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Patent applications and USPTO patent grants for Gaudet; Gregory.The latest application filed is for "cmp polishing pad having edge exclusion region of offset concentric groove pattern".
Patent | Date |
---|---|
CMP polishing pad having edge exclusion region of offset concentric groove pattern Grant 9,409,276 - Tsai , et al. August 9, 2 | 2016-08-09 |
Polymeric Materials App 20150110982 - Brannon; Philip ;   et al. | 2015-04-23 |
Cmp Polishing Pad Having Edge Exclusion Region Of Offset Concentric Groove Pattern App 20150111476 - TSAI; Ching-Ming ;   et al. | 2015-04-23 |
Wire saw slurry recycling process Grant 8,425,639 - Gaudet , et al. April 23, 2 | 2013-04-23 |
Wire Saw Slurry Recycling Process App 20090293369 - GAUDET; Gregory ;   et al. | 2009-12-03 |
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