loadpatents
name:-0.037941932678223
name:-0.035409927368164
name:-0.0079739093780518
Ge; Zhenbin Patent Filings

Ge; Zhenbin

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ge; Zhenbin.The latest application filed is for "high pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process".

Company Profile
6.28.30
  • Ge; Zhenbin - San Jose CA
  • Ge; Zhenbin - Campbell CA
  • Ge; Zhenbin - Santa Clara CA US
  • Ge; Zhenbin - San Mateo CA
  • Ge; Zhenbin - Fremont CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Displays with direct-lit backlight units
Grant 11,333,924 - Lv , et al. May 17, 2
2022-05-17
Methods for reducing material overhang in a feature of a substrate
Grant 11,162,170 - Ritchie , et al. November 2, 2
2021-11-02
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process
App 20200357616 - ALLEN; Adolph Miller ;   et al.
2020-11-12
High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process
Grant 10,763,090 - Allen , et al. Sep
2020-09-01
Light projector with integrated integrity sensor
Grant 10,667,341 - Kriman , et al.
2020-05-26
Electronic devices having scratch-resistant antireflection coatings
Grant 10,591,645 - Ge , et al.
2020-03-17
Dual-direction chemical delivery system for ALD/CVD chambers
Grant 10,400,335 - Ge , et al. Sep
2019-09-03
Counter based time compensation to reduce process shifting in reactive magnetron sputtering reactor
Grant 10,400,327 - Chowdhury , et al. Sep
2019-09-03
Electronic device with light diffuser
Grant 10,334,184 - Wang , et al.
2019-06-25
Auto capacitance tuner current compensation to control one or more film properties through target life
Grant 10,266,940 - Ge , et al.
2019-04-23
RF power compensation to control film stress, density, resistivity, and/or uniformity through target life
Grant 10,242,873 - Allen , et al.
2019-03-26
Process kit for deposition and etching
Grant 10,099,245 - Forster , et al. October 16, 2
2018-10-16
Target profile for a physical vapor deposition chamber target
Grant D825,505 - Hanson , et al. August 14, 2
2018-08-14
Electronic Devices Having Scratch-Resistant Antireflection Coatings
App 20180081085 - Ge; Zhenbin ;   et al.
2018-03-22
Electronic Devices Having Scratch-Resistant Antireflection Coatings
App 20180081086 - Wang; Ligang ;   et al.
2018-03-22
Electronic Device With Light Diffuser
App 20180081093 - Wang; Ligang ;   et al.
2018-03-22
Dual-Direction Chemical Delivery System For ALD/CVD Chambers
App 20170362710 - Ge; Zhenbin ;   et al.
2017-12-21
Target profile for a physical vapor deposition chamber target
Grant D798,248 - Hanson , et al. September 26, 2
2017-09-26
Dual-direction chemical delivery system for ALD/CVD chambers
Grant 9,765,432 - Ge , et al. September 19, 2
2017-09-19
Adjustable solid film camera aperture
Grant 9,759,984 - Xu , et al. September 12, 2
2017-09-12
Methods And Apparatus For Stable Substrate Processing With Multiple Rf Power Supplies
App 20170183768 - GE; ZHENBIN ;   et al.
2017-06-29
Crystalline orientation and overhang control in collision based RF plasmas
Grant 9,611,539 - Ge , et al. April 4, 2
2017-04-04
Methods and apparatus for stable substrate processing with multiple RF power supplies
Grant 9,593,410 - Ge , et al. March 14, 2
2017-03-14
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process
App 20170029941 - ALLEN; Adolph Miller ;   et al.
2017-02-02
Selectively groundable cover ring for substrate process chambers
Grant 9,472,443 - Rasheed , et al. October 18, 2
2016-10-18
Dual-Direction Chemical Delivery System For ALD/CVD Chambers
App 20160273108 - Ge; Zhenbin ;   et al.
2016-09-22
Auto Capacitance Tuner Current Compensation To Control One Or More Film Properties Through Target Life
App 20160244874 - GE; Zhenbin ;   et al.
2016-08-25
Counter Based Time Compensation To Reduce Process Shifting In Reactive Magnetron Sputtering Reactor
App 20160222503 - Chowdhury; Mohammad Kamruzzaman ;   et al.
2016-08-04
Dual-direction chemical delivery system for ALD/CVD chambers
Grant 9,353,440 - Ge , et al. May 31, 2
2016-05-31
Methods of forming a metal containing layer on a substrate with high uniformity and good profile control
Grant 9,218,961 - Ge , et al. December 22, 2
2015-12-22
Rf Power Compensation To Control Film Stress, Density, Resistivity, And/or Uniformity Through Target Life
App 20150252467 - ALLEN; ADOLPH MILLER ;   et al.
2015-09-10
Methods For Reducing Material Overhang In A Feature Of A Substrate
App 20150221486 - RITCHIE; ALAN A. ;   et al.
2015-08-06
Dual-Direction Chemical Delivery System for ALD/CVD Chambers
App 20150176126 - Ge; Zhenbin ;   et al.
2015-06-25
Magnetron design for extended target life in radio frequency (RF) plasmas
Grant 9,028,659 - Ritchie , et al. May 12, 2
2015-05-12
Methods for processing a substrate using a selectively grounded and movable process kit ring
Grant 8,865,012 - Ge , et al. October 21, 2
2014-10-21
Methods For Processing A Substrate Using A Selectively Grounded And Movable Process Kit Ring
App 20140273483 - GE; ZHENBIN ;   et al.
2014-09-18
Selectively Groundable Cover Ring For Substrate Process Chambers
App 20140262763 - RASHEED; MUHAMMAD M. ;   et al.
2014-09-18
Process Kit For Deposition And Etching
App 20140262026 - FORSTER; JOHN ;   et al.
2014-09-18
Methods And Apparatus For Stable Substrate Processing With Multiple Rf Power Supplies
App 20140251788 - GE; Zhenbin ;   et al.
2014-09-11
Magnetron Design For Extended Target Life In Radio Frequency (rf) Plasmas
App 20140042023 - RITCHIE; ALAN ;   et al.
2014-02-13
Crystalline Orientation And Overhang Control In Collision Based Rf Plasmas
App 20130192980 - GE; ZHENBIN ;   et al.
2013-08-01
Methods Of Forming A Metal Containing Layer On A Substrate With High Uniformity And Good Profile Control
App 20130075246 - Ge; Zhenbin ;   et al.
2013-03-28
Method and apparatus for trench and via profile modification
Grant 8,268,684 - Chang , et al. September 18, 2
2012-09-18
Selective etching of silicon nitride
Grant 8,252,696 - Lu , et al. August 28, 2
2012-08-28
Method And Apparatus For Trench And Via Profile Modification
App 20110294258 - CHANG; MEI ;   et al.
2011-12-01
Integration sequences with top surface profile modification
Grant 8,043,933 - Kao , et al. October 25, 2
2011-10-25
Method and apparatus for trench and via profile modification
Grant 7,994,002 - Chang , et al. August 9, 2
2011-08-09
Methods Of Thin Film Process
App 20110151676 - Ingle; Nitin K. ;   et al.
2011-06-23
Methods of thin film process
Grant 7,939,422 - Ingle , et al. May 10, 2
2011-05-10
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process
App 20100252417 - Allen; Adolph Miller ;   et al.
2010-10-07
Integration Sequences With Top Surface Profile Modification
App 20100129982 - Kao; Chien-Teh ;   et al.
2010-05-27
Method And Apparatus For Trench And Via Profile Modification
App 20100129958 - Chang; Mei ;   et al.
2010-05-27
Nf3/h2 Remote Plasma Process With High Etch Selectivity Of Psg/bpsg Over Thermal Oxide And Low Density Surface Defects
App 20100099263 - Kao; Chien-Teh ;   et al.
2010-04-22
Process With Saturation At Low Etch Amount For High Contact Bottom Cleaning Efficiency For Chemical Dry Clean Process
App 20090191703 - Lu; Xinliang ;   et al.
2009-07-30
Selective Etching Of Silicon Nitride
App 20090104782 - LU; XINLAING ;   et al.
2009-04-23
Methods Of Thin Film Process
App 20080182382 - Ingle; Nitin K. ;   et al.
2008-07-31

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