Geh; Bernd

Patent Applications and Registrations

Patent applications and USPTO patent grants for Geh; Bernd.The latest application filed is for "method and apparatus for performing an aerial image simulation of a photolithographic mask".

Company Profile

2.16.22

Geh; Bernd - Scottsdale AZ
Geh; Bernd - Aalen DE
Geh; Bernd - Schottsdale AZ
Geh; Bernd - US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and apparatus for performing an aerial image simulation of a photolithographic mask Grant 11,366,382 - Dmitriev , et al. June 21, 2	2022-06-21
Method And Apparatus For Performing An Aerial Image Simulation Of A Photolithographic Mask App 20210263406 - Dmitriev; Vladimir ; et al.	2021-08-26
Optical system, and method Grant 10,852,643 - Juergens , et al. December 1, 2	2020-12-01
Optical System, And Method App 20200073252 - Juergens; Dirk ; et al.	2020-03-05
Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a wafer Grant 10,353,295 - Dmitriev , et al. July 16, 2	2019-07-16
Projection Objective For Microlithography App 20170248850 - GEH; Bernd	2017-08-31
Projection objective for microlithography Grant 9,568,838 - Geh February 14, 2	2017-02-14
Method And Apparatus For Generating A Predetermined Three-dimensional Contour Of An Optical Component And/or A Wafer App 20170010540 - Dmitriev; Vladimir ; et al.	2017-01-12
Projection Objective For Microlithography App 20160170307 - GEH; Bernd	2016-06-16
Projection objective for microlithography Grant 9,217,932 - Geh December 22, 2	2015-12-22
Projection Objective For Microlithography App 20120327382 - GEH; Bernd	2012-12-27
Projection objective for microlithography Grant 8,212,988 - Geh July 3, 2	2012-07-03
Lithographic processing optimization based on hypersampled correlations Grant 8,120,748 - Geh , et al. February 21, 2	2012-02-21
Method for determining intensity distribution in the image plane of a projection exposure arrangement Grant 7,961,297 - Greif-Wuestenbecker , et al. June 14, 2	2011-06-14
Illuminator for a lithographic apparatus and method Grant 7,952,685 - Klaassen , et al. May 31, 2	2011-05-31
Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool Grant 7,818,151 - Coskun , et al. October 19, 2	2010-10-19
Method of manufacturing an optical component Grant 7,581,305 - Geuppert , et al. September 1, 2	2009-09-01
Lithographic Apparatus And Method Of Controlling App 20080284998 - Geh; Bernd ; et al.	2008-11-20
Projection Objective For Microlithography App 20080252987 - Geh; Bernd	2008-10-16
Illuminator for a lithographic apparatus and method App 20080225260 - Klaassen; Michel Fransois Hubert ; et al.	2008-09-18
Method for Determining Intensity Distribution in the Image Plane of a Projection Exposure Arrangement App 20080212060 - Greif-Wuestenbecker; Joern ; et al.	2008-09-04
Microlithographic Projection Exposure Apparatus And Method For Producing Microstructured Components App 20080204692 - Gruner; Toralf ; et al.	2008-08-28
Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements App 20080068599 - Geh; Bernd ; et al.	2008-03-20
Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements Grant 7,301,622 - Geh , et al. November 27, 2	2007-11-27
Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool App 20070260437 - Coskun; Tamer ; et al.	2007-11-08
Lithographic processing optimization based on hypersampled correlations App 20070146668 - Geh; Bernd ; et al.	2007-06-28
Lithographic processing optimization based on hypersampled correlations Grant 7,198,873 - Geh , et al. April 3, 2	2007-04-03
Arrangement of aperture diaphragms and/or filters, with changeable characteristics for optical devices App 20060291031 - Boehm; Klaus ; et al.	2006-12-28
Lithographic apparatus and device manufacturing method App 20060256311 - Hansen; Steven ; et al.	2006-11-16
Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements App 20050254042 - Geh, Bernd ; et al.	2005-11-17
Method of manufacturing an optical component and optical system using the same App 20050223539 - Geuppert, Bernhard ; et al.	2005-10-13
Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements Grant 6,934,011 - Geh , et al. August 23, 2	2005-08-23
Lithographic processing optimization based on hypersampled correlations App 20050106479 - Geh, Bernd ; et al.	2005-05-19
Method for optimising the image properties of at least two optical elements as well as methods for optimising the image properties of at least three optical elements App 20040090617 - Geh, Bernd ; et al.	2004-05-13
Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements Grant 6,678,240 - Geh , et al. January 13, 2	2004-01-13
Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements App 20030071986 - Geh, Bernd ; et al.	2003-04-17
Interferometer system and interferometric method App 20020085208 - Hauger, Christoph ; et al.	2002-07-04

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