Patent | Date |
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Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition Grant 11,430,661 - Kuratomi , et al. August 30, 2 | 2022-08-30 |
Multi-step Pre-clean For Selective Metal Gap Fill App 20220270871 - Cen; Xi ;   et al. | 2022-08-25 |
Metal Cap For Contact Resistance Reduction App 20220231137 - Mebarki; Bencherki ;   et al. | 2022-07-21 |
Ruthenium Reflow For Via Fill App 20220223472 - Luo; Yi ;   et al. | 2022-07-14 |
Process kit for a substrate support Grant 11,387,134 - Mustafa , et al. July 12, 2 | 2022-07-12 |
Multi-step pre-clean for selective metal gap fill Grant 11,380,536 - Cen , et al. July 5, 2 | 2022-07-05 |
Method for forming a metal gapfill Grant 11,355,391 - Cen , et al. June 7, 2 | 2022-06-07 |
Multi-Step Pre-Clean for Selective Metal Gap Fill App 20210351032 - Cen; Xi ;   et al. | 2021-11-11 |
Apparatuses And Methods Of Protecting Nickel And Nickel Containing Components With Thin Films App 20210319983 - LEI; Pingyan ;   et al. | 2021-10-14 |
Processing system and method of forming a contact Grant 11,114,320 - Thareja , et al. September 7, 2 | 2021-09-07 |
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten App 20210225655 - Fu; Xinyu ;   et al. | 2021-07-22 |
Methods for depositing fluorine/carbon-free conformal tungsten Grant 10,985,023 - Fu , et al. April 20, 2 | 2021-04-20 |
Method For Forming A Metal Gapfill App 20200303250 - CEN; Xi ;   et al. | 2020-09-24 |
Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity Grant 10,770,300 - Kuratomi , et al. Sep | 2020-09-08 |
Methods And Apparatus For Filling A Feature Disposed In A Substrate App 20200251340 - Kind Code | 2020-08-06 |
Methods And Apparatus For Enhancing Selectivity Of Titanium And Titanium Silicides During Chemical Vapor Deposition App 20200211852 - KURATOMI; TAKASHI ;   et al. | 2020-07-02 |
Method of enabling seamless cobalt gap-fill Grant 10,699,946 - Zope , et al. | 2020-06-30 |
Processing System And Method Of Forming A Contact App 20200203481 - THAREJA; Gaurav ;   et al. | 2020-06-25 |
Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high K at channel Grant 10,615,034 - Zheng , et al. | 2020-04-07 |
Methods for depositing semiconductor films Grant 10,535,527 - Xu , et al. Ja | 2020-01-14 |
Remote Hydrogen Plasma Titanium Deposition to Enhance Selectivity and Film Uniformity App 20200013627 - Kuratomi; Takashi ;   et al. | 2020-01-09 |
Pre-clean Of Silicon Germanium For Pre-metal Contact At Source And Drain And Pre-high K At Channel App 20190326115 - Zheng; Bo ;   et al. | 2019-10-24 |
Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity Grant 10,418,246 - Kuratomi , et al. Sept | 2019-09-17 |
Process Kit For A Substrate Support App 20190229007 - MUSTAFA; MUHANNAD ;   et al. | 2019-07-25 |
Method of enabling seamless cobalt gap-fill Grant 10,269,633 - Zope , et al. | 2019-04-23 |
Substrate processing apparatus and methods Grant 10,256,076 - Toh , et al. | 2019-04-09 |
Substrate Processing Chamber Having Heated Showerhead Assembly App 20190078210 - GUNGOR; FARUK ;   et al. | 2019-03-14 |
Methods for selective deposition of metal silicides via atomic layer deposition cycles Grant 10,199,230 - Ganguli , et al. Fe | 2019-02-05 |
Methods For Depositing Semiconductor Films App 20190019684 - Xu; Yi ;   et al. | 2019-01-17 |
Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high k at channel Grant 10,163,630 - Zheng , et al. Dec | 2018-12-25 |
Methods for dry etching cobalt metal using fluorine radicals Grant 10,163,656 - Zope , et al. Dec | 2018-12-25 |
Methods for thermally forming a selective cobalt layer Grant 10,043,709 - Ai , et al. August 7, 2 | 2018-08-07 |
Device conformity control by low temperature, low pressure, inductively coupled ammonia-nitrogen trifluoride plasma Grant 10,008,388 - Hsieh , et al. June 26, 2 | 2018-06-26 |
Deposition Of Metal Films App 20180158686 - Gelatos; Avgerinos V. ;   et al. | 2018-06-07 |
Methods of treating nitride films Grant 9,966,275 - Biggs , et al. May 8, 2 | 2018-05-08 |
Remote Hydrogen Plasma Titanium Deposition to Enhance Selectivity and Film Uniformity App 20180122647 - Kuratomi; Takashi ;   et al. | 2018-05-03 |
Method Of Enabling Seamless Cobalt Gap-fill App 20180068890 - ZOPE; Bhushan N. ;   et al. | 2018-03-08 |
Pre-clean Of Silicon Germanium For Pre-metal Contact At Source And Drain And Pre-high K At Channel App 20170365468 - ZHENG; Bo ;   et al. | 2017-12-21 |
Method of enabling seamless cobalt gap-fill Grant 9,842,769 - Zope , et al. December 12, 2 | 2017-12-12 |
Device Conformity Control By Low Temperature, Low Pressure, Inductively Coupled Ammonia-nitrogen Trifluoride Plasma App 20170301556 - HSIEH; Ping Han ;   et al. | 2017-10-19 |
Apparatus for variable substrate temperature control Grant 9,783,889 - Tzu , et al. October 10, 2 | 2017-10-10 |
Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high K at channel Grant 9,735,009 - Zheng , et al. August 15, 2 | 2017-08-15 |
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten App 20170194156 - Fu; Xinyu ;   et al. | 2017-07-06 |
Methods Of Treating Nitride Films App 20170178927 - Biggs; Brent ;   et al. | 2017-06-22 |
Method of enabling seamless cobalt gap-fill Grant 9,685,371 - Zope , et al. June 20, 2 | 2017-06-20 |
Methods for preferential growth of cobalt within substrate features Grant 9,637,819 - Zope , et al. May 2, 2 | 2017-05-02 |
Substrate Processing Apparatus And Methods App 20170117118 - TOH; Shi Wei ;   et al. | 2017-04-27 |
Method Of Enabling Seamless Cobalt Gap-fill App 20170084486 - ZOPE; Bhushan N. ;   et al. | 2017-03-23 |
Methods for depositing fluorine/carbon-free conformal tungsten Grant 9,601,339 - Fu , et al. March 21, 2 | 2017-03-21 |
Method of reducing tungsten film roughness and resistivity Grant 9,546,419 - Khandelwal , et al. January 17, 2 | 2017-01-17 |
Cobalt removal for chamber clean or pre-clean process Grant 9,528,183 - Wu , et al. December 27, 2 | 2016-12-27 |
Methods For Selective Deposition Of Metal Silicides Via Atomic Layer Deposition Cycles App 20160322229 - GANGULI; Seshadri ;   et al. | 2016-11-03 |
Method Of Enabling Seamless Cobalt Gap-fill App 20160247718 - ZOPE; Bhushan N. ;   et al. | 2016-08-25 |
Methods For Thermally Forming A Selective Cobalt Layer App 20160133563 - AI; HUA ;   et al. | 2016-05-12 |
Method of enabling seamless cobalt gap-fill Grant 9,330,939 - Zope , et al. May 3, 2 | 2016-05-03 |
Surface Treatment To Improve Cctba Based Cvd Co Nucleation On Dielectric Substrate App 20160104639 - Zope; Bhushan N. ;   et al. | 2016-04-14 |
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten App 20160104624 - Fu; Xinyu ;   et al. | 2016-04-14 |
Pre-clean Of Silicon Germanium For Pre-metal Contact At Source And Drain And Pre-high K At Channel App 20160079062 - ZHENG; Bo ;   et al. | 2016-03-17 |
Plasma treatment of film for impurity removal Grant 9,275,865 - Wang , et al. March 1, 2 | 2016-03-01 |
Integrated platform for fabricating n-type metal oxide semiconductor (NMOS) devices Grant 9,230,835 - Gelatos , et al. January 5, 2 | 2016-01-05 |
Methods for depositing fluorine/carbon-free conformal tungsten Grant 9,230,815 - Fu , et al. January 5, 2 | 2016-01-05 |
Surface treatment to improve CCTBA based CVD co nucleation on dielectric substrate Grant 9,218,980 - Zope , et al. December 22, 2 | 2015-12-22 |
Methods For Preferential Growth Of Cobalt Within Substrate Features App 20150140233 - ZOPE; BHUSHAN N. ;   et al. | 2015-05-21 |
Methods For Dry Etching Cobalt Metal Using Fluorine Radicals App 20150140812 - ZOPE; BHUSHAN N. ;   et al. | 2015-05-21 |
Method Of Enabling Seamless Cobalt Gap-fill App 20150093891 - ZOPE; Bhushan N. ;   et al. | 2015-04-02 |
Surface Treatment To Improve Cctba Based Cvd Co Nucleation On Dielectric Substrate App 20150079784 - ZOPE; Bhushan N. ;   et al. | 2015-03-19 |
Cobalt Substrate Processing Systems, Apparatus, And Methods App 20150030771 - Gelatos; Avgerinos V. ;   et al. | 2015-01-29 |
Methods and apparatus for thermal based substrate processing with variable temperature capability Grant 08920564 - | 2014-12-30 |
Methods and apparatus for thermal based substrate processing with variable temperature capability Grant 8,920,564 - Tzu , et al. December 30, 2 | 2014-12-30 |
Cobalt Removal For Chamber Clean Or Pre-clean Process App 20140326276 - WU; Kai ;   et al. | 2014-11-06 |
Integrated Platform For Fabricating N-type Metal Oxide Semiconductor (nmos) Devices App 20140273515 - GELATOS; AVGERINOS V. ;   et al. | 2014-09-18 |
High temperature tungsten metallization process Grant 8,835,311 - Collins , et al. September 16, 2 | 2014-09-16 |
Temperature controlled lid assembly for tungsten nitride deposition Grant 8,821,637 - Gelatos , et al. September 2, 2 | 2014-09-02 |
High Temperature Tungsten Metallization Process App 20140187038 - COLLINS; Joshua ;   et al. | 2014-07-03 |
Method Of Reducing Tungsten Film Roughness And Resistivity App 20140147589 - KHANDELWAL; AMIT ;   et al. | 2014-05-29 |
Methods For Depositing Fluorine/carbon-free Conformal Tungsten App 20140120723 - Fu; Xinyu ;   et al. | 2014-05-01 |
Plasma Treatment Of Film For Impurity Removal App 20140120700 - WANG; Benjamin C. ;   et al. | 2014-05-01 |
Method For Removing Native Oxide And Residue From A Germanium Or Iii-v Group Containing Surface App 20140011339 - ZHENG; Bo ;   et al. | 2014-01-09 |
High temperature tungsten metallization process Grant 8,617,985 - Collins , et al. December 31, 2 | 2013-12-31 |
Method Of Enabling Seamless Cobalt Gap-fill App 20130260555 - ZOPE; Bhushan N. ;   et al. | 2013-10-03 |
Apparatus For Variable Substrate Temperature Control App 20130247826 - TZU; GWO-CHUAN ;   et al. | 2013-09-26 |
Atomic layer deposition of tungsten materials Grant 8,513,116 - Khandelwal , et al. August 20, 2 | 2013-08-20 |
High Temperature Tungsten Metallization Process App 20130109172 - COLLINS; JOSHUA ;   et al. | 2013-05-02 |
Atomic Layer Deposition Of Tungsten Materials App 20120244699 - KHANDELWAL; AMIT ;   et al. | 2012-09-27 |
Atomic layer deposition of tungsten materials Grant 8,211,799 - Khandelwal , et al. July 3, 2 | 2012-07-03 |
Apparatus for cyclical depositing of thin films Grant 8,123,860 - Thakur , et al. February 28, 2 | 2012-02-28 |
Methods And Apparatus For Thermal Based Substrate Processing With Variable Temperature Capability App 20120003388 - TZU; GWO-CHUAN ;   et al. | 2012-01-05 |
Methods For Forming Tungsten-containing Layers App 20120003833 - KHANDELWAL; AMIT ;   et al. | 2012-01-05 |
Atomic Layer Deposition Of Tungsten Materials App 20110244682 - KHANDELWAL; AMIT ;   et al. | 2011-10-06 |
Deposition and densification process for titanium nitride barrier layers Grant 7,838,441 - Khandelwal , et al. November 23, 2 | 2010-11-23 |
Methods for depositing tungsten layers employing atomic layer deposition techniques Grant 7,745,333 - Lai , et al. June 29, 2 | 2010-06-29 |
Vapor deposition of tungsten materials Grant 7,732,327 - Lee , et al. June 8, 2 | 2010-06-08 |
Ruthenium or cobalt as an underlayer for tungsten film deposition Grant 7,691,442 - Gandikota , et al. April 6, 2 | 2010-04-06 |
Deposition And Densification Process For Titanium Nitride Barrier Layers App 20090280640 - KHANDELWAL; AMIT ;   et al. | 2009-11-12 |
Ruthenium As An Underlayer For Tungsten Film Deposition App 20090142474 - Gandikota; Srinivas ;   et al. | 2009-06-04 |
Deposition and densification process for titanium nitride barrier layers Grant 7,521,379 - Khandelwal , et al. April 21, 2 | 2009-04-21 |
Vapor Deposition Of Tungsten Materials App 20090081866 - LEE; SANG-HYEOB ;   et al. | 2009-03-26 |
Apparatus For Cyclical Depositing Of Thin Films App 20090056626 - THAKUR; RANDHIR P.S. ;   et al. | 2009-03-05 |
Atomic Layer Deposition Of Tungsten Materials App 20090053893 - Khandelwal; Amit ;   et al. | 2009-02-26 |
Ruthenium as an underlayer for tungsten film deposition Grant 7,429,402 - Gandikota , et al. September 30, 2 | 2008-09-30 |
Process For Tungsten Nitride Deposition By A Temperature Controlled Lid Assembly App 20080206987 - Gelatos; Avgerinos V. ;   et al. | 2008-08-28 |
Temperature Controlled Lid Assembly For Tungsten Nitride Deposition App 20080202425 - Gelatos; Avgerinos V. ;   et al. | 2008-08-28 |
Deposition And Densification Process For Titanium Nitride Barrier Layers App 20080085611 - KHANDELWAL; AMIT ;   et al. | 2008-04-10 |
Apparatus For Cyclical Depositing Of Thin Films App 20070095285 - Thakur; Randhir P.S. ;   et al. | 2007-05-03 |
Apparatus for cyclical deposition of thin films Grant 7,175,713 - Thakur , et al. February 13, 2 | 2007-02-13 |
Electroless deposition process on a silicide contact App 20060246217 - Weidman; Timothy W. ;   et al. | 2006-11-02 |
Ruthenium as an underlayer for tungsten film deposition App 20060128150 - Gandikota; Srinivas ;   et al. | 2006-06-15 |
Heated ceramic substrate support with protective coating App 20050194374 - Gelatos, Avgerinos V. ;   et al. | 2005-09-08 |
Metal nitride formation App 20030224217 - Byun, Jeong Soo ;   et al. | 2003-12-04 |
Apparatus for cyclical deposition of thin films App 20030172872 - Thakur, Randhir P.S. ;   et al. | 2003-09-18 |
Copper interconnect structure and method of formation Grant 6,174,810 - Islam , et al. January 16, 2 | 2001-01-16 |
Process for forming copper interconnect structure Grant 5,391,517 - Gelatos , et al. February 21, 1 | 1995-02-21 |
Semiconductor device having a ternary boron nitride film and a method for forming the same Grant 5,324,690 - Gelatos , et al. June 28, 1 | 1994-06-28 |
Method for forming metallization in an integrated circuit Grant 5,275,973 - Gelatos January 4, 1 | 1994-01-04 |
Method for polish planarizing a semiconductor substrate by using a boron nitride polish stop Grant 5,064,683 - Poon , et al. November 12, 1 | 1991-11-12 |