Geisler; Michael
Patent Applications and Registrations
Patent applications and USPTO patent grants for Geisler; Michael.The latest application filed is for "sputter devices and methods".
- Geisler; Michael - Wachtersbach DE
- Geisler; Michael - Hallbergmoos DE
- Geisler; Michael - Waechtersbach DE
- Geisler, Michael - Wahtersbach DE
| Patent | Date |
|---|---|
| Sputter devices and methods Grant 11,274,364 - Portka , et al. March 15, 2 | 2022-03-15 |
| Sputter Devices And Methods App 20190003039 - Portka; Martin ; et al. | 2019-01-03 |
| Cleaning Of A Process Chamber App 20120180810 - Beckmann; Rudolf ; et al. | 2012-07-19 |
| Method And Device For Plasma Treatment Of A Flat Substrate App 20120097641 - Beckmann; Rudolf ; et al. | 2012-04-26 |
| Apparatus and method for the detection of forces in the sub-micronewton range Grant 8,132,268 - Hugel , et al. March 6, 2 | 2012-03-06 |
| Treatment System For Flat Substrates App 20100255196 - Geisler; Michael ; et al. | 2010-10-07 |
| Glass coating Grant 7,727,632 - Kleideiter , et al. June 1, 2 | 2010-06-01 |
| Glass coating Grant 7,651,774 - Kleideiter , et al. January 26, 2 | 2010-01-26 |
| Apparatus And Method For The Detection Of Forces In The Sub-Micronewton Range App 20100011472 - Hugel; Thorsten ; et al. | 2010-01-14 |
| Infrared Radiation Reflecting Layer System And Method For The Production Thereof App 20090195865 - Kleideiter; Gerd ; et al. | 2009-08-06 |
| Sputter Chamber For Coating A Substrate App 20070227882 - Trassl; Roland ; et al. | 2007-10-04 |
| Glass coating App 20070172647 - Kleideiter; Gerd ; et al. | 2007-07-26 |
| Target material and its use in a sputter process App 20070163873 - Kleideiter; Gerd ; et al. | 2007-07-19 |
| Glass coating App 20060083932 - Kleideiter; Gerd ; et al. | 2006-04-20 |
| Method for coating substrates in inline installations App 20050236276 - Kastner, Albert ; et al. | 2005-10-27 |
| Power coupling for high-power sputtering App 20050224343 - Newcomb, Richard ; et al. | 2005-10-13 |
| Sputter arrangement with a magnetron and a target App 20050178660 - Lopp, Andreas ; et al. | 2005-08-18 |
| Coating installation App 20050145487 - Geisler, Michael ; et al. | 2005-07-07 |
| Apparatus for plasma treatment Grant 5,399,254 - Geisler , et al. March 21, 1 | 1995-03-21 |
| Method for producing a reflective surface on a substrate Grant 5,294,464 - Geisler , et al. March 15, 1 | 1994-03-15 |
| Device for mounting and transporting substrates in vacuum apparatus Grant 5,259,603 - Geisler , et al. November 9, 1 | 1993-11-09 |
| Apparatus for the production of a regular microwave field Grant 5,173,640 - Geisler , et al. December 22, 1 | 1992-12-22 |
| Apparatus for the plasma treatment of substrates Grant 5,113,790 - Geisler , et al. May 19, 1 | 1992-05-19 |
| Arrangement for the production of a plasma Grant 5,102,523 - Beisswenger , et al. April 7, 1 | 1992-04-07 |
| Process for depositing silicon oxide on a substrate Grant 5,053,244 - Kieser , et al. October 1, 1 | 1991-10-01 |
| Microwave cathode sputtering arrangement Grant 5,006,219 - Latz , et al. April 9, 1 | 1991-04-09 |
| Particle source for a reactive ion beam etching or plasma deposition installation Grant 4,987,346 - Katzschner , et al. January 22, 1 | 1991-01-22 |
| Apparatus for producing a plasma and for the treatment of substrates Grant 4,939,424 - Kieser , et al. July 3, 1 | 1990-07-03 |
| Sputtering cathode based on the magnetron principle Grant 4,933,064 - Geisler , et al. June 12, 1 | 1990-06-12 |
| Plasma treatment apparatus Grant 4,767,641 - Kieser , et al. August 30, 1 | 1988-08-30 |
| NCAGE Code | 58RQ4 | GEISLER, MICHAEL |
| CAGE Code | 58RQ4 | GEISLER, MICHAEL |
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