.	2008-02-14
Clog-resistant gas delivery system Grant 7,192,486 - Bang , et al. March 20, 2	2007-03-20
In-situ health check of liquid injection vaporizer App 20040163590 - Tran, Toan ; et al.	2004-08-26
Clog-resistant gas delivery system App 20040083962 - Bang, Won ; et al.	2004-05-06
Method of increasing the etch selectivity of a contact sidewall to a preclean etchant Grant 6,677,247 - Yuan , et al. January 13, 2	2004-01-13
Method of increasing the etch selectivity of a contact sidewall to a preclean etchant App 20030127427 - Yuan, Zheng ; et al.	2003-07-10
In situ stabilized high concentration BPSG films for PMD application App 20030019427 - Ghanayem, Steve ; et al.	2003-01-30
Apparatus and method for aligning and controlling edge deposition on a substrate Grant 6,328,808 - Tsai , et al. December 11, 2	2001-12-11
Deposition of tungsten nitride by plasma enhanced chemical vapor deposition Grant 6,309,713 - Mak , et al. October 30, 2	2001-10-30
Deposition of tungsten nitride by plasma enhanced chemical vapor deposition App 20010016429 - Mak, Alfred ; et al.	2001-08-23
Method for forming a gap filling refractory metal layer having reduced stress Grant 6,271,129 - Ghanayem , et al. August 7, 2	2001-08-07
Apparatus and method for delivering a gas Grant 6,248,176 - Yudovsky , et al. June 19, 2	2001-06-19
Chemical vapor deposition process for depositing tungsten Grant 6,156,382 - Rajagopalan , et al. December 5, 2	2000-12-05
Apparatus and method for delivering a gas Grant 5,985,033 - Yudovsky , et al. November 16, 1	1999-11-16
Metal chemical vapor deposition process using a shadow ring Grant 5,328,722 - Ghanayem , et al. * July 12, 1	1994-07-12

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